Characterization of mode transitions for RF discharges in different gases (2005)
- Authors:
- USP affiliated authors: VERDONCK, PATRICK BERNARD - EP ; MANSANO, RONALDO DOMINGUES - EP ; MACIEL, HOMERO SANTIAGO - EP
- Unidade: EP
- Assunto: MICROELETRÔNICA
- Language: Inglês
- Imprenta:
- Publisher: The Electrochemical Society
- Publisher place: Pennington
- Date published: 2005
- Source:
- Conference titles: International Symposium on Microelectronics Technology and Devices SBMICRO
-
ABNT
RODRIGUES, Bruno da Silva et al. Characterization of mode transitions for RF discharges in different gases. 2005, Anais.. Pennington: The Electrochemical Society, 2005. . Acesso em: 12 fev. 2026. -
APA
Rodrigues, B. da S., Verdonck, P. B., Maciel, H. S., & Mansano, R. D. (2005). Characterization of mode transitions for RF discharges in different gases. In Proceedings v. 2005-08. Microelectronics Technology and Devices SBMICRO 2005. Pennington: The Electrochemical Society. -
NLM
Rodrigues B da S, Verdonck PB, Maciel HS, Mansano RD. Characterization of mode transitions for RF discharges in different gases. Proceedings v. 2005-08. Microelectronics Technology and Devices SBMICRO 2005. 2005 ;[citado 2026 fev. 12 ] -
Vancouver
Rodrigues B da S, Verdonck PB, Maciel HS, Mansano RD. Characterization of mode transitions for RF discharges in different gases. Proceedings v. 2005-08. Microelectronics Technology and Devices SBMICRO 2005. 2005 ;[citado 2026 fev. 12 ] - Silicon surface roughness induced by SF6-based reactive ion etching processes for micromachining applications
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