Dry etching of resist for three level resist process using statistical design of experiments (1995)
- Autores:
- Autores USP: MACIEL, HOMERO SANTIAGO - EP ; VERDONCK, PATRICK BERNARD - EP
- Unidade: EP
- Assunto: CIRCUITOS INTEGRADOS
- Idioma: Inglês
- Imprenta:
- Editora: Instituto de Informatica da Ufrgs
- Local: Porto Alegre
- Data de publicação: 1995
- Fonte:
- Título do periódico: Proceedings
- Nome do evento: Congress of the Brazilian Microelectronics Society
-
ABNT
MANSANO, Ronaldo Domingues e VERDONCK, Patrick Bernard e MACIEL, H. S. Dry etching of resist for three level resist process using statistical design of experiments. 1995, Anais.. Porto Alegre: Instituto de Informatica da Ufrgs, 1995. . Acesso em: 24 abr. 2024. -
APA
Mansano, R. D., Verdonck, P. B., & Maciel, H. S. (1995). Dry etching of resist for three level resist process using statistical design of experiments. In Proceedings. Porto Alegre: Instituto de Informatica da Ufrgs. -
NLM
Mansano RD, Verdonck PB, Maciel HS. Dry etching of resist for three level resist process using statistical design of experiments. Proceedings. 1995 ;[citado 2024 abr. 24 ] -
Vancouver
Mansano RD, Verdonck PB, Maciel HS. Dry etching of resist for three level resist process using statistical design of experiments. Proceedings. 1995 ;[citado 2024 abr. 24 ] - Obtencao de um processo de litografia de multicamadas
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