Plasma etching of aluminium using BCl3-Cl2 mixtures. (em CD-Rom) (1997)
- Authors:
- Autor USP: VERDONCK, PATRICK BERNARD - EP
- Unidade: EP
- Subjects: CIRCUITOS INTEGRADOS; SEMICONDUTORES
- Language: Inglês
- Imprenta:
- Publisher: SBMICRO/EFEI
- Publisher place: Itajubá
- Date published: 1997
- Source:
- Título: Proceedings
- Conference titles: Conference of the Brazilian Microelectronics Society
-
ABNT
NAKAZAWA, A M e VERDONCK, Patrick Bernard. Plasma etching of aluminium using BCl3-Cl2 mixtures. (em CD-Rom). 1997, Anais.. Itajubá: SBMICRO/EFEI, 1997. . Acesso em: 26 jan. 2026. -
APA
Nakazawa, A. M., & Verdonck, P. B. (1997). Plasma etching of aluminium using BCl3-Cl2 mixtures. (em CD-Rom). In Proceedings. Itajubá: SBMICRO/EFEI. -
NLM
Nakazawa AM, Verdonck PB. Plasma etching of aluminium using BCl3-Cl2 mixtures. (em CD-Rom). Proceedings. 1997 ;[citado 2026 jan. 26 ] -
Vancouver
Nakazawa AM, Verdonck PB. Plasma etching of aluminium using BCl3-Cl2 mixtures. (em CD-Rom). Proceedings. 1997 ;[citado 2026 jan. 26 ] - The influence of diffusion of fluorine compounds for silicon lateral etching
- RF electrical measurements in plasma processing reactors
- Oxygen plasma etching mechanisms of resist
- Aluminium etching with CC14-N2 plasma
- Corrosão por plasma de espaçadores em óxido de silício
- Reactive ion etching and plasma etching of tungsten
- A new mechanism for silicon etching with fluorine based plasmas
- Effects of the methane content on the characteristics of diamond-like carbon films produced by sputtering
- Plasma parameters obtained with planar probe and optical emission spectroscopy
- The effect of electrode materials on etching mechanisms
How to cite
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
