Characterization of SF6 plasmas by RF electrical measurements (2002)
- Authors:
- Autor USP: VERDONCK, PATRICK BERNARD - EP
- Unidade: EP
- Assunto: MICROELETRÔNICA
- Language: Inglês
- Imprenta:
- Publisher: The Electrochemical Society
- Publisher place: Pennington
- Date published: 2002
- ISBN: 1-56677-328-8
- Source:
- Título do periódico: Microelectronics Technology and Devices SBMICRO 2002
-
ABNT
PISANI, Marcelo Bento; VERDONCK, Patrick Bernard. Characterization of SF6 plasmas by RF electrical measurements. In: Microelectronics Technology and Devices SBMICRO 2002[S.l: s.n.], 2002. -
APA
Pisani, M. B., & Verdonck, P. B. (2002). Characterization of SF6 plasmas by RF electrical measurements. In Microelectronics Technology and Devices SBMICRO 2002. Pennington: The Electrochemical Society. -
NLM
Pisani MB, Verdonck PB. Characterization of SF6 plasmas by RF electrical measurements. In: Microelectronics Technology and Devices SBMICRO 2002. Pennington: The Electrochemical Society; 2002. -
Vancouver
Pisani MB, Verdonck PB. Characterization of SF6 plasmas by RF electrical measurements. In: Microelectronics Technology and Devices SBMICRO 2002. Pennington: The Electrochemical Society; 2002. - Development and characterization of 'SI IND.3''N IND.4' plasma etching processes
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