Silicon surface roughness induced by reactive ion etching processes, using a graphite electrode. (Em CD-Rom) (1997)
- Authors:
- USP affiliated authors: VERDONCK, PATRICK BERNARD - EP ; MACIEL, HOMERO SANTIAGO - EP ; MANSANO, RONALDO DOMINGUES - EP
- Unidade: EP
- Subjects: CIRCUITOS INTEGRADOS; SEMICONDUTORES
- Language: Inglês
- Imprenta:
- Publisher: SBMICRO/EFEI
- Publisher place: Itajubá
- Date published: 1997
- Source:
- Título: Proceedings
- Conference titles: Conference of the Brazilian Microelectronics Society
-
ABNT
VERDONCK, Patrick Bernard e MANSANO, Ronaldo Domingues e MACIEL, Homero Santiago. Silicon surface roughness induced by reactive ion etching processes, using a graphite electrode. (Em CD-Rom). 1997, Anais.. Itajubá: SBMICRO/EFEI, 1997. . Acesso em: 27 dez. 2025. -
APA
Verdonck, P. B., Mansano, R. D., & Maciel, H. S. (1997). Silicon surface roughness induced by reactive ion etching processes, using a graphite electrode. (Em CD-Rom). In Proceedings. Itajubá: SBMICRO/EFEI. -
NLM
Verdonck PB, Mansano RD, Maciel HS. Silicon surface roughness induced by reactive ion etching processes, using a graphite electrode. (Em CD-Rom). Proceedings. 1997 ;[citado 2025 dez. 27 ] -
Vancouver
Verdonck PB, Mansano RD, Maciel HS. Silicon surface roughness induced by reactive ion etching processes, using a graphite electrode. (Em CD-Rom). Proceedings. 1997 ;[citado 2025 dez. 27 ] - Characterization of mode transitions for RF discharges in different gases
- Influence of methane addition on the characteristics of magnetron sputtered hydrogenated carbon films
- Effects of plasma etching on DLC films
- Electrical and structural characterisation of DLC films deposited by magnetron sputtering
- Silicon wall profiles generated by isotropic dry etching process
- A comparative study of single and double langmuir probe techniques for RF plasma characterization
- Performance characterization of an RIE reactor with built-in RF excitation antenna
- Silicon surface roughness induced by SF6-based reactive ion etching processes for micromachining applications
- Anisotropic reactive ion etching in silicon, using a graphite electrode
- The applicability of Langmuir probes for end point detection of polymer etching
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