RF electrical measurements in plasma processing reactors (2000)
- Authors:
- Autor USP: VERDONCK, PATRICK BERNARD - EP
- Unidade: EP
- Assunto: CIRCUITOS INTEGRADOS
- Language: Inglês
- Imprenta:
- Publisher: SBMicro/UA/UFRGS/UNICAMP/USP
- Publisher place: Manaus
- Date published: 2000
- Source:
- Título: SBMicro 2000: proceedings
- Conference titles: International Conference on Microelectronics and Packaging
-
ABNT
PISANI, Marcelo B. e VERDONCK, Patrick Bernard. RF electrical measurements in plasma processing reactors. 2000, Anais.. Manaus: SBMicro/UA/UFRGS/UNICAMP/USP, 2000. . Acesso em: 15 fev. 2026. -
APA
Pisani, M. B., & Verdonck, P. B. (2000). RF electrical measurements in plasma processing reactors. In SBMicro 2000: proceedings. Manaus: SBMicro/UA/UFRGS/UNICAMP/USP. -
NLM
Pisani MB, Verdonck PB. RF electrical measurements in plasma processing reactors. SBMicro 2000: proceedings. 2000 ;[citado 2026 fev. 15 ] -
Vancouver
Pisani MB, Verdonck PB. RF electrical measurements in plasma processing reactors. SBMicro 2000: proceedings. 2000 ;[citado 2026 fev. 15 ] - The influence of electrode material on argon plasmas
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