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Artigo de periodico
MISHEMT intrinsic voltage gain under multiple channel output characteristics (2023)
Canales, Bruno Godoy; Perina, Welder Fernandes; Martino, João Antonio ; Simoen, Eddy ; Peralagu, Uthayasankaran; Collaert, Nadine ; Agopian, Paula Ghedini Der
Source: Semiconductor Science and Technology. Unidade: EP
Subjects: TRANSISTORES, SEMICONDUTORES
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ABNT
CANALES, Bruno Godoy et al. MISHEMT intrinsic voltage gain under multiple channel output characteristics. Semiconductor Science and Technology, v. 38, n. 11, p. 1-6, 2023Tradução . . Disponível em: https://doi.org/10.1088/1361-6641/acfa1f. Acesso em: 05 dez. 2025.
APA
Canales, B. G., Perina, W. F., Martino, J. A., Simoen, E., Peralagu, U., Collaert, N., & Agopian, P. G. D. (2023). MISHEMT intrinsic voltage gain under multiple channel output characteristics. Semiconductor Science and Technology, 38( 11), 1-6. doi:10.1088/1361-6641/acfa1f
NLM
Canales BG, Perina WF, Martino JA, Simoen E, Peralagu U, Collaert N, Agopian PGD. MISHEMT intrinsic voltage gain under multiple channel output characteristics [Internet]. Semiconductor Science and Technology. 2023 ; 38( 11): 1-6.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/1361-6641/acfa1f
Vancouver
Canales BG, Perina WF, Martino JA, Simoen E, Peralagu U, Collaert N, Agopian PGD. MISHEMT intrinsic voltage gain under multiple channel output characteristics [Internet]. Semiconductor Science and Technology. 2023 ; 38( 11): 1-6.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/1361-6641/acfa1f
Artigo de periodico
Structural and optical properties of n-type and p-type GaAs(1−x)Bix thin films grown by molecular beam epitaxy on (311)B GaAs substrates (2021)
Souza, Daniele de; Alhassan, Sultan; Alotaibi, Saud; Alhassni, Amra; Almunyif, Amjad; Albalawi, Hindi; Kazakov, Igor P.; Klekovkin, Alexey V.; ZinovEv, Sergey A; Likhachev, Igor A.; Pashaev, Elkhan M.; Souto, Sérgio Paulo Amaral ; Gobato, Yara Galvao ; Galeti, Helder Vinícius Avanço; Henini, Mohamed
Source: Semiconductor Science and Technology. Unidade: FZEA
Subjects: SEMICONDUTORES, EPITAXIA POR FEIXE MOLECULAR
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SOUZA, Daniele de et al. Structural and optical properties of n-type and p-type GaAs(1−x)Bix thin films grown by molecular beam epitaxy on (311)B GaAs substrates. Semiconductor Science and Technology, v. 36, n. 7, p. 1-12, 2021Tradução . . Disponível em: https://doi.org/10.1088/1361-6641/abf3d1. Acesso em: 05 dez. 2025.
APA
Souza, D. de, Alhassan, S., Alotaibi, S., Alhassni, A., Almunyif, A., Albalawi, H., et al. (2021). Structural and optical properties of n-type and p-type GaAs(1−x)Bix thin films grown by molecular beam epitaxy on (311)B GaAs substrates. Semiconductor Science and Technology, 36( 7), 1-12. doi:10.1088/1361-6641/abf3d1
NLM
Souza D de, Alhassan S, Alotaibi S, Alhassni A, Almunyif A, Albalawi H, Kazakov IP, Klekovkin AV, ZinovEv SA, Likhachev IA, Pashaev EM, Souto SPA, Gobato YG, Galeti HVA, Henini M. Structural and optical properties of n-type and p-type GaAs(1−x)Bix thin films grown by molecular beam epitaxy on (311)B GaAs substrates [Internet]. Semiconductor Science and Technology. 2021 ; 36( 7): 1-12.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/1361-6641/abf3d1
Vancouver
Souza D de, Alhassan S, Alotaibi S, Alhassni A, Almunyif A, Albalawi H, Kazakov IP, Klekovkin AV, ZinovEv SA, Likhachev IA, Pashaev EM, Souto SPA, Gobato YG, Galeti HVA, Henini M. Structural and optical properties of n-type and p-type GaAs(1−x)Bix thin films grown by molecular beam epitaxy on (311)B GaAs substrates [Internet]. Semiconductor Science and Technology. 2021 ; 36( 7): 1-12.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/1361-6641/abf3d1
Artigo de periodico
Performance of differential pair circuits designed with line tunnel FET devices at different temperatures (2018)
Martino, Márcio Dalla Valle; Claeys, Cor ; Agopian, Paula Ghedini Der ; Rooyackers, Rita; Simoen, Eddy ; Martino, João Antonio
Source: Semiconductor Science and Technology. Unidade: EP
Assunto: SEMICONDUTORES
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MARTINO, Márcio Dalla Valle et al. Performance of differential pair circuits designed with line tunnel FET devices at different temperatures. Semiconductor Science and Technology, v. 33, n. 7, p. 075012, 2018Tradução . . Disponível em: https://doi.org/10.1088/1361-6641/aac4fd. Acesso em: 05 dez. 2025.
APA
Martino, M. D. V., Claeys, C., Agopian, P. G. D., Rooyackers, R., Simoen, E., & Martino, J. A. (2018). Performance of differential pair circuits designed with line tunnel FET devices at different temperatures. Semiconductor Science and Technology, 33( 7), 075012. doi:10.1088/1361-6641/aac4fd
NLM
Martino MDV, Claeys C, Agopian PGD, Rooyackers R, Simoen E, Martino JA. Performance of differential pair circuits designed with line tunnel FET devices at different temperatures [Internet]. Semiconductor Science and Technology. 2018 ; 33( 7): 075012.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/1361-6641/aac4fd
Vancouver
Martino MDV, Claeys C, Agopian PGD, Rooyackers R, Simoen E, Martino JA. Performance of differential pair circuits designed with line tunnel FET devices at different temperatures [Internet]. Semiconductor Science and Technology. 2018 ; 33( 7): 075012.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/1361-6641/aac4fd
Artigo de periodico
Exciton localization and structural disorder of GaAs1−xBix/GaAs quantum wells grown by molecular beam epitaxy on (311)B GaAs substrates (2018)
Prando, G. A.; Gordo, Vanessa Orsi; Puustinen, J.; Hilska, J.; Alghamdi, H. M.; Som, G; Gunes, M; Akyol, M; Souto, Sérgio Paulo Amaral; Rodrigues, Ariano de Giovanni; Galeti, Helder Vinícius Avanço; Henini, M; Gobato, Yara Galvao; Guina, Mircea
Source: Semiconductor Science and Technology. Unidade: FZEA
Subjects: FOTOLUMINESCÊNCIA, EPITAXIA POR FEIXE MOLECULAR, SEMICONDUTORES
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PRANDO, G. A. et al. Exciton localization and structural disorder of GaAs1−xBix/GaAs quantum wells grown by molecular beam epitaxy on (311)B GaAs substrates. Semiconductor Science and Technology, v. 33, n. 8, p. 1-7, 2018Tradução . . Disponível em: https://doi.org/10.1088/1361-6641/aad02e. Acesso em: 05 dez. 2025.
APA
Prando, G. A., Gordo, V. O., Puustinen, J., Hilska, J., Alghamdi, H. M., Som, G., et al. (2018). Exciton localization and structural disorder of GaAs1−xBix/GaAs quantum wells grown by molecular beam epitaxy on (311)B GaAs substrates. Semiconductor Science and Technology, 33( 8), 1-7. doi:10.1088/1361-6641/aad02e
NLM
Prando GA, Gordo VO, Puustinen J, Hilska J, Alghamdi HM, Som G, Gunes M, Akyol M, Souto SPA, Rodrigues A de G, Galeti HVA, Henini M, Gobato YG, Guina M. Exciton localization and structural disorder of GaAs1−xBix/GaAs quantum wells grown by molecular beam epitaxy on (311)B GaAs substrates [Internet]. Semiconductor Science and Technology. 2018 ; 33( 8): 1-7.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/1361-6641/aad02e
Vancouver
Prando GA, Gordo VO, Puustinen J, Hilska J, Alghamdi HM, Som G, Gunes M, Akyol M, Souto SPA, Rodrigues A de G, Galeti HVA, Henini M, Gobato YG, Guina M. Exciton localization and structural disorder of GaAs1−xBix/GaAs quantum wells grown by molecular beam epitaxy on (311)B GaAs substrates [Internet]. Semiconductor Science and Technology. 2018 ; 33( 8): 1-7.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/1361-6641/aad02e
Artigo de periodico
Analysis of proton irradiated n- and p-type strained FinFETs at low temperatures down to 100 K (2018)
Caparroz, Luís Felipe Vicentis; Agopian, Paula Ghedini Der ; Claeys, Cor ; Simoen, Eddy ; Bordallo, Caio Cesar Mendes ; Martino, João Antonio
Source: Semiconductor Science and Technology. Unidades: EP, EACH
Subjects: TEMPERATURA, SEMICONDUTORES
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CAPARROZ, Luís Felipe Vicentis et al. Analysis of proton irradiated n- and p-type strained FinFETs at low temperatures down to 100 K. Semiconductor Science and Technology, v. 33, n. 6, p. 065003, 2018Tradução . . Disponível em: https://doi.org/10.1088/1361-6641/aabab3. Acesso em: 05 dez. 2025.
APA
Caparroz, L. F. V., Agopian, P. G. D., Claeys, C., Simoen, E., Bordallo, C. C. M., & Martino, J. A. (2018). Analysis of proton irradiated n- and p-type strained FinFETs at low temperatures down to 100 K. Semiconductor Science and Technology, 33( 6), 065003. doi:10.1088/1361-6641/aabab3
NLM
Caparroz LFV, Agopian PGD, Claeys C, Simoen E, Bordallo CCM, Martino JA. Analysis of proton irradiated n- and p-type strained FinFETs at low temperatures down to 100 K [Internet]. Semiconductor Science and Technology. 2018 ; 33( 6): 065003.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/1361-6641/aabab3
Vancouver
Caparroz LFV, Agopian PGD, Claeys C, Simoen E, Bordallo CCM, Martino JA. Analysis of proton irradiated n- and p-type strained FinFETs at low temperatures down to 100 K [Internet]. Semiconductor Science and Technology. 2018 ; 33( 6): 065003.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/1361-6641/aabab3
Artigo de periodico
Analysis of current mirror circuits designed with line tunnel FET devices at different temperatures (2017)
Martino, Márcio Dalla Valle; Claeys, Cor ; Rooyackers, Rita; Simoen, Eddy ; Agopian, Paula Ghedini Der ; Vandooren, A; Martino, João Antonio
Source: Semiconductor Science and Technology. Unidade: EP
Subjects: TRANSISTORES, SEMICONDUTORES
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ABNT
MARTINO, Márcio Dalla Valle et al. Analysis of current mirror circuits designed with line tunnel FET devices at different temperatures. Semiconductor Science and Technology, v. 32, n. 5, p. 055015, 2017Tradução . . Disponível em: https://doi.org/10.1088/1361-6641/aa6764. Acesso em: 05 dez. 2025.
APA
Martino, M. D. V., Claeys, C., Rooyackers, R., Simoen, E., Agopian, P. G. D., Vandooren, A., & Martino, J. A. (2017). Analysis of current mirror circuits designed with line tunnel FET devices at different temperatures. Semiconductor Science and Technology, 32( 5), 055015. doi:10.1088/1361-6641/aa6764
NLM
Martino MDV, Claeys C, Rooyackers R, Simoen E, Agopian PGD, Vandooren A, Martino JA. Analysis of current mirror circuits designed with line tunnel FET devices at different temperatures [Internet]. Semiconductor Science and Technology. 2017 ; 32( 5): 055015.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/1361-6641/aa6764
Vancouver
Martino MDV, Claeys C, Rooyackers R, Simoen E, Agopian PGD, Vandooren A, Martino JA. Analysis of current mirror circuits designed with line tunnel FET devices at different temperatures [Internet]. Semiconductor Science and Technology. 2017 ; 32( 5): 055015.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/1361-6641/aa6764
Artigo de periodico
Analog parameters of solid source Zn diffusion In X Ga1−X As nTFETs down to 10 K (2016)
Bordallo, Caio Cesar Mendes ; Vandooren, A; Rooyackers, Rita; Mols, Yannick; Alian, A; Agopian, Paula Ghedini Der ; Martino, João Antonio
Source: Semiconductor Science and Technology. Unidade: EP
Subjects: SEMICONDUTORES, MICROELETRÔNICA
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ABNT
BORDALLO, Caio Cesar Mendes et al. Analog parameters of solid source Zn diffusion In X Ga1−X As nTFETs down to 10 K. Semiconductor Science and Technology, v. 31, n. 12, p. 124001, 2016Tradução . . Disponível em: https://doi.org/10.1088/0268-1242/31/12/124001. Acesso em: 05 dez. 2025.
APA
Bordallo, C. C. M., Vandooren, A., Rooyackers, R., Mols, Y., Alian, A., Agopian, P. G. D., & Martino, J. A. (2016). Analog parameters of solid source Zn diffusion In X Ga1−X As nTFETs down to 10 K. Semiconductor Science and Technology, 31( 12), 124001. doi:10.1088/0268-1242/31/12/124001
NLM
Bordallo CCM, Vandooren A, Rooyackers R, Mols Y, Alian A, Agopian PGD, Martino JA. Analog parameters of solid source Zn diffusion In X Ga1−X As nTFETs down to 10 K [Internet]. Semiconductor Science and Technology. 2016 ; 31( 12): 124001.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/31/12/124001
Vancouver
Bordallo CCM, Vandooren A, Rooyackers R, Mols Y, Alian A, Agopian PGD, Martino JA. Analog parameters of solid source Zn diffusion In X Ga1−X As nTFETs down to 10 K [Internet]. Semiconductor Science and Technology. 2016 ; 31( 12): 124001.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/31/12/124001
Artigo de periodico
Improved operation of graded-channel SOI nMOSFETs down to liquid helium temperature (2016)
Pavanello, Marcelo Antonio ; Souza, Michelly de; Ribeiro, Thales Augusto; Martino, João Antonio ; Flandre, Denis
Source: Semiconductor Science and Technology. Unidade: EP
Subjects: SILÍCIO, SEMICONDUTORES
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ABNT
PAVANELLO, Marcelo Antonio et al. Improved operation of graded-channel SOI nMOSFETs down to liquid helium temperature. Semiconductor Science and Technology, v. 31, n. 11, p. 114005, 2016Tradução . . Disponível em: https://doi.org/10.1088/0268-1242/31/11/114005. Acesso em: 05 dez. 2025.
APA
Pavanello, M. A., Souza, M. de, Ribeiro, T. A., Martino, J. A., & Flandre, D. (2016). Improved operation of graded-channel SOI nMOSFETs down to liquid helium temperature. Semiconductor Science and Technology, 31( 11), 114005. doi:10.1088/0268-1242/31/11/114005
NLM
Pavanello MA, Souza M de, Ribeiro TA, Martino JA, Flandre D. Improved operation of graded-channel SOI nMOSFETs down to liquid helium temperature [Internet]. Semiconductor Science and Technology. 2016 ; 31( 11): 114005.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/31/11/114005
Vancouver
Pavanello MA, Souza M de, Ribeiro TA, Martino JA, Flandre D. Improved operation of graded-channel SOI nMOSFETs down to liquid helium temperature [Internet]. Semiconductor Science and Technology. 2016 ; 31( 11): 114005.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/31/11/114005
Artigo de periodico
Split CV mobility at low temperature operation of Ge pFinFETs fabricated with STI first and last processes (2016)
Oliveira, Alberto Vinicius de; Agopian, Paula Ghedini Der ; Simoen, Eddy ; Langer, Robert; Collaert, Nadine ; Thean, Aaron; Claeys, Cor ; Martino, João Antonio
Source: Semiconductor Science and Technology. Unidade: EP
Subjects: SEMICONDUTORES, MICROELETRÔNICA
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ABNT
OLIVEIRA, Alberto Vinicius de et al. Split CV mobility at low temperature operation of Ge pFinFETs fabricated with STI first and last processes. Semiconductor Science and Technology, v. 31, n. 11, p. 114002 , 2016Tradução . . Disponível em: https://doi.org/10.1088/0268-1242/31/11/114002. Acesso em: 05 dez. 2025.
APA
Oliveira, A. V. de, Agopian, P. G. D., Simoen, E., Langer, R., Collaert, N., Thean, A., et al. (2016). Split CV mobility at low temperature operation of Ge pFinFETs fabricated with STI first and last processes. Semiconductor Science and Technology, 31( 11), 114002 . doi:10.1088/0268-1242/31/11/114002
NLM
Oliveira AV de, Agopian PGD, Simoen E, Langer R, Collaert N, Thean A, Claeys C, Martino JA. Split CV mobility at low temperature operation of Ge pFinFETs fabricated with STI first and last processes [Internet]. Semiconductor Science and Technology. 2016 ; 31( 11): 114002 .[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/31/11/114002
Vancouver
Oliveira AV de, Agopian PGD, Simoen E, Langer R, Collaert N, Thean A, Claeys C, Martino JA. Split CV mobility at low temperature operation of Ge pFinFETs fabricated with STI first and last processes [Internet]. Semiconductor Science and Technology. 2016 ; 31( 11): 114002 .[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/31/11/114002
Artigo de periodico
Stability and accuracy control of k . p parameters (2016)
Bastos, Carlos M. O.; Sabino, Fernando P.; Faria Junior, Paulo E.; Campos, Tiago; Silva, Juarez Lopes Ferreira da ; Sipahi, Guilherme Matos
Source: Semiconductor Science and Technology. Unidades: IQSC, IFSC
Subjects: SEMICONDUTORES, MATERIAIS NANOESTRUTURADOS, SPIN, SISTEMAS HAMILTONIANOS
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ABNT
BASTOS, Carlos M. O. et al. Stability and accuracy control of k . p parameters. Semiconductor Science and Technology, v. 31, n. 10, p. 105002-1-105002-10, 2016Tradução . . Disponível em: https://doi.org/10.1088/0268-1242/31/10/105002. Acesso em: 05 dez. 2025.
APA
Bastos, C. M. O., Sabino, F. P., Faria Junior, P. E., Campos, T., Silva, J. L. F. da, & Sipahi, G. M. (2016). Stability and accuracy control of k . p parameters. Semiconductor Science and Technology, 31( 10), 105002-1-105002-10. doi:10.1088/0268-1242/31/10/105002
NLM
Bastos CMO, Sabino FP, Faria Junior PE, Campos T, Silva JLF da, Sipahi GM. Stability and accuracy control of k . p parameters [Internet]. Semiconductor Science and Technology. 2016 ; 31( 10): 105002-1-105002-10.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/31/10/105002
Vancouver
Bastos CMO, Sabino FP, Faria Junior PE, Campos T, Silva JLF da, Sipahi GM. Stability and accuracy control of k . p parameters [Internet]. Semiconductor Science and Technology. 2016 ; 31( 10): 105002-1-105002-10.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/31/10/105002
Artigo de periodico
Performance of TFET and FinFET devices applied to current mirrors for different dimensions and temperatures (2016)
Martino, Márcio Dalla Valle; Martino, João Antonio ; Agopian, Paula Ghedini Der ; Vandooren, A; Rooyackers, Rita; Simoen, Eddy ; Claeys, Cor
Source: Semiconductor Science and Technology. Unidade: EP
Assunto: SEMICONDUTORES
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ABNT
MARTINO, Márcio Dalla Valle et al. Performance of TFET and FinFET devices applied to current mirrors for different dimensions and temperatures. Semiconductor Science and Technology, v. 31, n. 5, 2016Tradução . . Disponível em: https://doi.org/10.1088/0268-1242/31/5/055001. Acesso em: 05 dez. 2025.
APA
Martino, M. D. V., Martino, J. A., Agopian, P. G. D., Vandooren, A., Rooyackers, R., Simoen, E., & Claeys, C. (2016). Performance of TFET and FinFET devices applied to current mirrors for different dimensions and temperatures. Semiconductor Science and Technology, 31( 5). doi:10.1088/0268-1242/31/5/055001
NLM
Martino MDV, Martino JA, Agopian PGD, Vandooren A, Rooyackers R, Simoen E, Claeys C. Performance of TFET and FinFET devices applied to current mirrors for different dimensions and temperatures [Internet]. Semiconductor Science and Technology. 2016 ; 31( 5):[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/31/5/055001
Vancouver
Martino MDV, Martino JA, Agopian PGD, Vandooren A, Rooyackers R, Simoen E, Claeys C. Performance of TFET and FinFET devices applied to current mirrors for different dimensions and temperatures [Internet]. Semiconductor Science and Technology. 2016 ; 31( 5):[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/31/5/055001
Artigo de periodico
Analog performance of standard and uniaxial strained triple-gate SOI FinFETs under x-ray radiation (2014)
Bordallo, Caio Cesar Mendes ; Martino, João Antonio ; Teixeira, Fernando Ferrari; Silveira, Marcilei Aparecida Guazzelli da; Agopian, Paula Ghedini Der ; Simoen, Eddy ; Claeys, Cor
Source: Semiconductor Science and Technology. Unidade: EP
Subjects: RAIOS X, MICROELETRÔNICA
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ABNT
BORDALLO, Caio Cesar Mendes et al. Analog performance of standard and uniaxial strained triple-gate SOI FinFETs under x-ray radiation. Semiconductor Science and Technology, v. 29, n. 12, p. 125015, 2014Tradução . . Disponível em: https://doi.org/10.1088/0268-1242/29/12/125015. Acesso em: 05 dez. 2025.
APA
Bordallo, C. C. M., Martino, J. A., Teixeira, F. F., Silveira, M. A. G. da, Agopian, P. G. D., Simoen, E., & Claeys, C. (2014). Analog performance of standard and uniaxial strained triple-gate SOI FinFETs under x-ray radiation. Semiconductor Science and Technology, 29( 12), 125015. doi:10.1088/0268-1242/29/12/125015
NLM
Bordallo CCM, Martino JA, Teixeira FF, Silveira MAG da, Agopian PGD, Simoen E, Claeys C. Analog performance of standard and uniaxial strained triple-gate SOI FinFETs under x-ray radiation [Internet]. Semiconductor Science and Technology. 2014 ; 29( 12): 125015.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/29/12/125015
Vancouver
Bordallo CCM, Martino JA, Teixeira FF, Silveira MAG da, Agopian PGD, Simoen E, Claeys C. Analog performance of standard and uniaxial strained triple-gate SOI FinFETs under x-ray radiation [Internet]. Semiconductor Science and Technology. 2014 ; 29( 12): 125015.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/29/12/125015
Artigo de periodico
Trapezoidal SOI FinFET analog parameters' dependence on cross-section shape (2009)
Bühler, Rudolf Theoderich; Giacomini, R; Pavanello, Marcelo Antonio ; Martino, João Antonio
Source: Semiconductor Science and Technology. Unidade: EP
Assunto: MICROELETRÔNICA
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ABNT
BÜHLER, Rudolf Theoderich et al. Trapezoidal SOI FinFET analog parameters' dependence on cross-section shape. Semiconductor Science and Technology, v. 24, n. 11, 2009Tradução . . Disponível em: https://doi.org/10.1088/0268-1242/24/11/115017. Acesso em: 05 dez. 2025.
APA
Bühler, R. T., Giacomini, R., Pavanello, M. A., & Martino, J. A. (2009). Trapezoidal SOI FinFET analog parameters' dependence on cross-section shape. Semiconductor Science and Technology, 24( 11). doi:10.1088/0268-1242/24/11/115017
NLM
Bühler RT, Giacomini R, Pavanello MA, Martino JA. Trapezoidal SOI FinFET analog parameters' dependence on cross-section shape [Internet]. Semiconductor Science and Technology. 2009 ; 24( 11):[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/24/11/115017
Vancouver
Bühler RT, Giacomini R, Pavanello MA, Martino JA. Trapezoidal SOI FinFET analog parameters' dependence on cross-section shape [Internet]. Semiconductor Science and Technology. 2009 ; 24( 11):[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/24/11/115017
Artigo de periodico
Structure evaluation of submicrometre silicon chips removed by diamond turning (2007)
Jasinevicius, Renato Goulart ; Duduch, Jaime Gilberto ; Pizani, Paulo Sérgio
Source: Semiconductor Science and Technology. Unidade: EESC
Subjects: SEMICONDUTORES, MICROSCÓPIO ELETRÔNICO, DIAMANTE
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ABNT
JASINEVICIUS, Renato Goulart e DUDUCH, Jaime Gilberto e PIZANI, Paulo Sérgio. Structure evaluation of submicrometre silicon chips removed by diamond turning. Semiconductor Science and Technology, v. 22, n. 5, p. 561-573, 2007Tradução . . Disponível em: https://doi.org/10.1088/0268-1242/22/5/019. Acesso em: 05 dez. 2025.
APA
Jasinevicius, R. G., Duduch, J. G., & Pizani, P. S. (2007). Structure evaluation of submicrometre silicon chips removed by diamond turning. Semiconductor Science and Technology, 22( 5), 561-573. doi:10.1088/0268-1242/22/5/019
NLM
Jasinevicius RG, Duduch JG, Pizani PS. Structure evaluation of submicrometre silicon chips removed by diamond turning [Internet]. Semiconductor Science and Technology. 2007 ; 22( 5): 561-573.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/22/5/019
Vancouver
Jasinevicius RG, Duduch JG, Pizani PS. Structure evaluation of submicrometre silicon chips removed by diamond turning [Internet]. Semiconductor Science and Technology. 2007 ; 22( 5): 561-573.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/22/5/019
Artigo de periodico
Photoluminescence measurements on cubic InGaN layers deposited on a SiC substrate (2006)
Pacheco-Salazar, D G; Leite, J. R.; Cerdeira, F; Meneses, E A; Li, S F; As, D J; Lischka, K
Source: Semiconductor Science and Technology. Unidade: IF
Subjects: MATÉRIA CONDENSADA, ESPALHAMENTO
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
PACHECO-SALAZAR, D G et al. Photoluminescence measurements on cubic InGaN layers deposited on a SiC substrate. Semiconductor Science and Technology, v. 21, n. 7, p. 846-851, 2006Tradução . . Disponível em: https://doi.org/10.1088/0268-1242/21/7/003. Acesso em: 05 dez. 2025.
APA
Pacheco-Salazar, D. G., Leite, J. R., Cerdeira, F., Meneses, E. A., Li, S. F., As, D. J., & Lischka, K. (2006). Photoluminescence measurements on cubic InGaN layers deposited on a SiC substrate. Semiconductor Science and Technology, 21( 7), 846-851. doi:10.1088/0268-1242/21/7/003
NLM
Pacheco-Salazar DG, Leite JR, Cerdeira F, Meneses EA, Li SF, As DJ, Lischka K. Photoluminescence measurements on cubic InGaN layers deposited on a SiC substrate [Internet]. Semiconductor Science and Technology. 2006 ; 21( 7): 846-851.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/21/7/003
Vancouver
Pacheco-Salazar DG, Leite JR, Cerdeira F, Meneses EA, Li SF, As DJ, Lischka K. Photoluminescence measurements on cubic InGaN layers deposited on a SiC substrate [Internet]. Semiconductor Science and Technology. 2006 ; 21( 7): 846-851.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/21/7/003
Artigo de periodico
Anisotropy of the cyclotron mass in superlattices containing two populated minibands (2001)
Henriques, André Bohomoletz ; Souza, P. L.; Yavich, B
Source: Semiconductor Science and Technology. Unidade: IF
Subjects: SEMICONDUTORES, ESTRUTURA ELETRÔNICA, MATÉRIA CONDENSADA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
HENRIQUES, André Bohomoletz e SOUZA, P. L. e YAVICH, B. Anisotropy of the cyclotron mass in superlattices containing two populated minibands. Semiconductor Science and Technology, v. 16, n. 1, p. 1-6, 2001Tradução . . Disponível em: https://doi.org/10.1088/0268-1242/16/1/301. Acesso em: 05 dez. 2025.
APA
Henriques, A. B., Souza, P. L., & Yavich, B. (2001). Anisotropy of the cyclotron mass in superlattices containing two populated minibands. Semiconductor Science and Technology, 16( 1), 1-6. doi:10.1088/0268-1242/16/1/301
NLM
Henriques AB, Souza PL, Yavich B. Anisotropy of the cyclotron mass in superlattices containing two populated minibands [Internet]. Semiconductor Science and Technology. 2001 ; 16( 1): 1-6.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/16/1/301
Vancouver
Henriques AB, Souza PL, Yavich B. Anisotropy of the cyclotron mass in superlattices containing two populated minibands [Internet]. Semiconductor Science and Technology. 2001 ; 16( 1): 1-6.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/16/1/301
Artigo de periodico
Micro-raman analysis of cubic GaN layers grown by MBE on (001) GaAs substrate (1999)
Tabata, A.; Lima, A. P.; Leite, J. R.; Lemos, V.; Schikora, D.; Schottker, B.; Kohler, U.; As, D. J.; Lischka, K.
Source: Semiconductor Science and Technology. Unidade: IF
Assunto: ENGENHARIA MECÂNICA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
TABATA, A. et al. Micro-raman analysis of cubic GaN layers grown by MBE on (001) GaAs substrate. Semiconductor Science and Technology, v. 14, n. 4, p. 318-322, 1999Tradução . . Disponível em: https://doi.org/10.1088/0268-1242/14/4/005. Acesso em: 05 dez. 2025.
APA
Tabata, A., Lima, A. P., Leite, J. R., Lemos, V., Schikora, D., Schottker, B., et al. (1999). Micro-raman analysis of cubic GaN layers grown by MBE on (001) GaAs substrate. Semiconductor Science and Technology, 14( 4), 318-322. doi:10.1088/0268-1242/14/4/005
NLM
Tabata A, Lima AP, Leite JR, Lemos V, Schikora D, Schottker B, Kohler U, As DJ, Lischka K. Micro-raman analysis of cubic GaN layers grown by MBE on (001) GaAs substrate [Internet]. Semiconductor Science and Technology. 1999 ; 14( 4): 318-322.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/14/4/005
Vancouver
Tabata A, Lima AP, Leite JR, Lemos V, Schikora D, Schottker B, Kohler U, As DJ, Lischka K. Micro-raman analysis of cubic GaN layers grown by MBE on (001) GaAs substrate [Internet]. Semiconductor Science and Technology. 1999 ; 14( 4): 318-322.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/14/4/005
Artigo de periodico
Miniband structures and effective masses of n-type 'delta'-doping superlattices in 'GaN' (1998)
Rodrigues, S C P; Rosa, A L; Scolfaro, Luísa Maria Ribeiro; Beliaev, Dmitri; Leite, J. R.; Enderlein, R; Alves, J L A
Source: Semiconductor Science and Technology. Unidade: IF
Assunto: ENGENHARIA MECÂNICA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
RODRIGUES, S C P et al. Miniband structures and effective masses of n-type 'delta'-doping superlattices in 'GaN'. Semiconductor Science and Technology, v. 13, p. 981-988, 1998Tradução . . Acesso em: 05 dez. 2025.
APA
Rodrigues, S. C. P., Rosa, A. L., Scolfaro, L. M. R., Beliaev, D., Leite, J. R., Enderlein, R., & Alves, J. L. A. (1998). Miniband structures and effective masses of n-type 'delta'-doping superlattices in 'GaN'. Semiconductor Science and Technology, 13, 981-988.
NLM
Rodrigues SCP, Rosa AL, Scolfaro LMR, Beliaev D, Leite JR, Enderlein R, Alves JLA. Miniband structures and effective masses of n-type 'delta'-doping superlattices in 'GaN'. Semiconductor Science and Technology. 1998 ; 13 981-988.[citado 2025 dez. 05 ]
Vancouver
Rodrigues SCP, Rosa AL, Scolfaro LMR, Beliaev D, Leite JR, Enderlein R, Alves JLA. Miniband structures and effective masses of n-type 'delta'-doping superlattices in 'GaN'. Semiconductor Science and Technology. 1998 ; 13 981-988.[citado 2025 dez. 05 ]
Artigo de periodico
Photoreflectance spectra from GaAs HEMT structures reinvestigated: solution of an old controversy (1998)
Soares, J A N T; Enderlein, R; Beliaev, D; Leite, J. R.; Saito, M
Source: Semiconductor Science and Technology. Unidade: IF
Subjects: ENGENHARIA MECÂNICA, MATÉRIA CONDENSADA, MATÉRIA CONDENSADA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
SOARES, J A N T et al. Photoreflectance spectra from GaAs HEMT structures reinvestigated: solution of an old controversy. Semiconductor Science and Technology, v. 13, n. 12, p. 1418-1425, 1998Tradução . . Disponível em: https://doi.org/10.1088/0268-1242/13/12/015. Acesso em: 05 dez. 2025.
APA
Soares, J. A. N. T., Enderlein, R., Beliaev, D., Leite, J. R., & Saito, M. (1998). Photoreflectance spectra from GaAs HEMT structures reinvestigated: solution of an old controversy. Semiconductor Science and Technology, 13( 12), 1418-1425. doi:10.1088/0268-1242/13/12/015
NLM
Soares JANT, Enderlein R, Beliaev D, Leite JR, Saito M. Photoreflectance spectra from GaAs HEMT structures reinvestigated: solution of an old controversy [Internet]. Semiconductor Science and Technology. 1998 ; 13( 12): 1418-1425.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/13/12/015
Vancouver
Soares JANT, Enderlein R, Beliaev D, Leite JR, Saito M. Photoreflectance spectra from GaAs HEMT structures reinvestigated: solution of an old controversy [Internet]. Semiconductor Science and Technology. 1998 ; 13( 12): 1418-1425.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/13/12/015
Artigo de periodico
Single and periodically Si Delta-doped Inp grown by Lp-movpe (1997)
Yavich, B; Souza, P. L.; Pamplona-Pires, M; Henriques, André Bohomoletz ; Gonçalves, L. C. D.
Source: Semiconductor Science and Technology. Unidade: IF
Assunto: FÍSICA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
YAVICH, B et al. Single and periodically Si Delta-doped Inp grown by Lp-movpe. Semiconductor Science and Technology, v. 12, p. 481-484, 1997Tradução . . Acesso em: 05 dez. 2025.
APA
Yavich, B., Souza, P. L., Pamplona-Pires, M., Henriques, A. B., & Gonçalves, L. C. D. (1997). Single and periodically Si Delta-doped Inp grown by Lp-movpe. Semiconductor Science and Technology, 12, 481-484.
NLM
Yavich B, Souza PL, Pamplona-Pires M, Henriques AB, Gonçalves LCD. Single and periodically Si Delta-doped Inp grown by Lp-movpe. Semiconductor Science and Technology. 1997 ; 12 481-484.[citado 2025 dez. 05 ]
Vancouver
Yavich B, Souza PL, Pamplona-Pires M, Henriques AB, Gonçalves LCD. Single and periodically Si Delta-doped Inp grown by Lp-movpe. Semiconductor Science and Technology. 1997 ; 12 481-484.[citado 2025 dez. 05 ]

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