High-density plasma chemical vapor deposition of amorphous carbon films (2004)
- Authors:
- USP affiliated authors: MANSANO, RONALDO DOMINGUES - EP ; VERDONCK, PATRICK BERNARD - EP
- Unidade: EP
- DOI: 10.1016/j.diamond.2003.10.024
- Assunto: FILMES FINOS
- Language: Inglês
- Imprenta:
- Source:
- Título: Diamond and Related Materials,
- ISSN: 0925-9635
- Volume/Número/Paginação/Ano: v. 13, n. 2, p. 311-315, Feb. 2004.
- Este periódico é de assinatura
- Este artigo NÃO é de acesso aberto
- Cor do Acesso Aberto: closed
-
ABNT
MOUSINHO, Ana Paula e MANSANO, Ronaldo Domingues e VERDONCK, Patrick Bernard. High-density plasma chemical vapor deposition of amorphous carbon films. Diamond and Related Materials, v. 13, n. 2, p. 311-315, 2004Tradução . . Disponível em: https://doi.org/10.1016/j.diamond.2003.10.024. Acesso em: 03 out. 2024. -
APA
Mousinho, A. P., Mansano, R. D., & Verdonck, P. B. (2004). High-density plasma chemical vapor deposition of amorphous carbon films. Diamond and Related Materials,, 13( 2), 311-315. doi:10.1016/j.diamond.2003.10.024 -
NLM
Mousinho AP, Mansano RD, Verdonck PB. High-density plasma chemical vapor deposition of amorphous carbon films [Internet]. Diamond and Related Materials,. 2004 ; 13( 2): 311-315.[citado 2024 out. 03 ] Available from: https://doi.org/10.1016/j.diamond.2003.10.024 -
Vancouver
Mousinho AP, Mansano RD, Verdonck PB. High-density plasma chemical vapor deposition of amorphous carbon films [Internet]. Diamond and Related Materials,. 2004 ; 13( 2): 311-315.[citado 2024 out. 03 ] Available from: https://doi.org/10.1016/j.diamond.2003.10.024 - Diamond like-carbon microoptics elements
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Informações sobre o DOI: 10.1016/j.diamond.2003.10.024 (Fonte: oaDOI API)
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