Effects of plasma etching on DLC films (1999)
- Authors:
- USP affiliated authors: VERDONCK, PATRICK BERNARD - EP ; MACIEL, HOMERO SANTIAGO - EP ; MANSANO, RONALDO DOMINGUES - EP
- Unidade: EP
- DOI: 10.1016/s0040-6090(98)01691-5
- Assunto: PLASMA
- Language: Inglês
- Imprenta:
- Source:
- Título: Thin Solid Films
- ISSN: 0040-6090
- Volume/Número/Paginação/Ano: n. 343-344, p. 381-384, 1999
- Este periódico é de assinatura
- Este artigo NÃO é de acesso aberto
- Cor do Acesso Aberto: closed
-
ABNT
MASSI, Marcos et al. Effects of plasma etching on DLC films. Thin Solid Films, n. 343-344, p. 381-384, 1999Tradução . . Disponível em: https://doi.org/10.1016/s0040-6090(98)01691-5. Acesso em: 18 nov. 2024. -
APA
Massi, M., Mansano, R. D., Maciel, H. S., Otani, C., Verdonck, P. B., & Nishioka, L. N. B. M. (1999). Effects of plasma etching on DLC films. Thin Solid Films, ( 343-344), 381-384. doi:10.1016/s0040-6090(98)01691-5 -
NLM
Massi M, Mansano RD, Maciel HS, Otani C, Verdonck PB, Nishioka LNBM. Effects of plasma etching on DLC films [Internet]. Thin Solid Films. 1999 ;( 343-344): 381-384.[citado 2024 nov. 18 ] Available from: https://doi.org/10.1016/s0040-6090(98)01691-5 -
Vancouver
Massi M, Mansano RD, Maciel HS, Otani C, Verdonck PB, Nishioka LNBM. Effects of plasma etching on DLC films [Internet]. Thin Solid Films. 1999 ;( 343-344): 381-384.[citado 2024 nov. 18 ] Available from: https://doi.org/10.1016/s0040-6090(98)01691-5 - Silicon wall profiles generated by isotropic dry etching process
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Informações sobre o DOI: 10.1016/s0040-6090(98)01691-5 (Fonte: oaDOI API)
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