End-point detection of polymer etching using Langmuir probes (2000)
- Authors:
- USP affiliated authors: VERDONCK, PATRICK BERNARD - EP ; MANSANO, RONALDO DOMINGUES - EP ; MACIEL, HOMERO SANTIAGO - EP
- Unidade: EP
- DOI: 10.1109/27.887774
- Assunto: CIRCUITOS INTEGRADOS
- Language: Inglês
- Imprenta:
- Source:
- Título: IEEE Transactions on Plasma Science
- ISSN: 0093-3813
- Volume/Número/Paginação/Ano: v. 28, n. 3, p. 1043-1049, Jun. 2000
- Este artigo NÃO possui versão em acesso aberto
-
Status: Nenhuma versão em acesso aberto identificada -
ABNT
CASTRO, Raul Murete de et al. End-point detection of polymer etching using Langmuir probes. IEEE Transactions on Plasma Science, v. 28, n. Ju 2000, p. 1043-1049, 2000Tradução . . Disponível em: https://doi.org/10.1109/27.887774. Acesso em: 14 mar. 2026. -
APA
Castro, R. M. de, Verdonck, P. B., Pisani, M. B., Mansano, R. D., Cirino, G. A., Maciel, H. S., & Massi, M. (2000). End-point detection of polymer etching using Langmuir probes. IEEE Transactions on Plasma Science, 28( Ju 2000), 1043-1049. doi:10.1109/27.887774 -
NLM
Castro RM de, Verdonck PB, Pisani MB, Mansano RD, Cirino GA, Maciel HS, Massi M. End-point detection of polymer etching using Langmuir probes [Internet]. IEEE Transactions on Plasma Science. 2000 ; 28( Ju 2000): 1043-1049.[citado 2026 mar. 14 ] Available from: https://doi.org/10.1109/27.887774 -
Vancouver
Castro RM de, Verdonck PB, Pisani MB, Mansano RD, Cirino GA, Maciel HS, Massi M. End-point detection of polymer etching using Langmuir probes [Internet]. IEEE Transactions on Plasma Science. 2000 ; 28( Ju 2000): 1043-1049.[citado 2026 mar. 14 ] Available from: https://doi.org/10.1109/27.887774 - Silicon surface roughness induced by SF6-based reactive ion etching processes for micromachining applications
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