Electrical and structural characterisation of DLC films deposited by magnetron sputtering (2001)
- Authors:
- USP affiliated authors: MANSANO, RONALDO DOMINGUES - EP ; VERDONCK, PATRICK BERNARD - EP ; MACIEL, HOMERO SANTIAGO - EP
- Unidade: EP
- DOI: 10.1023/A:1011252629646
- Assunto: FILMES
- Language: Inglês
- Imprenta:
- Source:
- Título: Journal of Materials Science: Materials in Electronics
- ISSN: 0957-4522
- Volume/Número/Paginação/Ano: v. 12, p. 343–346, 2001
- Conference titles: International Conference on Materials for Microelectronics
- Status:
- Artigo possui versão em acesso aberto em repositório (Green Open Access)
- Versão do Documento:
- Versão submetida (Pré-print)
- Acessar versão aberta:
-
ABNT
MASSI, Marcos et al. Electrical and structural characterisation of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics, v. 12, p. 343–346, 2001Tradução . . Disponível em: https://doi.org/10.1023/A:1011252629646. Acesso em: 08 abr. 2026. -
APA
Massi, M., Maciel, H. S., Otani, C., Mansano, R. D., & Verdonck, P. B. (2001). Electrical and structural characterisation of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics, 12, 343–346. doi:10.1023/A:1011252629646 -
NLM
Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB. Electrical and structural characterisation of DLC films deposited by magnetron sputtering [Internet]. Journal of Materials Science: Materials in Electronics. 2001 ; 12 343–346.[citado 2026 abr. 08 ] Available from: https://doi.org/10.1023/A:1011252629646 -
Vancouver
Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB. Electrical and structural characterisation of DLC films deposited by magnetron sputtering [Internet]. Journal of Materials Science: Materials in Electronics. 2001 ; 12 343–346.[citado 2026 abr. 08 ] Available from: https://doi.org/10.1023/A:1011252629646 - Silicon surface roughness induced by SF6-based reactive ion etching processes for micromachining applications
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