The influence of additives on electrical characteristics of DLC films deposited by reactive sputtering (2004)
- Authors:
- USP affiliated authors: MANSANO, RONALDO DOMINGUES - EP ; VERDONCK, PATRICK BERNARD - EP
- Unidade: EP
- Subjects: MICROELETRÔNICA; FILMES FINOS
- Language: Inglês
- Imprenta:
- Publisher: The Electrochemical Society
- Publisher place: Pennington
- Date published: 2004
- Source:
- Conference titles: International Symposium on Microelectronics Technology and Devices SBMICRO
-
ABNT
MANSANO, Ronaldo Domingues et al. The influence of additives on electrical characteristics of DLC films deposited by reactive sputtering. 2004, Anais.. Pennington: The Electrochemical Society, 2004. . Acesso em: 10 fev. 2026. -
APA
Mansano, R. D., Mousinho, A. P., Zambom, L. da S., Medeiros, M. S. de, Verdonck, P. B., Guerino, M., & Massi, M. (2004). The influence of additives on electrical characteristics of DLC films deposited by reactive sputtering. In Microelectronics technology and devices SBMicro 2004. Proceedings, v. 2004-03. Pennington: The Electrochemical Society. -
NLM
Mansano RD, Mousinho AP, Zambom L da S, Medeiros MS de, Verdonck PB, Guerino M, Massi M. The influence of additives on electrical characteristics of DLC films deposited by reactive sputtering. Microelectronics technology and devices SBMicro 2004. Proceedings, v. 2004-03. 2004 ;[citado 2026 fev. 10 ] -
Vancouver
Mansano RD, Mousinho AP, Zambom L da S, Medeiros MS de, Verdonck PB, Guerino M, Massi M. The influence of additives on electrical characteristics of DLC films deposited by reactive sputtering. Microelectronics technology and devices SBMicro 2004. Proceedings, v. 2004-03. 2004 ;[citado 2026 fev. 10 ] - Complex-amplitude modulation diffractive optical element performed by aperture variations on a reflective aluminum layer deposited over a variable thickness SiO2 substrate
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