Dry etching of resist for three level resist process using statistical design of experiments (1995)
- Authors:
- USP affiliated authors: MACIEL, HOMERO SANTIAGO - EP ; VERDONCK, PATRICK BERNARD - EP ; MANSANO, RONALDO DOMINGUES - EP
- Unidade: EP
- Assunto: CIRCUITOS INTEGRADOS
- Language: Inglês
- Imprenta:
- Publisher: Instituto de Informatica da Ufrgs
- Publisher place: Porto Alegre
- Date published: 1995
- Source:
- Título: Proceedings
- Conference titles: Congress of the Brazilian Microelectronics Society
-
ABNT
MANSANO, Ronaldo Domingues e VERDONCK, Patrick Bernard e MACIEL, Homero Santiago. Dry etching of resist for three level resist process using statistical design of experiments. 1995, Anais.. Porto Alegre: Instituto de Informatica da Ufrgs, 1995. . Acesso em: 18 fev. 2026. -
APA
Mansano, R. D., Verdonck, P. B., & Maciel, H. S. (1995). Dry etching of resist for three level resist process using statistical design of experiments. In Proceedings. Porto Alegre: Instituto de Informatica da Ufrgs. -
NLM
Mansano RD, Verdonck PB, Maciel HS. Dry etching of resist for three level resist process using statistical design of experiments. Proceedings. 1995 ;[citado 2026 fev. 18 ] -
Vancouver
Mansano RD, Verdonck PB, Maciel HS. Dry etching of resist for three level resist process using statistical design of experiments. Proceedings. 1995 ;[citado 2026 fev. 18 ] - Silicon surface roughness induced by SF6-based reactive ion etching processes for micromachining applications
- End-point detection of polymer etching using Langmuir probes
- Performance characterization of an RIE reactor with built-in RF excitation antenna
- Characteristics of silicon etching processes in a RIE reactor modified to include a built-in radio frequency excitation coil. (em CD-Rom)
- Anisotropic reactive ion etching in silicon, using a graphite electrode
- Effects of plasma etching on DLC films
- Electrical and structural characterization of DLC films deposited by magnetron sputtering
- Silicon surface roughness induced by reactive ion etching processes, using a graphite electrode. (Em CD-Rom)
- Electrical and structural characterisation of DLC films deposited by magnetron sputtering
- Characterization of mode transitions for RF discharges in different gases
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