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Artigo de periodico
High-density plasma chemical vapor deposition of amorphous carbon films (2004)
Mousinho, Ana Paula; Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard
Source: Diamond and Related Materials,. Unidade: EP
Assunto: FILMES FINOS
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ABNT
MOUSINHO, Ana Paula e MANSANO, Ronaldo Domingues e VERDONCK, Patrick Bernard. High-density plasma chemical vapor deposition of amorphous carbon films. Diamond and Related Materials, v. 13, n. 2, p. 311-315, 2004Tradução . . Disponível em: https://doi.org/10.1016/j.diamond.2003.10.024. Acesso em: 05 nov. 2024.
APA
Mousinho, A. P., Mansano, R. D., & Verdonck, P. B. (2004). High-density plasma chemical vapor deposition of amorphous carbon films. Diamond and Related Materials,, 13( 2), 311-315. doi:10.1016/j.diamond.2003.10.024
NLM
Mousinho AP, Mansano RD, Verdonck PB. High-density plasma chemical vapor deposition of amorphous carbon films [Internet]. Diamond and Related Materials,. 2004 ; 13( 2): 311-315.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/j.diamond.2003.10.024
Vancouver
Mousinho AP, Mansano RD, Verdonck PB. High-density plasma chemical vapor deposition of amorphous carbon films [Internet]. Diamond and Related Materials,. 2004 ; 13( 2): 311-315.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/j.diamond.2003.10.024
Artigo de periodico
Sterilization by oxygen plasma (2004)
Moreira, Adir José; Mansano, Ronaldo Domingues ; Pinto, Terezinha de Jesus Andreoli ; Ruas, Ronaldo; Zambon, Luís da Silva ; Silva, Mônica Valero da; Verdonck, Patrick Bernard
Source: Applied Surface Science. Unidades: FCF, EP
Subjects: PLASMA, OXIGÊNIO, MICROBIOLOGIA
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ABNT
MOREIRA, Adir José et al. Sterilization by oxygen plasma. Applied Surface Science, v. 235, n. 1-2, p. 151-155, 2004Tradução . . Disponível em: https://doi.org/10.1016/j.apsusc.2004.05.128. Acesso em: 05 nov. 2024.
APA
Moreira, A. J., Mansano, R. D., Pinto, T. de J. A., Ruas, R., Zambon, L. da S., Silva, M. V. da, & Verdonck, P. B. (2004). Sterilization by oxygen plasma. Applied Surface Science, 235( 1-2), 151-155. doi:10.1016/j.apsusc.2004.05.128
NLM
Moreira AJ, Mansano RD, Pinto T de JA, Ruas R, Zambon L da S, Silva MV da, Verdonck PB. Sterilization by oxygen plasma [Internet]. Applied Surface Science. 2004 ; 235( 1-2): 151-155.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/j.apsusc.2004.05.128
Vancouver
Moreira AJ, Mansano RD, Pinto T de JA, Ruas R, Zambon L da S, Silva MV da, Verdonck PB. Sterilization by oxygen plasma [Internet]. Applied Surface Science. 2004 ; 235( 1-2): 151-155.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/j.apsusc.2004.05.128
Artigo de periodico
The influence of nitrogen on the dielectric constant and surface hardness in diamond-like carbon (DLC) films (2004)
Guerino, M.; Massi, Marcos; Maciel, Homero Santiago; Otani, C.; Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard; Libardi, J.
Source: Diamond and Related Materials,. Unidade: EP
Assunto: FILMES FINOS
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ABNT
GUERINO, M. et al. The influence of nitrogen on the dielectric constant and surface hardness in diamond-like carbon (DLC) films. Diamond and Related Materials, v. 13, n. 2, p. 316-319, 2004Tradução . . Disponível em: https://doi.org/10.1016/j.diamond.2003.10.016. Acesso em: 05 nov. 2024.
APA
Guerino, M., Massi, M., Maciel, H. S., Otani, C., Mansano, R. D., Verdonck, P. B., & Libardi, J. (2004). The influence of nitrogen on the dielectric constant and surface hardness in diamond-like carbon (DLC) films. Diamond and Related Materials,, 13( 2), 316-319. doi:10.1016/j.diamond.2003.10.016
NLM
Guerino M, Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB, Libardi J. The influence of nitrogen on the dielectric constant and surface hardness in diamond-like carbon (DLC) films [Internet]. Diamond and Related Materials,. 2004 ; 13( 2): 316-319.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/j.diamond.2003.10.016
Vancouver
Guerino M, Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB, Libardi J. The influence of nitrogen on the dielectric constant and surface hardness in diamond-like carbon (DLC) films [Internet]. Diamond and Related Materials,. 2004 ; 13( 2): 316-319.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/j.diamond.2003.10.016
Artigo de periodico
Micro-machine fabrication using diamond-like carbon films (2003)
Mousinho, Ana Paula; Mansano, Ronaldo Domingues ; Massi, Marcos; Jaramillo Ocampo, Juan Manuel
Source: Diamond and Related Materials. Unidade: EP
Assunto: PLASMA (MICROELETRÔNICA)
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ABNT
MOUSINHO, Ana Paula et al. Micro-machine fabrication using diamond-like carbon films. Diamond and Related Materials, v. 12, n. 3-7, p. 1041-1044, 2003Tradução . . Disponível em: https://doi.org/10.1016/s0925-9635(02)00219-4. Acesso em: 05 nov. 2024.
APA
Mousinho, A. P., Mansano, R. D., Massi, M., & Jaramillo Ocampo, J. M. (2003). Micro-machine fabrication using diamond-like carbon films. Diamond and Related Materials, 12( 3-7), 1041-1044. doi:10.1016/s0925-9635(02)00219-4
NLM
Mousinho AP, Mansano RD, Massi M, Jaramillo Ocampo JM. Micro-machine fabrication using diamond-like carbon films [Internet]. Diamond and Related Materials. 2003 ; 12( 3-7): 1041-1044.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/s0925-9635(02)00219-4
Vancouver
Mousinho AP, Mansano RD, Massi M, Jaramillo Ocampo JM. Micro-machine fabrication using diamond-like carbon films [Internet]. Diamond and Related Materials. 2003 ; 12( 3-7): 1041-1044.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/s0925-9635(02)00219-4
Artigo de periodico
Design, fabrication, and characterization of a full complex-amplitude modulation diffractive optical element (2003)
Gonçalves Neto, Luiz; Cardona, Patricia Soares Pinto; Cirino, Giuseppe Antonio; Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard
Source: Journal of Microlithography, Microfabrication, and Microsystems. Unidades: EESC, EP
Assunto: DISPOSITIVOS ÓPTICOS
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ABNT
GONÇALVES NETO, Luiz et al. Design, fabrication, and characterization of a full complex-amplitude modulation diffractive optical element. Journal of Microlithography, Microfabrication, and Microsystems, v. 2, n. 2, p. 96-104, 2003Tradução . . Disponível em: https://doi.org/10.1117/1.1562930. Acesso em: 05 nov. 2024.
APA
Gonçalves Neto, L., Cardona, P. S. P., Cirino, G. A., Mansano, R. D., & Verdonck, P. B. (2003). Design, fabrication, and characterization of a full complex-amplitude modulation diffractive optical element. Journal of Microlithography, Microfabrication, and Microsystems, 2( 2), 96-104. doi:10.1117/1.1562930
NLM
Gonçalves Neto L, Cardona PSP, Cirino GA, Mansano RD, Verdonck PB. Design, fabrication, and characterization of a full complex-amplitude modulation diffractive optical element [Internet]. Journal of Microlithography, Microfabrication, and Microsystems. 2003 ; 2( 2): 96-104.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1117/1.1562930
Vancouver
Gonçalves Neto L, Cardona PSP, Cirino GA, Mansano RD, Verdonck PB. Design, fabrication, and characterization of a full complex-amplitude modulation diffractive optical element [Internet]. Journal of Microlithography, Microfabrication, and Microsystems. 2003 ; 2( 2): 96-104.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1117/1.1562930
Artigo de periodico
Generation and characterization of polymeric tridimensional microstrucutres for micromachine application (2003)
Mousinho, Ana Paula; Mansano, Ronaldo Domingues ; Arruda, Antonio Carlos Santos de
Source: Microelectronics Journal,. Unidade: EP
Assunto: NANOTECNOLOGIA
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ABNT
MOUSINHO, Ana Paula e MANSANO, Ronaldo Domingues e ARRUDA, Antonio Carlos Santos de. Generation and characterization of polymeric tridimensional microstrucutres for micromachine application. Microelectronics Journal, v. 34, n. 5-8, 2003Tradução . . Disponível em: https://doi.org/10.1016/s0026-2692(03)00085-5. Acesso em: 05 nov. 2024.
APA
Mousinho, A. P., Mansano, R. D., & Arruda, A. C. S. de. (2003). Generation and characterization of polymeric tridimensional microstrucutres for micromachine application. Microelectronics Journal,, 34( 5-8). doi:10.1016/s0026-2692(03)00085-5
NLM
Mousinho AP, Mansano RD, Arruda ACS de. Generation and characterization of polymeric tridimensional microstrucutres for micromachine application [Internet]. Microelectronics Journal,. 2003 ; 34( 5-8):[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/s0026-2692(03)00085-5
Vancouver
Mousinho AP, Mansano RD, Arruda ACS de. Generation and characterization of polymeric tridimensional microstrucutres for micromachine application [Internet]. Microelectronics Journal,. 2003 ; 34( 5-8):[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/s0026-2692(03)00085-5
Artigo de periodico
High density plasma chemical vapor deposition of diamond-like carbon films (2003)
Mousinho, Ana Paula; Mansano, Ronaldo Domingues ; Massi, Marcos; Zambom, Luís da Silva
Source: Microelectronics Journal. Unidade: EP
Assunto: PLASMA (MICROELETRÔNICA)
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ABNT
MOUSINHO, Ana Paula et al. High density plasma chemical vapor deposition of diamond-like carbon films. Microelectronics Journal, v. 34, n. 5-8, p. 627-629, 2003Tradução . . Disponível em: https://doi.org/10.1016/s0026-2692(03)00065-x. Acesso em: 05 nov. 2024.
APA
Mousinho, A. P., Mansano, R. D., Massi, M., & Zambom, L. da S. (2003). High density plasma chemical vapor deposition of diamond-like carbon films. Microelectronics Journal, 34( 5-8), 627-629. doi:10.1016/s0026-2692(03)00065-x
NLM
Mousinho AP, Mansano RD, Massi M, Zambom L da S. High density plasma chemical vapor deposition of diamond-like carbon films [Internet]. Microelectronics Journal. 2003 ; 34( 5-8): 627-629.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/s0026-2692(03)00065-x
Vancouver
Mousinho AP, Mansano RD, Massi M, Zambom L da S. High density plasma chemical vapor deposition of diamond-like carbon films [Internet]. Microelectronics Journal. 2003 ; 34( 5-8): 627-629.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/s0026-2692(03)00065-x
Artigo de periodico
Plasma etching of DLC films for microfluidic channels (2003)
Massi, Marcos; Jaramillo Ocampo, Juan Manuel; Maciel, Homero Santiago; Grigorov, K.; Otani, C.; Santos, L. V.; Mansano, Ronaldo Domingues
Source: Microelectronics Journal,. Unidade: EP
Assunto: PLASMA (MICROELETRÔNICA)
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ABNT
MASSI, Marcos et al. Plasma etching of DLC films for microfluidic channels. Microelectronics Journal, v. 34, n. 5-8, p. 635-638, 2003Tradução . . Disponível em: https://doi.org/10.1016/s0026-2692(03)00077-6. Acesso em: 05 nov. 2024.
APA
Massi, M., Jaramillo Ocampo, J. M., Maciel, H. S., Grigorov, K., Otani, C., Santos, L. V., & Mansano, R. D. (2003). Plasma etching of DLC films for microfluidic channels. Microelectronics Journal,, 34( 5-8), 635-638. doi:10.1016/s0026-2692(03)00077-6
NLM
Massi M, Jaramillo Ocampo JM, Maciel HS, Grigorov K, Otani C, Santos LV, Mansano RD. Plasma etching of DLC films for microfluidic channels [Internet]. Microelectronics Journal,. 2003 ; 34( 5-8): 635-638.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/s0026-2692(03)00077-6
Vancouver
Massi M, Jaramillo Ocampo JM, Maciel HS, Grigorov K, Otani C, Santos LV, Mansano RD. Plasma etching of DLC films for microfluidic channels [Internet]. Microelectronics Journal,. 2003 ; 34( 5-8): 635-638.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/s0026-2692(03)00077-6
Artigo de periodico
Silicon nitride deposited by inductively coupled plasma using dichlorosilane and ammonia (2003)
Zambom, Luís da Silva ; Mansano, Ronaldo Domingues
Source: Vacuum. Unidade: EP
Assunto: PLASMA (MICROELETRÔNICA)
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ABNT
ZAMBOM, Luís da Silva e MANSANO, Ronaldo Domingues. Silicon nitride deposited by inductively coupled plasma using dichlorosilane and ammonia. Vacuum, v. 71, n. 4, p. 439-444, 2003Tradução . . Disponível em: https://doi.org/10.1016/s0042-207x(03)00002-2. Acesso em: 05 nov. 2024.
APA
Zambom, L. da S., & Mansano, R. D. (2003). Silicon nitride deposited by inductively coupled plasma using dichlorosilane and ammonia. Vacuum, 71( 4), 439-444. doi:10.1016/s0042-207x(03)00002-2
NLM
Zambom L da S, Mansano RD. Silicon nitride deposited by inductively coupled plasma using dichlorosilane and ammonia [Internet]. Vacuum. 2003 ; 71( 4): 439-444.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/s0042-207x(03)00002-2
Vancouver
Zambom L da S, Mansano RD. Silicon nitride deposited by inductively coupled plasma using dichlorosilane and ammonia [Internet]. Vacuum. 2003 ; 71( 4): 439-444.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/s0042-207x(03)00002-2
Artigo de periodico
The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films (2003)
Guerino, M.; Massi, Marcos; Maciel, Homero Santiago; Otani, C.; Mansano, Ronaldo Domingues
Source: Microelectronics Journal. Unidade: EP
Assunto: PLASMA (MICROELETRÔNICA)
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ABNT
GUERINO, M. et al. The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films. Microelectronics Journal, v. 34, n. 5-8, 2003Tradução . . Disponível em: https://doi.org/10.1016/s0026-2692(03)00079-x. Acesso em: 05 nov. 2024.
APA
Guerino, M., Massi, M., Maciel, H. S., Otani, C., & Mansano, R. D. (2003). The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films. Microelectronics Journal, 34( 5-8). doi:10.1016/s0026-2692(03)00079-x
NLM
Guerino M, Massi M, Maciel HS, Otani C, Mansano RD. The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films [Internet]. Microelectronics Journal. 2003 ; 34( 5-8):[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/s0026-2692(03)00079-x
Vancouver
Guerino M, Massi M, Maciel HS, Otani C, Mansano RD. The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films [Internet]. Microelectronics Journal. 2003 ; 34( 5-8):[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/s0026-2692(03)00079-x
Artigo de periodico
Electrical and structural characterization of DLC films deposited by magnetron sputtering (2001)
Massi, Marcos; Maciel, Homero Santiago; Otani, C.; Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard
Source: Journal of Materials Science: Materials in Electronics. Unidade: EP
Assunto: FILMES FINOS
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ABNT
MASSI, Marcos et al. Electrical and structural characterization of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics, v. 12, p. 343-346, 2001Tradução . . Acesso em: 05 nov. 2024.
APA
Massi, M., Maciel, H. S., Otani, C., Mansano, R. D., & Verdonck, P. B. (2001). Electrical and structural characterization of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics, 12, 343-346.
NLM
Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB. Electrical and structural characterization of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics. 2001 ; 12 343-346.[citado 2024 nov. 05 ]
Vancouver
Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB. Electrical and structural characterization of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics. 2001 ; 12 343-346.[citado 2024 nov. 05 ]
Artigo de periodico
Design and fabrication of a hybrid diffractive optical device for multiple-line generation over a wide angle (2001)
Gonçalves Neto, Luiz; Roberto, Luciana Brassolatti; Verdonck, Patrick Bernard; Mansano, Ronaldo Domingues ; Cirino, Giuseppe Antonio; Stefani, Mario Antonio
Source: Applied Optics. Unidades: EESC, EP
Assunto: ÓPTICA
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ABNT
GONÇALVES NETO, Luiz et al. Design and fabrication of a hybrid diffractive optical device for multiple-line generation over a wide angle. Applied Optics, v. 40, n. Ja 2001, p. 211-218, 2001Tradução . . Disponível em: https://doi.org/10.1364/ao.40.000211. Acesso em: 05 nov. 2024.
APA
Gonçalves Neto, L., Roberto, L. B., Verdonck, P. B., Mansano, R. D., Cirino, G. A., & Stefani, M. A. (2001). Design and fabrication of a hybrid diffractive optical device for multiple-line generation over a wide angle. Applied Optics, 40( Ja 2001), 211-218. doi:10.1364/ao.40.000211
NLM
Gonçalves Neto L, Roberto LB, Verdonck PB, Mansano RD, Cirino GA, Stefani MA. Design and fabrication of a hybrid diffractive optical device for multiple-line generation over a wide angle [Internet]. Applied Optics. 2001 ; 40( Ja 2001): 211-218.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1364/ao.40.000211
Vancouver
Gonçalves Neto L, Roberto LB, Verdonck PB, Mansano RD, Cirino GA, Stefani MA. Design and fabrication of a hybrid diffractive optical device for multiple-line generation over a wide angle [Internet]. Applied Optics. 2001 ; 40( Ja 2001): 211-218.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1364/ao.40.000211
Artigo de periodico
Effects of the methane content on the characteristics of diamond-like carbon films produced by sputtering (2000)
Mansano, Ronaldo Domingues ; Massi, Marcos; Zambom, Luís da Silva ; Verdonck, Patrick Bernard; Nogueira, P. M.; Maciel, H. S.; Otani, Choyu
Source: Thin Solid Films. Unidade: EP
Assunto: FILMES
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ABNT
MANSANO, Ronaldo Domingues et al. Effects of the methane content on the characteristics of diamond-like carbon films produced by sputtering. Thin Solid Films, n. 373, p. 243-246, 2000Tradução . . Disponível em: https://doi.org/10.1016/s0040-6090(00)01088-9. Acesso em: 05 nov. 2024.
APA
Mansano, R. D., Massi, M., Zambom, L. da S., Verdonck, P. B., Nogueira, P. M., Maciel, H. S., & Otani, C. (2000). Effects of the methane content on the characteristics of diamond-like carbon films produced by sputtering. Thin Solid Films, ( 373), 243-246. doi:10.1016/s0040-6090(00)01088-9
NLM
Mansano RD, Massi M, Zambom L da S, Verdonck PB, Nogueira PM, Maciel HS, Otani C. Effects of the methane content on the characteristics of diamond-like carbon films produced by sputtering [Internet]. Thin Solid Films. 2000 ;( 373): 243-246.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/s0040-6090(00)01088-9
Vancouver
Mansano RD, Massi M, Zambom L da S, Verdonck PB, Nogueira PM, Maciel HS, Otani C. Effects of the methane content on the characteristics of diamond-like carbon films produced by sputtering [Internet]. Thin Solid Films. 2000 ;( 373): 243-246.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/s0040-6090(00)01088-9
Artigo de periodico
Effects of plasma etching on DLC films (1999)
Massi, Marcos; Mansano, Ronaldo Domingues ; Maciel, Homero Santiago; Otani, C.; Verdonck, Patrick Bernard; Nishioka, L. N. B. M.
Source: Thin Solid Films. Unidade: EP
Assunto: PLASMA
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ABNT
MASSI, Marcos et al. Effects of plasma etching on DLC films. Thin Solid Films, n. 343-344, p. 381-384, 1999Tradução . . Disponível em: https://doi.org/10.1016/s0040-6090(98)01691-5. Acesso em: 05 nov. 2024.
APA
Massi, M., Mansano, R. D., Maciel, H. S., Otani, C., Verdonck, P. B., & Nishioka, L. N. B. M. (1999). Effects of plasma etching on DLC films. Thin Solid Films, ( 343-344), 381-384. doi:10.1016/s0040-6090(98)01691-5
NLM
Massi M, Mansano RD, Maciel HS, Otani C, Verdonck PB, Nishioka LNBM. Effects of plasma etching on DLC films [Internet]. Thin Solid Films. 1999 ;( 343-344): 381-384.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/s0040-6090(98)01691-5
Vancouver
Massi M, Mansano RD, Maciel HS, Otani C, Verdonck PB, Nishioka LNBM. Effects of plasma etching on DLC films [Internet]. Thin Solid Films. 1999 ;( 343-344): 381-384.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/s0040-6090(98)01691-5
Artigo de periodico
Anisotropic reactive ion etching in silicon, using a graphite electrode (1998)
Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard; Maciel, Homero Santiago
Source: Sensors and Actuators A. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS
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ABNT
MANSANO, Ronaldo Domingues e VERDONCK, Patrick Bernard e MACIEL, Homero Santiago. Anisotropic reactive ion etching in silicon, using a graphite electrode. Sensors and Actuators A, v. 65, n. 2-3, p. 180-186, 1998Tradução . . Disponível em: https://doi.org/10.1016/s0924-4247(97)01681-6. Acesso em: 05 nov. 2024.
APA
Mansano, R. D., Verdonck, P. B., & Maciel, H. S. (1998). Anisotropic reactive ion etching in silicon, using a graphite electrode. Sensors and Actuators A, 65( 2-3), 180-186. doi:10.1016/s0924-4247(97)01681-6
NLM
Mansano RD, Verdonck PB, Maciel HS. Anisotropic reactive ion etching in silicon, using a graphite electrode [Internet]. Sensors and Actuators A. 1998 ; 65( 2-3): 180-186.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/s0924-4247(97)01681-6
Vancouver
Mansano RD, Verdonck PB, Maciel HS. Anisotropic reactive ion etching in silicon, using a graphite electrode [Internet]. Sensors and Actuators A. 1998 ; 65( 2-3): 180-186.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/s0924-4247(97)01681-6
Artigo de periodico
Mechanisms of surface roughness induced in silicon by fluorine containing plasmas (1997)
Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard; Maciel, Homero Santiago
Source: Vaccum. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS
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ABNT
MANSANO, Ronaldo Domingues e VERDONCK, Patrick Bernard e MACIEL, Homero Santiago. Mechanisms of surface roughness induced in silicon by fluorine containing plasmas. Vaccum, v. 48, n. 7-9, p. 677-679, 1997Tradução . . Disponível em: https://doi.org/10.1016/s0042-207x(97)00067-5. Acesso em: 05 nov. 2024.
APA
Mansano, R. D., Verdonck, P. B., & Maciel, H. S. (1997). Mechanisms of surface roughness induced in silicon by fluorine containing plasmas. Vaccum, 48( 7-9), 677-679. doi:10.1016/s0042-207x(97)00067-5
NLM
Mansano RD, Verdonck PB, Maciel HS. Mechanisms of surface roughness induced in silicon by fluorine containing plasmas [Internet]. Vaccum. 1997 ; 48( 7-9): 677-679.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/s0042-207x(97)00067-5
Vancouver
Mansano RD, Verdonck PB, Maciel HS. Mechanisms of surface roughness induced in silicon by fluorine containing plasmas [Internet]. Vaccum. 1997 ; 48( 7-9): 677-679.[citado 2024 nov. 05 ] Available from: https://doi.org/10.1016/s0042-207x(97)00067-5

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