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Artigo de periodico
Hybrid low-dropout voltage regulator designed with TFET-MOSFET nanowire technologies (2023)
Toledo, Rodrigo do Nascimento; Martino, João Antonio ; Agopian, Paula Ghedini Der
Source: Semiconductor Science and Technology. Unidade: EP
Subjects: CIRCUITOS ANALÓGICOS, TRANSISTORES
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ABNT
TOLEDO, Rodrigo do Nascimento e MARTINO, João Antonio e AGOPIAN, Paula Ghedini Der. Hybrid low-dropout voltage regulator designed with TFET-MOSFET nanowire technologies. Semiconductor Science and Technology, v. 38, n. 9, p. 1-12, 2023Tradução . . Disponível em: https://doi.org/10.1088/1361-6641/aceb84. Acesso em: 05 dez. 2025.
APA
Toledo, R. do N., Martino, J. A., & Agopian, P. G. D. (2023). Hybrid low-dropout voltage regulator designed with TFET-MOSFET nanowire technologies. Semiconductor Science and Technology, 38( 9), 1-12. doi:10.1088/1361-6641/aceb84
NLM
Toledo R do N, Martino JA, Agopian PGD. Hybrid low-dropout voltage regulator designed with TFET-MOSFET nanowire technologies [Internet]. Semiconductor Science and Technology. 2023 ; 38( 9): 1-12.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/1361-6641/aceb84
Vancouver
Toledo R do N, Martino JA, Agopian PGD. Hybrid low-dropout voltage regulator designed with TFET-MOSFET nanowire technologies [Internet]. Semiconductor Science and Technology. 2023 ; 38( 9): 1-12.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/1361-6641/aceb84
Artigo de periodico
MISHEMT intrinsic voltage gain under multiple channel output characteristics (2023)
Canales, Bruno Godoy; Perina, Welder Fernandes; Martino, João Antonio ; Simoen, Eddy ; Peralagu, Uthayasankaran; Collaert, Nadine ; Agopian, Paula Ghedini Der
Source: Semiconductor Science and Technology. Unidade: EP
Subjects: TRANSISTORES, SEMICONDUTORES
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CANALES, Bruno Godoy et al. MISHEMT intrinsic voltage gain under multiple channel output characteristics. Semiconductor Science and Technology, v. 38, n. 11, p. 1-6, 2023Tradução . . Disponível em: https://doi.org/10.1088/1361-6641/acfa1f. Acesso em: 05 dez. 2025.
APA
Canales, B. G., Perina, W. F., Martino, J. A., Simoen, E., Peralagu, U., Collaert, N., & Agopian, P. G. D. (2023). MISHEMT intrinsic voltage gain under multiple channel output characteristics. Semiconductor Science and Technology, 38( 11), 1-6. doi:10.1088/1361-6641/acfa1f
NLM
Canales BG, Perina WF, Martino JA, Simoen E, Peralagu U, Collaert N, Agopian PGD. MISHEMT intrinsic voltage gain under multiple channel output characteristics [Internet]. Semiconductor Science and Technology. 2023 ; 38( 11): 1-6.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/1361-6641/acfa1f
Vancouver
Canales BG, Perina WF, Martino JA, Simoen E, Peralagu U, Collaert N, Agopian PGD. MISHEMT intrinsic voltage gain under multiple channel output characteristics [Internet]. Semiconductor Science and Technology. 2023 ; 38( 11): 1-6.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/1361-6641/acfa1f
Artigo de periodico
Structural and optical properties of n-type and p-type GaAs(1−x)Bix thin films grown by molecular beam epitaxy on (311)B GaAs substrates (2021)
Souza, Daniele de; Alhassan, Sultan; Alotaibi, Saud; Alhassni, Amra; Almunyif, Amjad; Albalawi, Hindi; Kazakov, Igor P.; Klekovkin, Alexey V.; ZinovEv, Sergey A; Likhachev, Igor A.; Pashaev, Elkhan M.; Souto, Sérgio Paulo Amaral ; Gobato, Yara Galvao ; Galeti, Helder Vinícius Avanço; Henini, Mohamed
Source: Semiconductor Science and Technology. Unidade: FZEA
Subjects: SEMICONDUTORES, EPITAXIA POR FEIXE MOLECULAR
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SOUZA, Daniele de et al. Structural and optical properties of n-type and p-type GaAs(1−x)Bix thin films grown by molecular beam epitaxy on (311)B GaAs substrates. Semiconductor Science and Technology, v. 36, n. 7, p. 1-12, 2021Tradução . . Disponível em: https://doi.org/10.1088/1361-6641/abf3d1. Acesso em: 05 dez. 2025.
APA
Souza, D. de, Alhassan, S., Alotaibi, S., Alhassni, A., Almunyif, A., Albalawi, H., et al. (2021). Structural and optical properties of n-type and p-type GaAs(1−x)Bix thin films grown by molecular beam epitaxy on (311)B GaAs substrates. Semiconductor Science and Technology, 36( 7), 1-12. doi:10.1088/1361-6641/abf3d1
NLM
Souza D de, Alhassan S, Alotaibi S, Alhassni A, Almunyif A, Albalawi H, Kazakov IP, Klekovkin AV, ZinovEv SA, Likhachev IA, Pashaev EM, Souto SPA, Gobato YG, Galeti HVA, Henini M. Structural and optical properties of n-type and p-type GaAs(1−x)Bix thin films grown by molecular beam epitaxy on (311)B GaAs substrates [Internet]. Semiconductor Science and Technology. 2021 ; 36( 7): 1-12.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/1361-6641/abf3d1
Vancouver
Souza D de, Alhassan S, Alotaibi S, Alhassni A, Almunyif A, Albalawi H, Kazakov IP, Klekovkin AV, ZinovEv SA, Likhachev IA, Pashaev EM, Souto SPA, Gobato YG, Galeti HVA, Henini M. Structural and optical properties of n-type and p-type GaAs(1−x)Bix thin films grown by molecular beam epitaxy on (311)B GaAs substrates [Internet]. Semiconductor Science and Technology. 2021 ; 36( 7): 1-12.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/1361-6641/abf3d1
Artigo de periodico
Performance of differential pair circuits designed with line tunnel FET devices at different temperatures (2018)
Martino, Márcio Dalla Valle; Claeys, Cor ; Agopian, Paula Ghedini Der ; Rooyackers, Rita; Simoen, Eddy ; Martino, João Antonio
Source: Semiconductor Science and Technology. Unidade: EP
Assunto: SEMICONDUTORES
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MARTINO, Márcio Dalla Valle et al. Performance of differential pair circuits designed with line tunnel FET devices at different temperatures. Semiconductor Science and Technology, v. 33, n. 7, p. 075012, 2018Tradução . . Disponível em: https://doi.org/10.1088/1361-6641/aac4fd. Acesso em: 05 dez. 2025.
APA
Martino, M. D. V., Claeys, C., Agopian, P. G. D., Rooyackers, R., Simoen, E., & Martino, J. A. (2018). Performance of differential pair circuits designed with line tunnel FET devices at different temperatures. Semiconductor Science and Technology, 33( 7), 075012. doi:10.1088/1361-6641/aac4fd
NLM
Martino MDV, Claeys C, Agopian PGD, Rooyackers R, Simoen E, Martino JA. Performance of differential pair circuits designed with line tunnel FET devices at different temperatures [Internet]. Semiconductor Science and Technology. 2018 ; 33( 7): 075012.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/1361-6641/aac4fd
Vancouver
Martino MDV, Claeys C, Agopian PGD, Rooyackers R, Simoen E, Martino JA. Performance of differential pair circuits designed with line tunnel FET devices at different temperatures [Internet]. Semiconductor Science and Technology. 2018 ; 33( 7): 075012.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/1361-6641/aac4fd
Artigo de periodico
Exciton localization and structural disorder of GaAs1−xBix/GaAs quantum wells grown by molecular beam epitaxy on (311)B GaAs substrates (2018)
Prando, G. A.; Gordo, Vanessa Orsi; Puustinen, J.; Hilska, J.; Alghamdi, H. M.; Som, G; Gunes, M; Akyol, M; Souto, Sérgio Paulo Amaral; Rodrigues, Ariano de Giovanni; Galeti, Helder Vinícius Avanço; Henini, M; Gobato, Yara Galvao; Guina, Mircea
Source: Semiconductor Science and Technology. Unidade: FZEA
Subjects: FOTOLUMINESCÊNCIA, EPITAXIA POR FEIXE MOLECULAR, SEMICONDUTORES
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PRANDO, G. A. et al. Exciton localization and structural disorder of GaAs1−xBix/GaAs quantum wells grown by molecular beam epitaxy on (311)B GaAs substrates. Semiconductor Science and Technology, v. 33, n. 8, p. 1-7, 2018Tradução . . Disponível em: https://doi.org/10.1088/1361-6641/aad02e. Acesso em: 05 dez. 2025.
APA
Prando, G. A., Gordo, V. O., Puustinen, J., Hilska, J., Alghamdi, H. M., Som, G., et al. (2018). Exciton localization and structural disorder of GaAs1−xBix/GaAs quantum wells grown by molecular beam epitaxy on (311)B GaAs substrates. Semiconductor Science and Technology, 33( 8), 1-7. doi:10.1088/1361-6641/aad02e
NLM
Prando GA, Gordo VO, Puustinen J, Hilska J, Alghamdi HM, Som G, Gunes M, Akyol M, Souto SPA, Rodrigues A de G, Galeti HVA, Henini M, Gobato YG, Guina M. Exciton localization and structural disorder of GaAs1−xBix/GaAs quantum wells grown by molecular beam epitaxy on (311)B GaAs substrates [Internet]. Semiconductor Science and Technology. 2018 ; 33( 8): 1-7.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/1361-6641/aad02e
Vancouver
Prando GA, Gordo VO, Puustinen J, Hilska J, Alghamdi HM, Som G, Gunes M, Akyol M, Souto SPA, Rodrigues A de G, Galeti HVA, Henini M, Gobato YG, Guina M. Exciton localization and structural disorder of GaAs1−xBix/GaAs quantum wells grown by molecular beam epitaxy on (311)B GaAs substrates [Internet]. Semiconductor Science and Technology. 2018 ; 33( 8): 1-7.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/1361-6641/aad02e
Artigo de periodico
Analysis of proton irradiated n- and p-type strained FinFETs at low temperatures down to 100 K (2018)
Caparroz, Luís Felipe Vicentis; Agopian, Paula Ghedini Der ; Claeys, Cor ; Simoen, Eddy ; Bordallo, Caio Cesar Mendes ; Martino, João Antonio
Source: Semiconductor Science and Technology. Unidades: EP, EACH
Subjects: TEMPERATURA, SEMICONDUTORES
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CAPARROZ, Luís Felipe Vicentis et al. Analysis of proton irradiated n- and p-type strained FinFETs at low temperatures down to 100 K. Semiconductor Science and Technology, v. 33, n. 6, p. 065003, 2018Tradução . . Disponível em: https://doi.org/10.1088/1361-6641/aabab3. Acesso em: 05 dez. 2025.
APA
Caparroz, L. F. V., Agopian, P. G. D., Claeys, C., Simoen, E., Bordallo, C. C. M., & Martino, J. A. (2018). Analysis of proton irradiated n- and p-type strained FinFETs at low temperatures down to 100 K. Semiconductor Science and Technology, 33( 6), 065003. doi:10.1088/1361-6641/aabab3
NLM
Caparroz LFV, Agopian PGD, Claeys C, Simoen E, Bordallo CCM, Martino JA. Analysis of proton irradiated n- and p-type strained FinFETs at low temperatures down to 100 K [Internet]. Semiconductor Science and Technology. 2018 ; 33( 6): 065003.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/1361-6641/aabab3
Vancouver
Caparroz LFV, Agopian PGD, Claeys C, Simoen E, Bordallo CCM, Martino JA. Analysis of proton irradiated n- and p-type strained FinFETs at low temperatures down to 100 K [Internet]. Semiconductor Science and Technology. 2018 ; 33( 6): 065003.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/1361-6641/aabab3
Artigo de periodico
Analysis of current mirror circuits designed with line tunnel FET devices at different temperatures (2017)
Martino, Márcio Dalla Valle; Claeys, Cor ; Rooyackers, Rita; Simoen, Eddy ; Agopian, Paula Ghedini Der ; Vandooren, A; Martino, João Antonio
Source: Semiconductor Science and Technology. Unidade: EP
Subjects: TRANSISTORES, SEMICONDUTORES
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ABNT
MARTINO, Márcio Dalla Valle et al. Analysis of current mirror circuits designed with line tunnel FET devices at different temperatures. Semiconductor Science and Technology, v. 32, n. 5, p. 055015, 2017Tradução . . Disponível em: https://doi.org/10.1088/1361-6641/aa6764. Acesso em: 05 dez. 2025.
APA
Martino, M. D. V., Claeys, C., Rooyackers, R., Simoen, E., Agopian, P. G. D., Vandooren, A., & Martino, J. A. (2017). Analysis of current mirror circuits designed with line tunnel FET devices at different temperatures. Semiconductor Science and Technology, 32( 5), 055015. doi:10.1088/1361-6641/aa6764
NLM
Martino MDV, Claeys C, Rooyackers R, Simoen E, Agopian PGD, Vandooren A, Martino JA. Analysis of current mirror circuits designed with line tunnel FET devices at different temperatures [Internet]. Semiconductor Science and Technology. 2017 ; 32( 5): 055015.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/1361-6641/aa6764
Vancouver
Martino MDV, Claeys C, Rooyackers R, Simoen E, Agopian PGD, Vandooren A, Martino JA. Analysis of current mirror circuits designed with line tunnel FET devices at different temperatures [Internet]. Semiconductor Science and Technology. 2017 ; 32( 5): 055015.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/1361-6641/aa6764
Artigo de periodico
Analog parameters of solid source Zn diffusion In X Ga1−X As nTFETs down to 10 K (2016)
Bordallo, Caio Cesar Mendes ; Vandooren, A; Rooyackers, Rita; Mols, Yannick; Alian, A; Agopian, Paula Ghedini Der ; Martino, João Antonio
Source: Semiconductor Science and Technology. Unidade: EP
Subjects: SEMICONDUTORES, MICROELETRÔNICA
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ABNT
BORDALLO, Caio Cesar Mendes et al. Analog parameters of solid source Zn diffusion In X Ga1−X As nTFETs down to 10 K. Semiconductor Science and Technology, v. 31, n. 12, p. 124001, 2016Tradução . . Disponível em: https://doi.org/10.1088/0268-1242/31/12/124001. Acesso em: 05 dez. 2025.
APA
Bordallo, C. C. M., Vandooren, A., Rooyackers, R., Mols, Y., Alian, A., Agopian, P. G. D., & Martino, J. A. (2016). Analog parameters of solid source Zn diffusion In X Ga1−X As nTFETs down to 10 K. Semiconductor Science and Technology, 31( 12), 124001. doi:10.1088/0268-1242/31/12/124001
NLM
Bordallo CCM, Vandooren A, Rooyackers R, Mols Y, Alian A, Agopian PGD, Martino JA. Analog parameters of solid source Zn diffusion In X Ga1−X As nTFETs down to 10 K [Internet]. Semiconductor Science and Technology. 2016 ; 31( 12): 124001.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/31/12/124001
Vancouver
Bordallo CCM, Vandooren A, Rooyackers R, Mols Y, Alian A, Agopian PGD, Martino JA. Analog parameters of solid source Zn diffusion In X Ga1−X As nTFETs down to 10 K [Internet]. Semiconductor Science and Technology. 2016 ; 31( 12): 124001.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/31/12/124001
Artigo de periodico
Improved operation of graded-channel SOI nMOSFETs down to liquid helium temperature (2016)
Pavanello, Marcelo Antonio ; Souza, Michelly de; Ribeiro, Thales Augusto; Martino, João Antonio ; Flandre, Denis
Source: Semiconductor Science and Technology. Unidade: EP
Subjects: SILÍCIO, SEMICONDUTORES
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ABNT
PAVANELLO, Marcelo Antonio et al. Improved operation of graded-channel SOI nMOSFETs down to liquid helium temperature. Semiconductor Science and Technology, v. 31, n. 11, p. 114005, 2016Tradução . . Disponível em: https://doi.org/10.1088/0268-1242/31/11/114005. Acesso em: 05 dez. 2025.
APA
Pavanello, M. A., Souza, M. de, Ribeiro, T. A., Martino, J. A., & Flandre, D. (2016). Improved operation of graded-channel SOI nMOSFETs down to liquid helium temperature. Semiconductor Science and Technology, 31( 11), 114005. doi:10.1088/0268-1242/31/11/114005
NLM
Pavanello MA, Souza M de, Ribeiro TA, Martino JA, Flandre D. Improved operation of graded-channel SOI nMOSFETs down to liquid helium temperature [Internet]. Semiconductor Science and Technology. 2016 ; 31( 11): 114005.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/31/11/114005
Vancouver
Pavanello MA, Souza M de, Ribeiro TA, Martino JA, Flandre D. Improved operation of graded-channel SOI nMOSFETs down to liquid helium temperature [Internet]. Semiconductor Science and Technology. 2016 ; 31( 11): 114005.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/31/11/114005
Artigo de periodico
Split CV mobility at low temperature operation of Ge pFinFETs fabricated with STI first and last processes (2016)
Oliveira, Alberto Vinicius de; Agopian, Paula Ghedini Der ; Simoen, Eddy ; Langer, Robert; Collaert, Nadine ; Thean, Aaron; Claeys, Cor ; Martino, João Antonio
Source: Semiconductor Science and Technology. Unidade: EP
Subjects: SEMICONDUTORES, MICROELETRÔNICA
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ABNT
OLIVEIRA, Alberto Vinicius de et al. Split CV mobility at low temperature operation of Ge pFinFETs fabricated with STI first and last processes. Semiconductor Science and Technology, v. 31, n. 11, p. 114002 , 2016Tradução . . Disponível em: https://doi.org/10.1088/0268-1242/31/11/114002. Acesso em: 05 dez. 2025.
APA
Oliveira, A. V. de, Agopian, P. G. D., Simoen, E., Langer, R., Collaert, N., Thean, A., et al. (2016). Split CV mobility at low temperature operation of Ge pFinFETs fabricated with STI first and last processes. Semiconductor Science and Technology, 31( 11), 114002 . doi:10.1088/0268-1242/31/11/114002
NLM
Oliveira AV de, Agopian PGD, Simoen E, Langer R, Collaert N, Thean A, Claeys C, Martino JA. Split CV mobility at low temperature operation of Ge pFinFETs fabricated with STI first and last processes [Internet]. Semiconductor Science and Technology. 2016 ; 31( 11): 114002 .[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/31/11/114002
Vancouver
Oliveira AV de, Agopian PGD, Simoen E, Langer R, Collaert N, Thean A, Claeys C, Martino JA. Split CV mobility at low temperature operation of Ge pFinFETs fabricated with STI first and last processes [Internet]. Semiconductor Science and Technology. 2016 ; 31( 11): 114002 .[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/31/11/114002
Artigo de periodico
Stability and accuracy control of k . p parameters (2016)
Bastos, Carlos M. O.; Sabino, Fernando P.; Faria Junior, Paulo E.; Campos, Tiago; Silva, Juarez Lopes Ferreira da ; Sipahi, Guilherme Matos
Source: Semiconductor Science and Technology. Unidades: IQSC, IFSC
Subjects: SEMICONDUTORES, MATERIAIS NANOESTRUTURADOS, SPIN, SISTEMAS HAMILTONIANOS
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ABNT
BASTOS, Carlos M. O. et al. Stability and accuracy control of k . p parameters. Semiconductor Science and Technology, v. 31, n. 10, p. 105002-1-105002-10, 2016Tradução . . Disponível em: https://doi.org/10.1088/0268-1242/31/10/105002. Acesso em: 05 dez. 2025.
APA
Bastos, C. M. O., Sabino, F. P., Faria Junior, P. E., Campos, T., Silva, J. L. F. da, & Sipahi, G. M. (2016). Stability and accuracy control of k . p parameters. Semiconductor Science and Technology, 31( 10), 105002-1-105002-10. doi:10.1088/0268-1242/31/10/105002
NLM
Bastos CMO, Sabino FP, Faria Junior PE, Campos T, Silva JLF da, Sipahi GM. Stability and accuracy control of k . p parameters [Internet]. Semiconductor Science and Technology. 2016 ; 31( 10): 105002-1-105002-10.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/31/10/105002
Vancouver
Bastos CMO, Sabino FP, Faria Junior PE, Campos T, Silva JLF da, Sipahi GM. Stability and accuracy control of k . p parameters [Internet]. Semiconductor Science and Technology. 2016 ; 31( 10): 105002-1-105002-10.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/31/10/105002
Artigo de periodico
Performance of TFET and FinFET devices applied to current mirrors for different dimensions and temperatures (2016)
Martino, Márcio Dalla Valle; Martino, João Antonio ; Agopian, Paula Ghedini Der ; Vandooren, A; Rooyackers, Rita; Simoen, Eddy ; Claeys, Cor
Source: Semiconductor Science and Technology. Unidade: EP
Assunto: SEMICONDUTORES
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ABNT
MARTINO, Márcio Dalla Valle et al. Performance of TFET and FinFET devices applied to current mirrors for different dimensions and temperatures. Semiconductor Science and Technology, v. 31, n. 5, 2016Tradução . . Disponível em: https://doi.org/10.1088/0268-1242/31/5/055001. Acesso em: 05 dez. 2025.
APA
Martino, M. D. V., Martino, J. A., Agopian, P. G. D., Vandooren, A., Rooyackers, R., Simoen, E., & Claeys, C. (2016). Performance of TFET and FinFET devices applied to current mirrors for different dimensions and temperatures. Semiconductor Science and Technology, 31( 5). doi:10.1088/0268-1242/31/5/055001
NLM
Martino MDV, Martino JA, Agopian PGD, Vandooren A, Rooyackers R, Simoen E, Claeys C. Performance of TFET and FinFET devices applied to current mirrors for different dimensions and temperatures [Internet]. Semiconductor Science and Technology. 2016 ; 31( 5):[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/31/5/055001
Vancouver
Martino MDV, Martino JA, Agopian PGD, Vandooren A, Rooyackers R, Simoen E, Claeys C. Performance of TFET and FinFET devices applied to current mirrors for different dimensions and temperatures [Internet]. Semiconductor Science and Technology. 2016 ; 31( 5):[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/31/5/055001
Artigo de periodico
Analog performance of standard and uniaxial strained triple-gate SOI FinFETs under x-ray radiation (2014)
Bordallo, Caio Cesar Mendes ; Martino, João Antonio ; Teixeira, Fernando Ferrari; Silveira, Marcilei Aparecida Guazzelli da; Agopian, Paula Ghedini Der ; Simoen, Eddy ; Claeys, Cor
Source: Semiconductor Science and Technology. Unidade: EP
Subjects: RAIOS X, MICROELETRÔNICA
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ABNT
BORDALLO, Caio Cesar Mendes et al. Analog performance of standard and uniaxial strained triple-gate SOI FinFETs under x-ray radiation. Semiconductor Science and Technology, v. 29, n. 12, p. 125015, 2014Tradução . . Disponível em: https://doi.org/10.1088/0268-1242/29/12/125015. Acesso em: 05 dez. 2025.
APA
Bordallo, C. C. M., Martino, J. A., Teixeira, F. F., Silveira, M. A. G. da, Agopian, P. G. D., Simoen, E., & Claeys, C. (2014). Analog performance of standard and uniaxial strained triple-gate SOI FinFETs under x-ray radiation. Semiconductor Science and Technology, 29( 12), 125015. doi:10.1088/0268-1242/29/12/125015
NLM
Bordallo CCM, Martino JA, Teixeira FF, Silveira MAG da, Agopian PGD, Simoen E, Claeys C. Analog performance of standard and uniaxial strained triple-gate SOI FinFETs under x-ray radiation [Internet]. Semiconductor Science and Technology. 2014 ; 29( 12): 125015.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/29/12/125015
Vancouver
Bordallo CCM, Martino JA, Teixeira FF, Silveira MAG da, Agopian PGD, Simoen E, Claeys C. Analog performance of standard and uniaxial strained triple-gate SOI FinFETs under x-ray radiation [Internet]. Semiconductor Science and Technology. 2014 ; 29( 12): 125015.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/29/12/125015
Artigo de periodico
Trapezoidal SOI FinFET analog parameters' dependence on cross-section shape (2009)
Bühler, Rudolf Theoderich; Giacomini, R; Pavanello, Marcelo Antonio ; Martino, João Antonio
Source: Semiconductor Science and Technology. Unidade: EP
Assunto: MICROELETRÔNICA
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ABNT
BÜHLER, Rudolf Theoderich et al. Trapezoidal SOI FinFET analog parameters' dependence on cross-section shape. Semiconductor Science and Technology, v. 24, n. 11, 2009Tradução . . Disponível em: https://doi.org/10.1088/0268-1242/24/11/115017. Acesso em: 05 dez. 2025.
APA
Bühler, R. T., Giacomini, R., Pavanello, M. A., & Martino, J. A. (2009). Trapezoidal SOI FinFET analog parameters' dependence on cross-section shape. Semiconductor Science and Technology, 24( 11). doi:10.1088/0268-1242/24/11/115017
NLM
Bühler RT, Giacomini R, Pavanello MA, Martino JA. Trapezoidal SOI FinFET analog parameters' dependence on cross-section shape [Internet]. Semiconductor Science and Technology. 2009 ; 24( 11):[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/24/11/115017
Vancouver
Bühler RT, Giacomini R, Pavanello MA, Martino JA. Trapezoidal SOI FinFET analog parameters' dependence on cross-section shape [Internet]. Semiconductor Science and Technology. 2009 ; 24( 11):[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/24/11/115017
Artigo de periodico
Structure evaluation of submicrometre silicon chips removed by diamond turning (2007)
Jasinevicius, Renato Goulart ; Duduch, Jaime Gilberto ; Pizani, Paulo Sérgio
Source: Semiconductor Science and Technology. Unidade: EESC
Subjects: SEMICONDUTORES, MICROSCÓPIO ELETRÔNICO, DIAMANTE
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
JASINEVICIUS, Renato Goulart e DUDUCH, Jaime Gilberto e PIZANI, Paulo Sérgio. Structure evaluation of submicrometre silicon chips removed by diamond turning. Semiconductor Science and Technology, v. 22, n. 5, p. 561-573, 2007Tradução . . Disponível em: https://doi.org/10.1088/0268-1242/22/5/019. Acesso em: 05 dez. 2025.
APA
Jasinevicius, R. G., Duduch, J. G., & Pizani, P. S. (2007). Structure evaluation of submicrometre silicon chips removed by diamond turning. Semiconductor Science and Technology, 22( 5), 561-573. doi:10.1088/0268-1242/22/5/019
NLM
Jasinevicius RG, Duduch JG, Pizani PS. Structure evaluation of submicrometre silicon chips removed by diamond turning [Internet]. Semiconductor Science and Technology. 2007 ; 22( 5): 561-573.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/22/5/019
Vancouver
Jasinevicius RG, Duduch JG, Pizani PS. Structure evaluation of submicrometre silicon chips removed by diamond turning [Internet]. Semiconductor Science and Technology. 2007 ; 22( 5): 561-573.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/22/5/019
Artigo de periodico
Rapid thermal oxidation of silicon with different thermal annealing cycles in nitrogen: influence on surface microroughness and electrical characteristics (1995)
Santos Filho, Sebastião Gomes dos ; Hasenack, Claus Martin; Lopes, M C V; Baranauskas, V
Source: Semiconductor Science and Technology. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
SANTOS FILHO, Sebastião Gomes dos et al. Rapid thermal oxidation of silicon with different thermal annealing cycles in nitrogen: influence on surface microroughness and electrical characteristics. Semiconductor Science and Technology, v. 10, n. 7 , p. 990-6, 1995Tradução . . Disponível em: https://doi.org/10.1088/0268-1242/10/7/015. Acesso em: 05 dez. 2025.
APA
Santos Filho, S. G. dos, Hasenack, C. M., Lopes, M. C. V., & Baranauskas, V. (1995). Rapid thermal oxidation of silicon with different thermal annealing cycles in nitrogen: influence on surface microroughness and electrical characteristics. Semiconductor Science and Technology, 10( 7 ), 990-6. doi:10.1088/0268-1242/10/7/015
NLM
Santos Filho SG dos, Hasenack CM, Lopes MCV, Baranauskas V. Rapid thermal oxidation of silicon with different thermal annealing cycles in nitrogen: influence on surface microroughness and electrical characteristics [Internet]. Semiconductor Science and Technology. 1995 ;10( 7 ): 990-6.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/10/7/015
Vancouver
Santos Filho SG dos, Hasenack CM, Lopes MCV, Baranauskas V. Rapid thermal oxidation of silicon with different thermal annealing cycles in nitrogen: influence on surface microroughness and electrical characteristics [Internet]. Semiconductor Science and Technology. 1995 ;10( 7 ): 990-6.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/10/7/015
Artigo de periodico
Doping of silicon with boron by rapid thermal processing (1988)
Souza, J. P.; Hasenack, Claus Martin; Swart, Jacobus Willibrordus
Source: Semiconductor Science and Technology. Unidade: EP
Subjects: SILÍCIO, SEMICONDUTORES
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
SOUZA, J. P. e HASENACK, Claus Martin e SWART, Jacobus Willibrordus. Doping of silicon with boron by rapid thermal processing. Semiconductor Science and Technology, v. 3 , n. 4 , p. 277-90, 1988Tradução . . Acesso em: 05 dez. 2025.
APA
Souza, J. P., Hasenack, C. M., & Swart, J. W. (1988). Doping of silicon with boron by rapid thermal processing. Semiconductor Science and Technology, 3 ( 4 ), 277-90.
NLM
Souza JP, Hasenack CM, Swart JW. Doping of silicon with boron by rapid thermal processing. Semiconductor Science and Technology. 1988 ;3 ( 4 ): 277-90.[citado 2025 dez. 05 ]
Vancouver
Souza JP, Hasenack CM, Swart JW. Doping of silicon with boron by rapid thermal processing. Semiconductor Science and Technology. 1988 ;3 ( 4 ): 277-90.[citado 2025 dez. 05 ]
Artigo de periodico
Exciton-phonon systems in 'GA''AS'-'GA IND. 1-X''AL IND.X''AS' quantum wells (1987)
Degani, Marcos Henrique; Hipólito, Oscar
Source: Semiconductor Science and Technology. Unidade: IFSC
Subjects: FÍSICA TEÓRICA, POÇOS QUÂNTICOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
DEGANI, Marcos Henrique e HIPÓLITO, Oscar. Exciton-phonon systems in 'GA''AS'-'GA IND. 1-X''AL IND.X''AS' quantum wells. Semiconductor Science and Technology, v. 2 , p. 578-581, 1987Tradução . . Disponível em: https://doi.org/10.1088/0268-1242/2/9/003. Acesso em: 05 dez. 2025.
APA
Degani, M. H., & Hipólito, O. (1987). Exciton-phonon systems in 'GA''AS'-'GA IND. 1-X''AL IND.X''AS' quantum wells. Semiconductor Science and Technology, 2 , 578-581. doi:10.1088/0268-1242/2/9/003
NLM
Degani MH, Hipólito O. Exciton-phonon systems in 'GA''AS'-'GA IND. 1-X''AL IND.X''AS' quantum wells [Internet]. Semiconductor Science and Technology. 1987 ;2 578-581.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/2/9/003
Vancouver
Degani MH, Hipólito O. Exciton-phonon systems in 'GA''AS'-'GA IND. 1-X''AL IND.X''AS' quantum wells [Internet]. Semiconductor Science and Technology. 1987 ;2 578-581.[citado 2025 dez. 05 ] Available from: https://doi.org/10.1088/0268-1242/2/9/003

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