Characteristics of silicon etching processes in a RIE reactor modified to include a built-in radio frequency excitation coil. (em CD-Rom) (1997)
- Authors:
- USP affiliated authors: MACIEL, HOMERO SANTIAGO - EP ; VERDONCK, PATRICK BERNARD - EP ; MANSANO, RONALDO DOMINGUES - EP
- Unidade: EP
- Subjects: CIRCUITOS INTEGRADOS; SEMICONDUTORES
- Language: Inglês
- Imprenta:
- Publisher: SBMICRO/EFEI
- Publisher place: Itajubá
- Date published: 1997
- Source:
- Título: Proceedings
- Conference titles: Conference of the Brazilian Microelectronics Society
-
ABNT
MASSI, Marcos et al. Characteristics of silicon etching processes in a RIE reactor modified to include a built-in radio frequency excitation coil. (em CD-Rom). 1997, Anais.. Itajubá: SBMICRO/EFEI, 1997. . Acesso em: 11 fev. 2026. -
APA
Massi, M., Mansano, R. D., Maciel, H. S., & Verdonck, P. B. (1997). Characteristics of silicon etching processes in a RIE reactor modified to include a built-in radio frequency excitation coil. (em CD-Rom). In Proceedings. Itajubá: SBMICRO/EFEI. -
NLM
Massi M, Mansano RD, Maciel HS, Verdonck PB. Characteristics of silicon etching processes in a RIE reactor modified to include a built-in radio frequency excitation coil. (em CD-Rom). Proceedings. 1997 ;[citado 2026 fev. 11 ] -
Vancouver
Massi M, Mansano RD, Maciel HS, Verdonck PB. Characteristics of silicon etching processes in a RIE reactor modified to include a built-in radio frequency excitation coil. (em CD-Rom). Proceedings. 1997 ;[citado 2026 fev. 11 ] - Silicon surface roughness induced by SF6-based reactive ion etching processes for micromachining applications
- End-point detection of polymer etching using Langmuir probes
- Performance characterization of an RIE reactor with built-in RF excitation antenna
- Anisotropic reactive ion etching in silicon, using a graphite electrode
- Effects of plasma etching on DLC films
- Electrical and structural characterization of DLC films deposited by magnetron sputtering
- Silicon surface roughness induced by reactive ion etching processes, using a graphite electrode. (Em CD-Rom)
- Electrical and structural characterisation of DLC films deposited by magnetron sputtering
- Characterization of mode transitions for RF discharges in different gases
- Influence of methane addition on the characteristics of magnetron sputtered hydrogenated carbon films
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