Plasma etching of DLC films for microfluidic channels (2003)
- Authors:
- USP affiliated authors: MANSANO, RONALDO DOMINGUES - EP ; MACIEL, HOMERO SANTIAGO - EP
- Unidade: EP
- DOI: 10.1016/s0026-2692(03)00077-6
- Assunto: PLASMA (MICROELETRÔNICA)
- Language: Inglês
- Imprenta:
- Source:
- Título: Microelectronics Journal,
- ISSN: 0026-2692
- Volume/Número/Paginação/Ano: v. 34, n. 5-8, p. 635-638, May/Aug. 2003
- Este periódico é de acesso aberto
- Este artigo NÃO é de acesso aberto
-
ABNT
MASSI, Marcos et al. Plasma etching of DLC films for microfluidic channels. Microelectronics Journal, v. 34, n. 5-8, p. 635-638, 2003Tradução . . Disponível em: https://doi.org/10.1016/s0026-2692(03)00077-6. Acesso em: 19 fev. 2026. -
APA
Massi, M., Jaramillo Ocampo, J. M., Maciel, H. S., Grigorov, K., Otani, C., Santos, L. V., & Mansano, R. D. (2003). Plasma etching of DLC films for microfluidic channels. Microelectronics Journal,, 34( 5-8), 635-638. doi:10.1016/s0026-2692(03)00077-6 -
NLM
Massi M, Jaramillo Ocampo JM, Maciel HS, Grigorov K, Otani C, Santos LV, Mansano RD. Plasma etching of DLC films for microfluidic channels [Internet]. Microelectronics Journal,. 2003 ; 34( 5-8): 635-638.[citado 2026 fev. 19 ] Available from: https://doi.org/10.1016/s0026-2692(03)00077-6 -
Vancouver
Massi M, Jaramillo Ocampo JM, Maciel HS, Grigorov K, Otani C, Santos LV, Mansano RD. Plasma etching of DLC films for microfluidic channels [Internet]. Microelectronics Journal,. 2003 ; 34( 5-8): 635-638.[citado 2026 fev. 19 ] Available from: https://doi.org/10.1016/s0026-2692(03)00077-6 - The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films
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Informações sobre o DOI: 10.1016/s0026-2692(03)00077-6 (Fonte: oaDOI API)
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