The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films (2003)
- Authors:
- USP affiliated authors: MANSANO, RONALDO DOMINGUES - EP ; MACIEL, HOMERO SANTIAGO - EP
- Unidade: EP
- DOI: 10.1016/s0026-2692(03)00079-x
- Assunto: PLASMA (MICROELETRÔNICA)
- Language: Inglês
- Imprenta:
- Source:
- Título: Microelectronics Journal
- ISSN: 0026-2692
- Volume/Número/Paginação/Ano: v. 34, n. 5-8, May/Aug. 2003
- Este periódico é de acesso aberto
- Este artigo NÃO é de acesso aberto
-
ABNT
GUERINO, M. et al. The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films. Microelectronics Journal, v. 34, n. 5-8, 2003Tradução . . Disponível em: https://doi.org/10.1016/s0026-2692(03)00079-x. Acesso em: 19 fev. 2026. -
APA
Guerino, M., Massi, M., Maciel, H. S., Otani, C., & Mansano, R. D. (2003). The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films. Microelectronics Journal, 34( 5-8). doi:10.1016/s0026-2692(03)00079-x -
NLM
Guerino M, Massi M, Maciel HS, Otani C, Mansano RD. The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films [Internet]. Microelectronics Journal. 2003 ; 34( 5-8):[citado 2026 fev. 19 ] Available from: https://doi.org/10.1016/s0026-2692(03)00079-x -
Vancouver
Guerino M, Massi M, Maciel HS, Otani C, Mansano RD. The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films [Internet]. Microelectronics Journal. 2003 ; 34( 5-8):[citado 2026 fev. 19 ] Available from: https://doi.org/10.1016/s0026-2692(03)00079-x - Plasma etching of DLC films for microfluidic channels
- Modelamento da corrosao de resiste por plasma usando o metodo de superficie de resposta
- Deep trench etching in silicon with fluorine containing plasmas
- Silicon surface roughness induced by SF6-based reactive ion etching processes for micromachining applications
- End-point detection of polymer etching using Langmuir probes
- Performance characterization of an RIE reactor with built-in RF excitation antenna
- Characteristics of silicon etching processes in a RIE reactor modified to include a built-in radio frequency excitation coil. (em CD-Rom)
- Anisotropic reactive ion etching in silicon, using a graphite electrode
- Effects of plasma etching on DLC films
- Electrical and structural characterization of DLC films deposited by magnetron sputtering
Informações sobre o DOI: 10.1016/s0026-2692(03)00079-x (Fonte: oaDOI API)
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