Source: Proceedings. Conference titles: Conference of the Brazilian Microelectronics Society. Unidade: EP
Subjects: CIRCUITOS INTEGRADOS, SEMICONDUTORES
ABNT
MASSI, Marcos et al. Characteristics of silicon etching processes in a RIE reactor modified to include a built-in radio frequency excitation coil. (em CD-Rom). 1997, Anais.. Itajubá: SBMICRO/EFEI, 1997. . Acesso em: 27 abr. 2026.APA
Massi, M., Mansano, R. D., Maciel, H. S., & Verdonck, P. B. (1997). Characteristics of silicon etching processes in a RIE reactor modified to include a built-in radio frequency excitation coil. (em CD-Rom). In Proceedings. Itajubá: SBMICRO/EFEI.NLM
Massi M, Mansano RD, Maciel HS, Verdonck PB. Characteristics of silicon etching processes in a RIE reactor modified to include a built-in radio frequency excitation coil. (em CD-Rom). Proceedings. 1997 ;[citado 2026 abr. 27 ]Vancouver
Massi M, Mansano RD, Maciel HS, Verdonck PB. Characteristics of silicon etching processes in a RIE reactor modified to include a built-in radio frequency excitation coil. (em CD-Rom). Proceedings. 1997 ;[citado 2026 abr. 27 ]
