ReP USP - Resultado da busca

Trabalho de evento
Characterization of mode transitions for RF discharges in different gases (2005)
Rodrigues, Bruno da Silva; Verdonck, Patrick Bernard; Maciel, Homero Santiago; Mansano, Ronaldo Domingues
Source: Proceedings v. 2005-08. Microelectronics Technology and Devices SBMICRO 2005. Conference titles: International Symposium on Microelectronics Technology and Devices SBMICRO. Unidade: EP
Assunto: MICROELETRÔNICA
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ABNT
RODRIGUES, Bruno da Silva et al. Characterization of mode transitions for RF discharges in different gases. 2005, Anais.. Pennington: The Electrochemical Society, 2005. . Acesso em: 26 ago. 2024.
APA
Rodrigues, B. da S., Verdonck, P. B., Maciel, H. S., & Mansano, R. D. (2005). Characterization of mode transitions for RF discharges in different gases. In Proceedings v. 2005-08. Microelectronics Technology and Devices SBMICRO 2005. Pennington: The Electrochemical Society.
NLM
Rodrigues B da S, Verdonck PB, Maciel HS, Mansano RD. Characterization of mode transitions for RF discharges in different gases. Proceedings v. 2005-08. Microelectronics Technology and Devices SBMICRO 2005. 2005 ;[citado 2024 ago. 26 ]
Vancouver
Rodrigues B da S, Verdonck PB, Maciel HS, Mansano RD. Characterization of mode transitions for RF discharges in different gases. Proceedings v. 2005-08. Microelectronics Technology and Devices SBMICRO 2005. 2005 ;[citado 2024 ago. 26 ]
Artigo de periodico
The influence of nitrogen on the dielectric constant and surface hardness in diamond-like carbon (DLC) films (2004)
Guerino, M.; Massi, Marcos; Maciel, Homero Santiago; Otani, C.; Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard; Libardi, J.
Source: Diamond and Related Materials,. Unidade: EP
Assunto: FILMES FINOS
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ABNT
GUERINO, M. et al. The influence of nitrogen on the dielectric constant and surface hardness in diamond-like carbon (DLC) films. Diamond and Related Materials, v. 13, n. 2, p. 316-319, 2004Tradução . . Disponível em: https://doi.org/10.1016/j.diamond.2003.10.016. Acesso em: 26 ago. 2024.
APA
Guerino, M., Massi, M., Maciel, H. S., Otani, C., Mansano, R. D., Verdonck, P. B., & Libardi, J. (2004). The influence of nitrogen on the dielectric constant and surface hardness in diamond-like carbon (DLC) films. Diamond and Related Materials,, 13( 2), 316-319. doi:10.1016/j.diamond.2003.10.016
NLM
Guerino M, Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB, Libardi J. The influence of nitrogen on the dielectric constant and surface hardness in diamond-like carbon (DLC) films [Internet]. Diamond and Related Materials,. 2004 ; 13( 2): 316-319.[citado 2024 ago. 26 ] Available from: https://doi.org/10.1016/j.diamond.2003.10.016
Vancouver
Guerino M, Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB, Libardi J. The influence of nitrogen on the dielectric constant and surface hardness in diamond-like carbon (DLC) films [Internet]. Diamond and Related Materials,. 2004 ; 13( 2): 316-319.[citado 2024 ago. 26 ] Available from: https://doi.org/10.1016/j.diamond.2003.10.016
Artigo de periodico
Plasma etching of DLC films for microfluidic channels (2003)
Massi, Marcos; Jaramillo Ocampo, Juan Manuel; Maciel, Homero Santiago; Grigorov, K.; Otani, C.; Santos, L. V.; Mansano, Ronaldo Domingues
Source: Microelectronics Journal,. Unidade: EP
Assunto: PLASMA (MICROELETRÔNICA)
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ABNT
MASSI, Marcos et al. Plasma etching of DLC films for microfluidic channels. Microelectronics Journal, v. 34, n. 5-8, p. 635-638, 2003Tradução . . Disponível em: https://doi.org/10.1016/s0026-2692(03)00077-6. Acesso em: 26 ago. 2024.
APA
Massi, M., Jaramillo Ocampo, J. M., Maciel, H. S., Grigorov, K., Otani, C., Santos, L. V., & Mansano, R. D. (2003). Plasma etching of DLC films for microfluidic channels. Microelectronics Journal,, 34( 5-8), 635-638. doi:10.1016/s0026-2692(03)00077-6
NLM
Massi M, Jaramillo Ocampo JM, Maciel HS, Grigorov K, Otani C, Santos LV, Mansano RD. Plasma etching of DLC films for microfluidic channels [Internet]. Microelectronics Journal,. 2003 ; 34( 5-8): 635-638.[citado 2024 ago. 26 ] Available from: https://doi.org/10.1016/s0026-2692(03)00077-6
Vancouver
Massi M, Jaramillo Ocampo JM, Maciel HS, Grigorov K, Otani C, Santos LV, Mansano RD. Plasma etching of DLC films for microfluidic channels [Internet]. Microelectronics Journal,. 2003 ; 34( 5-8): 635-638.[citado 2024 ago. 26 ] Available from: https://doi.org/10.1016/s0026-2692(03)00077-6
Artigo de periodico
The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films (2003)
Guerino, M.; Massi, Marcos; Maciel, Homero Santiago; Otani, C.; Mansano, Ronaldo Domingues
Source: Microelectronics Journal. Unidade: EP
Assunto: PLASMA (MICROELETRÔNICA)
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ABNT
GUERINO, M. et al. The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films. Microelectronics Journal, v. 34, n. 5-8, 2003Tradução . . Disponível em: https://doi.org/10.1016/s0026-2692(03)00079-x. Acesso em: 26 ago. 2024.
APA
Guerino, M., Massi, M., Maciel, H. S., Otani, C., & Mansano, R. D. (2003). The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films. Microelectronics Journal, 34( 5-8). doi:10.1016/s0026-2692(03)00079-x
NLM
Guerino M, Massi M, Maciel HS, Otani C, Mansano RD. The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films [Internet]. Microelectronics Journal. 2003 ; 34( 5-8):[citado 2024 ago. 26 ] Available from: https://doi.org/10.1016/s0026-2692(03)00079-x
Vancouver
Guerino M, Massi M, Maciel HS, Otani C, Mansano RD. The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films [Internet]. Microelectronics Journal. 2003 ; 34( 5-8):[citado 2024 ago. 26 ] Available from: https://doi.org/10.1016/s0026-2692(03)00079-x
Artigo de periodico
Electrical and structural characterization of DLC films deposited by magnetron sputtering (2001)
Massi, Marcos; Maciel, Homero Santiago; Otani, C.; Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard
Source: Journal of Materials Science: Materials in Electronics. Unidade: EP
Assunto: FILMES FINOS
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ABNT
MASSI, Marcos et al. Electrical and structural characterization of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics, v. 12, p. 343-346, 2001Tradução . . Acesso em: 26 ago. 2024.
APA
Massi, M., Maciel, H. S., Otani, C., Mansano, R. D., & Verdonck, P. B. (2001). Electrical and structural characterization of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics, 12, 343-346.
NLM
Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB. Electrical and structural characterization of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics. 2001 ; 12 343-346.[citado 2024 ago. 26 ]
Vancouver
Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB. Electrical and structural characterization of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics. 2001 ; 12 343-346.[citado 2024 ago. 26 ]
Artigo de periodico
Electrical and structural characterisation of DLC films deposited by magnetron sputtering (2001)
Massi, Marcos; Maciel, Homero Santiago; Otani, C.; Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard
Source: Journal of Materials Science: Materials in Electronics. Conference titles: International Conference on Materials for Microelectronics. Unidade: EP
Assunto: FILMES
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ABNT
MASSI, Marcos et al. Electrical and structural characterisation of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics, v. 12, p. 343–346, 2001Tradução . . Disponível em: https://doi.org/10.1023/A:1011252629646. Acesso em: 26 ago. 2024.
APA
Massi, M., Maciel, H. S., Otani, C., Mansano, R. D., & Verdonck, P. B. (2001). Electrical and structural characterisation of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics, 12, 343–346. doi:10.1023/A:1011252629646
NLM
Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB. Electrical and structural characterisation of DLC films deposited by magnetron sputtering [Internet]. Journal of Materials Science: Materials in Electronics. 2001 ; 12 343–346.[citado 2024 ago. 26 ] Available from: https://doi.org/10.1023/A:1011252629646
Vancouver
Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB. Electrical and structural characterisation of DLC films deposited by magnetron sputtering [Internet]. Journal of Materials Science: Materials in Electronics. 2001 ; 12 343–346.[citado 2024 ago. 26 ] Available from: https://doi.org/10.1023/A:1011252629646
Artigo de periodico
Performance characterization of an RIE reactor with built-in RF excitation antenna (2000)
Massi, Marcos; Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard; Maciel, Homero Santiago; Cirino, Giuseppe Antonio; Castro, Raul Murete de; Pisani, Marcelo B.
Source: Solid-State Devices and Circuits. Unidade: EP
Assunto: ANTENAS
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ABNT
MASSI, Marcos et al. Performance characterization of an RIE reactor with built-in RF excitation antenna. Solid-State Devices and Circuits, v. 8, n. 1, p. 1-4, 2000Tradução . . Acesso em: 26 ago. 2024.
APA
Massi, M., Mansano, R. D., Verdonck, P. B., Maciel, H. S., Cirino, G. A., Castro, R. M. de, & Pisani, M. B. (2000). Performance characterization of an RIE reactor with built-in RF excitation antenna. Solid-State Devices and Circuits, 8( 1), 1-4.
NLM
Massi M, Mansano RD, Verdonck PB, Maciel HS, Cirino GA, Castro RM de, Pisani MB. Performance characterization of an RIE reactor with built-in RF excitation antenna. Solid-State Devices and Circuits. 2000 ; 8( 1): 1-4.[citado 2024 ago. 26 ]
Vancouver
Massi M, Mansano RD, Verdonck PB, Maciel HS, Cirino GA, Castro RM de, Pisani MB. Performance characterization of an RIE reactor with built-in RF excitation antenna. Solid-State Devices and Circuits. 2000 ; 8( 1): 1-4.[citado 2024 ago. 26 ]
Artigo de periodico
End-point detection of polymer etching using Lagmuir probes (2000)
Castro, Raul Murete de; Verdonck, Patrick Bernard; Pisani, Marcelo B.; Mansano, Ronaldo Domingues ; Cirino, Giuseppe Antonio; Maciel, Homero Santiago; Massi, Marcos
Source: IEEE Transactions on Plasma Science. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS
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ABNT
CASTRO, Raul Murete de et al. End-point detection of polymer etching using Lagmuir probes. IEEE Transactions on Plasma Science, v. 28, n. Ju 2000, p. 1043-1049, 2000Tradução . . Disponível em: https://doi.org/10.1109/27.887774. Acesso em: 26 ago. 2024.
APA
Castro, R. M. de, Verdonck, P. B., Pisani, M. B., Mansano, R. D., Cirino, G. A., Maciel, H. S., & Massi, M. (2000). End-point detection of polymer etching using Lagmuir probes. IEEE Transactions on Plasma Science, 28( Ju 2000), 1043-1049. doi:10.1109/27.887774
NLM
Castro RM de, Verdonck PB, Pisani MB, Mansano RD, Cirino GA, Maciel HS, Massi M. End-point detection of polymer etching using Lagmuir probes [Internet]. IEEE Transactions on Plasma Science. 2000 ; 28( Ju 2000): 1043-1049.[citado 2024 ago. 26 ] Available from: https://doi.org/10.1109/27.887774
Vancouver
Castro RM de, Verdonck PB, Pisani MB, Mansano RD, Cirino GA, Maciel HS, Massi M. End-point detection of polymer etching using Lagmuir probes [Internet]. IEEE Transactions on Plasma Science. 2000 ; 28( Ju 2000): 1043-1049.[citado 2024 ago. 26 ] Available from: https://doi.org/10.1109/27.887774
Trabalho de evento
The applicability of Langmuir probes for end point detection of polymer etching (1999)
Mansano, Ronaldo Domingues ; Nogueira, Paula Maria; Zambom, Luís da Silva ; Verdonck, Patrick Bernard; Massi, Marcos; Maciel, Homero Santiago
Source: ICMP 99: technical digest. Conference titles: International Conference on Microelectronics and Packaging. Unidade: EP
Assunto: FILMES
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ABNT
MANSANO, Ronaldo Domingues et al. The applicability of Langmuir probes for end point detection of polymer etching. 1999, Anais.. São Paulo: SBMicro/IMAPS, 1999. . Acesso em: 26 ago. 2024.
APA
Mansano, R. D., Nogueira, P. M., Zambom, L. da S., Verdonck, P. B., Massi, M., & Maciel, H. S. (1999). The applicability of Langmuir probes for end point detection of polymer etching. In ICMP 99: technical digest. São Paulo: SBMicro/IMAPS.
NLM
Mansano RD, Nogueira PM, Zambom L da S, Verdonck PB, Massi M, Maciel HS. The applicability of Langmuir probes for end point detection of polymer etching. ICMP 99: technical digest. 1999 ;[citado 2024 ago. 26 ]
Vancouver
Mansano RD, Nogueira PM, Zambom L da S, Verdonck PB, Massi M, Maciel HS. The applicability of Langmuir probes for end point detection of polymer etching. ICMP 99: technical digest. 1999 ;[citado 2024 ago. 26 ]
Relatorio tecnico
Influence of plasma etching on Raman spectra of DLC films deposited by magnetron sputtering (1999)
Massi, Marcos; Mansano, Ronaldo Domingues ; Maciel, Homero Santiago; Otani, C.; Verdonck, Patrick Bernard; Nishioka, L. N. B. M.
Unidade: EP
Assunto: ENGENHARIA ELÉTRICA
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ABNT
MASSI, Marcos et al. Influence of plasma etching on Raman spectra of DLC films deposited by magnetron sputtering. . São Paulo: EPUSP. . Acesso em: 26 ago. 2024. , 1999
APA
Massi, M., Mansano, R. D., Maciel, H. S., Otani, C., Verdonck, P. B., & Nishioka, L. N. B. M. (1999). Influence of plasma etching on Raman spectra of DLC films deposited by magnetron sputtering. São Paulo: EPUSP.
NLM
Massi M, Mansano RD, Maciel HS, Otani C, Verdonck PB, Nishioka LNBM. Influence of plasma etching on Raman spectra of DLC films deposited by magnetron sputtering. 1999 ;[citado 2024 ago. 26 ]
Vancouver
Massi M, Mansano RD, Maciel HS, Otani C, Verdonck PB, Nishioka LNBM. Influence of plasma etching on Raman spectra of DLC films deposited by magnetron sputtering. 1999 ;[citado 2024 ago. 26 ]
Trabalho de evento
Influence of methane addition on the characteristics of magnetron sputtered hydrogenated carbon films (1999)
Mansano, Ronaldo Domingues ; Nogueira, Paula Maria; Zambom, Luís da Silva ; Verdonck, Patrick Bernard; Massi, Marcos; Maciel, Homero Santiago
Source: ICMP 99: technical digest. Conference titles: International Conference on Microelectronics and Packaging. Unidade: EP
Assunto: FILMES
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ABNT
MANSANO, Ronaldo Domingues et al. Influence of methane addition on the characteristics of magnetron sputtered hydrogenated carbon films. 1999, Anais.. São Paulo: SBMicro/IMAPS, 1999. . Acesso em: 26 ago. 2024.
APA
Mansano, R. D., Nogueira, P. M., Zambom, L. da S., Verdonck, P. B., Massi, M., & Maciel, H. S. (1999). Influence of methane addition on the characteristics of magnetron sputtered hydrogenated carbon films. In ICMP 99: technical digest. São Paulo: SBMicro/IMAPS.
NLM
Mansano RD, Nogueira PM, Zambom L da S, Verdonck PB, Massi M, Maciel HS. Influence of methane addition on the characteristics of magnetron sputtered hydrogenated carbon films. ICMP 99: technical digest. 1999 ;[citado 2024 ago. 26 ]
Vancouver
Mansano RD, Nogueira PM, Zambom L da S, Verdonck PB, Massi M, Maciel HS. Influence of methane addition on the characteristics of magnetron sputtered hydrogenated carbon films. ICMP 99: technical digest. 1999 ;[citado 2024 ago. 26 ]
Artigo de periodico
Effects of plasma etching on DLC films (1999)
Massi, Marcos; Mansano, Ronaldo Domingues ; Maciel, Homero Santiago; Otani, C.; Verdonck, Patrick Bernard; Nishioka, L. N. B. M.
Source: Thin Solid Films. Unidade: EP
Assunto: PLASMA
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ABNT
MASSI, Marcos et al. Effects of plasma etching on DLC films. Thin Solid Films, n. 343-344, p. 381-384, 1999Tradução . . Disponível em: https://doi.org/10.1016/s0040-6090(98)01691-5. Acesso em: 26 ago. 2024.
APA
Massi, M., Mansano, R. D., Maciel, H. S., Otani, C., Verdonck, P. B., & Nishioka, L. N. B. M. (1999). Effects of plasma etching on DLC films. Thin Solid Films, ( 343-344), 381-384. doi:10.1016/s0040-6090(98)01691-5
NLM
Massi M, Mansano RD, Maciel HS, Otani C, Verdonck PB, Nishioka LNBM. Effects of plasma etching on DLC films [Internet]. Thin Solid Films. 1999 ;( 343-344): 381-384.[citado 2024 ago. 26 ] Available from: https://doi.org/10.1016/s0040-6090(98)01691-5
Vancouver
Massi M, Mansano RD, Maciel HS, Otani C, Verdonck PB, Nishioka LNBM. Effects of plasma etching on DLC films [Internet]. Thin Solid Films. 1999 ;( 343-344): 381-384.[citado 2024 ago. 26 ] Available from: https://doi.org/10.1016/s0040-6090(98)01691-5
Artigo de periodico
Silicon surface roughness induced by SF6-based reactive ion etching process for micromachining applications (1998)
Verdonck, Patrick Bernard; Mansano, Ronaldo Domingues ; Maciel, Homero Santiago; Salvadori, Maria Cecília Barbosa da Silveira
Source: Journal of Solid-State Devices and Circuits. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS
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ABNT
VERDONCK, Patrick Bernard et al. Silicon surface roughness induced by SF6-based reactive ion etching process for micromachining applications. Journal of Solid-State Devices and Circuits, v. 6, n. 1, p. 1-6, 1998Tradução . . Acesso em: 26 ago. 2024.
APA
Verdonck, P. B., Mansano, R. D., Maciel, H. S., & Salvadori, M. C. B. da S. (1998). Silicon surface roughness induced by SF6-based reactive ion etching process for micromachining applications. Journal of Solid-State Devices and Circuits, 6( 1), 1-6.
NLM
Verdonck PB, Mansano RD, Maciel HS, Salvadori MCB da S. Silicon surface roughness induced by SF6-based reactive ion etching process for micromachining applications. Journal of Solid-State Devices and Circuits. 1998 ; 6( 1): 1-6.[citado 2024 ago. 26 ]
Vancouver
Verdonck PB, Mansano RD, Maciel HS, Salvadori MCB da S. Silicon surface roughness induced by SF6-based reactive ion etching process for micromachining applications. Journal of Solid-State Devices and Circuits. 1998 ; 6( 1): 1-6.[citado 2024 ago. 26 ]
Relatorio tecnico
Deep trench etching in silicon with fluorine containing plasmas (1998)
Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard; Maciel, Homero Santiago
Unidade: EP
Assunto: CIRCUITOS INTEGRADOS
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ABNT
MANSANO, Ronaldo Domingues e VERDONCK, Patrick Bernard e MACIEL, Homero Santiago. Deep trench etching in silicon with fluorine containing plasmas. . São Paulo: EPUSP. . Acesso em: 26 ago. 2024. , 1998
APA
Mansano, R. D., Verdonck, P. B., & Maciel, H. S. (1998). Deep trench etching in silicon with fluorine containing plasmas. São Paulo: EPUSP.
NLM
Mansano RD, Verdonck PB, Maciel HS. Deep trench etching in silicon with fluorine containing plasmas. 1998 ;[citado 2024 ago. 26 ]
Vancouver
Mansano RD, Verdonck PB, Maciel HS. Deep trench etching in silicon with fluorine containing plasmas. 1998 ;[citado 2024 ago. 26 ]
Artigo de periodico
Anisotropic reactive ion etching in silicon, using a graphite electrode (1998)
Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard; Maciel, Homero Santiago
Source: Sensors and Actuators A. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS
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ABNT
MANSANO, Ronaldo Domingues e VERDONCK, Patrick Bernard e MACIEL, Homero Santiago. Anisotropic reactive ion etching in silicon, using a graphite electrode. Sensors and Actuators A, v. 65, n. 2-3, p. 180-186, 1998Tradução . . Disponível em: https://doi.org/10.1016/s0924-4247(97)01681-6. Acesso em: 26 ago. 2024.
APA
Mansano, R. D., Verdonck, P. B., & Maciel, H. S. (1998). Anisotropic reactive ion etching in silicon, using a graphite electrode. Sensors and Actuators A, 65( 2-3), 180-186. doi:10.1016/s0924-4247(97)01681-6
NLM
Mansano RD, Verdonck PB, Maciel HS. Anisotropic reactive ion etching in silicon, using a graphite electrode [Internet]. Sensors and Actuators A. 1998 ; 65( 2-3): 180-186.[citado 2024 ago. 26 ] Available from: https://doi.org/10.1016/s0924-4247(97)01681-6
Vancouver
Mansano RD, Verdonck PB, Maciel HS. Anisotropic reactive ion etching in silicon, using a graphite electrode [Internet]. Sensors and Actuators A. 1998 ; 65( 2-3): 180-186.[citado 2024 ago. 26 ] Available from: https://doi.org/10.1016/s0924-4247(97)01681-6
Relatorio tecnico
Comparison between single and double Langmuir probe tecniques for analysis of inductively coupled plasmas (1998)
Cirino, Giuseppe Antonio; Verdonck, Patrick Bernard; Maciel, Homero Santiago; Castro, R M; Massi, Marcos; Pisani, M B; Mansano, Ronaldo Domingues
Unidade: EP
Assunto: SEMICONDUTORES
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ABNT
CIRINO, Giuseppe Antonio et al. Comparison between single and double Langmuir probe tecniques for analysis of inductively coupled plasmas. . São Paulo: EPUSP. . Acesso em: 26 ago. 2024. , 1998
APA
Cirino, G. A., Verdonck, P. B., Maciel, H. S., Castro, R. M., Massi, M., Pisani, M. B., & Mansano, R. D. (1998). Comparison between single and double Langmuir probe tecniques for analysis of inductively coupled plasmas. São Paulo: EPUSP.
NLM
Cirino GA, Verdonck PB, Maciel HS, Castro RM, Massi M, Pisani MB, Mansano RD. Comparison between single and double Langmuir probe tecniques for analysis of inductively coupled plasmas. 1998 ;[citado 2024 ago. 26 ]
Vancouver
Cirino GA, Verdonck PB, Maciel HS, Castro RM, Massi M, Pisani MB, Mansano RD. Comparison between single and double Langmuir probe tecniques for analysis of inductively coupled plasmas. 1998 ;[citado 2024 ago. 26 ]
Trabalho de evento
Silicon wall profiles generated by isotropic dry etching process (1997)
Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard; Maciel, Homero Santiago
Source: CIP'97 : proceedings. Conference titles: International Colloquium on Plasma Processes. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS
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ABNT
MANSANO, Ronaldo Domingues e VERDONCK, Patrick Bernard e MACIEL, Homero Santiago. Silicon wall profiles generated by isotropic dry etching process. 1997, Anais.. Paris: Société Française du Vide, 1997. . Acesso em: 26 ago. 2024.
APA
Mansano, R. D., Verdonck, P. B., & Maciel, H. S. (1997). Silicon wall profiles generated by isotropic dry etching process. In CIP'97 : proceedings. Paris: Société Française du Vide.
NLM
Mansano RD, Verdonck PB, Maciel HS. Silicon wall profiles generated by isotropic dry etching process. CIP'97 : proceedings. 1997 ;[citado 2024 ago. 26 ]
Vancouver
Mansano RD, Verdonck PB, Maciel HS. Silicon wall profiles generated by isotropic dry etching process. CIP'97 : proceedings. 1997 ;[citado 2024 ago. 26 ]
Trabalho de evento
Characteristic of silicon etching process in a RIE reactor modified to include a built-in radio frequency excitation coil. (em CD-Rom) (1997)
Massi, Marcos; Mansano, Ronaldo Domingues ; Maciel, Homero Santiago; Verdonck, Patrick Bernard
Source: Proceedings. Conference titles: Conference of the Brazilian Microelectronics Society. Unidade: EP
Subjects: CIRCUITOS INTEGRADOS, SEMICONDUTORES
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ABNT
MASSI, Marcos et al. Characteristic of silicon etching process in a RIE reactor modified to include a built-in radio frequency excitation coil. (em CD-Rom). 1997, Anais.. Itajubá: SBMICRO/EFEI, 1997. . Acesso em: 26 ago. 2024.
APA
Massi, M., Mansano, R. D., Maciel, H. S., & Verdonck, P. B. (1997). Characteristic of silicon etching process in a RIE reactor modified to include a built-in radio frequency excitation coil. (em CD-Rom). In Proceedings. Itajubá: SBMICRO/EFEI.
NLM
Massi M, Mansano RD, Maciel HS, Verdonck PB. Characteristic of silicon etching process in a RIE reactor modified to include a built-in radio frequency excitation coil. (em CD-Rom). Proceedings. 1997 ;[citado 2024 ago. 26 ]
Vancouver
Massi M, Mansano RD, Maciel HS, Verdonck PB. Characteristic of silicon etching process in a RIE reactor modified to include a built-in radio frequency excitation coil. (em CD-Rom). Proceedings. 1997 ;[citado 2024 ago. 26 ]
Trabalho de evento
Silicon surface roughness induced by reactive ion etching processes, using a graphite electrode. (Em CD-Rom) (1997)
Verdonck, Patrick Bernard; Mansano, Ronaldo Domingues ; Maciel, Homero Santiago
Source: Proceedings. Conference titles: Conference of the Brazilian Microelectronics Society. Unidade: EP
Subjects: CIRCUITOS INTEGRADOS, SEMICONDUTORES
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
VERDONCK, Patrick Bernard e MANSANO, Ronaldo Domingues e MACIEL, Homero Santiago. Silicon surface roughness induced by reactive ion etching processes, using a graphite electrode. (Em CD-Rom). 1997, Anais.. Itajubá: SBMICRO/EFEI, 1997. . Acesso em: 26 ago. 2024.
APA
Verdonck, P. B., Mansano, R. D., & Maciel, H. S. (1997). Silicon surface roughness induced by reactive ion etching processes, using a graphite electrode. (Em CD-Rom). In Proceedings. Itajubá: SBMICRO/EFEI.
NLM
Verdonck PB, Mansano RD, Maciel HS. Silicon surface roughness induced by reactive ion etching processes, using a graphite electrode. (Em CD-Rom). Proceedings. 1997 ;[citado 2024 ago. 26 ]
Vancouver
Verdonck PB, Mansano RD, Maciel HS. Silicon surface roughness induced by reactive ion etching processes, using a graphite electrode. (Em CD-Rom). Proceedings. 1997 ;[citado 2024 ago. 26 ]
Artigo de periodico
Mechanisms of surface roughness induced in silicon by fluorine containing plasmas (1997)
Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard; Maciel, Homero Santiago
Source: Vaccum. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
MANSANO, Ronaldo Domingues e VERDONCK, Patrick Bernard e MACIEL, Homero Santiago. Mechanisms of surface roughness induced in silicon by fluorine containing plasmas. Vaccum, v. 48, n. 7-9, p. 677-679, 1997Tradução . . Disponível em: https://doi.org/10.1016/s0042-207x(97)00067-5. Acesso em: 26 ago. 2024.
APA
Mansano, R. D., Verdonck, P. B., & Maciel, H. S. (1997). Mechanisms of surface roughness induced in silicon by fluorine containing plasmas. Vaccum, 48( 7-9), 677-679. doi:10.1016/s0042-207x(97)00067-5
NLM
Mansano RD, Verdonck PB, Maciel HS. Mechanisms of surface roughness induced in silicon by fluorine containing plasmas [Internet]. Vaccum. 1997 ; 48( 7-9): 677-679.[citado 2024 ago. 26 ] Available from: https://doi.org/10.1016/s0042-207x(97)00067-5
Vancouver
Mansano RD, Verdonck PB, Maciel HS. Mechanisms of surface roughness induced in silicon by fluorine containing plasmas [Internet]. Vaccum. 1997 ; 48( 7-9): 677-679.[citado 2024 ago. 26 ] Available from: https://doi.org/10.1016/s0042-207x(97)00067-5

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