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Artigo de periodico
Performance of differential pair circuits designed with line tunnel FET devices at different temperatures (2018)
Martino, Márcio Dalla Valle; Claeys, Cor ; Agopian, Paula Ghedini Der ; Rooyackers, Rita; Simoen, Eddy ; Martino, João Antonio
Source: Semiconductor Science and Technology. Unidade: EP
Assunto: SEMICONDUTORES
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ABNT
MARTINO, Márcio Dalla Valle et al. Performance of differential pair circuits designed with line tunnel FET devices at different temperatures. Semiconductor Science and Technology, v. 33, n. 7, p. 075012, 2018Tradução . . Disponível em: https://doi.org/10.1088/1361-6641/aac4fd. Acesso em: 07 dez. 2025.
APA
Martino, M. D. V., Claeys, C., Agopian, P. G. D., Rooyackers, R., Simoen, E., & Martino, J. A. (2018). Performance of differential pair circuits designed with line tunnel FET devices at different temperatures. Semiconductor Science and Technology, 33( 7), 075012. doi:10.1088/1361-6641/aac4fd
NLM
Martino MDV, Claeys C, Agopian PGD, Rooyackers R, Simoen E, Martino JA. Performance of differential pair circuits designed with line tunnel FET devices at different temperatures [Internet]. Semiconductor Science and Technology. 2018 ; 33( 7): 075012.[citado 2025 dez. 07 ] Available from: https://doi.org/10.1088/1361-6641/aac4fd
Vancouver
Martino MDV, Claeys C, Agopian PGD, Rooyackers R, Simoen E, Martino JA. Performance of differential pair circuits designed with line tunnel FET devices at different temperatures [Internet]. Semiconductor Science and Technology. 2018 ; 33( 7): 075012.[citado 2025 dez. 07 ] Available from: https://doi.org/10.1088/1361-6641/aac4fd
Artigo de periodico
Analysis of proton irradiated n- and p-type strained FinFETs at low temperatures down to 100 K (2018)
Caparroz, Luís Felipe Vicentis; Agopian, Paula Ghedini Der ; Claeys, Cor ; Simoen, Eddy ; Bordallo, Caio Cesar Mendes ; Martino, João Antonio
Source: Semiconductor Science and Technology. Unidades: EP, EACH
Subjects: TEMPERATURA, SEMICONDUTORES
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ABNT
CAPARROZ, Luís Felipe Vicentis et al. Analysis of proton irradiated n- and p-type strained FinFETs at low temperatures down to 100 K. Semiconductor Science and Technology, v. 33, n. 6, p. 065003, 2018Tradução . . Disponível em: https://doi.org/10.1088/1361-6641/aabab3. Acesso em: 07 dez. 2025.
APA
Caparroz, L. F. V., Agopian, P. G. D., Claeys, C., Simoen, E., Bordallo, C. C. M., & Martino, J. A. (2018). Analysis of proton irradiated n- and p-type strained FinFETs at low temperatures down to 100 K. Semiconductor Science and Technology, 33( 6), 065003. doi:10.1088/1361-6641/aabab3
NLM
Caparroz LFV, Agopian PGD, Claeys C, Simoen E, Bordallo CCM, Martino JA. Analysis of proton irradiated n- and p-type strained FinFETs at low temperatures down to 100 K [Internet]. Semiconductor Science and Technology. 2018 ; 33( 6): 065003.[citado 2025 dez. 07 ] Available from: https://doi.org/10.1088/1361-6641/aabab3
Vancouver
Caparroz LFV, Agopian PGD, Claeys C, Simoen E, Bordallo CCM, Martino JA. Analysis of proton irradiated n- and p-type strained FinFETs at low temperatures down to 100 K [Internet]. Semiconductor Science and Technology. 2018 ; 33( 6): 065003.[citado 2025 dez. 07 ] Available from: https://doi.org/10.1088/1361-6641/aabab3
Artigo de periodico
Analysis of current mirror circuits designed with line tunnel FET devices at different temperatures (2017)
Martino, Márcio Dalla Valle; Claeys, Cor ; Rooyackers, Rita; Simoen, Eddy ; Agopian, Paula Ghedini Der ; Vandooren, A; Martino, João Antonio
Source: Semiconductor Science and Technology. Unidade: EP
Subjects: TRANSISTORES, SEMICONDUTORES
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ABNT
MARTINO, Márcio Dalla Valle et al. Analysis of current mirror circuits designed with line tunnel FET devices at different temperatures. Semiconductor Science and Technology, v. 32, n. 5, p. 055015, 2017Tradução . . Disponível em: https://doi.org/10.1088/1361-6641/aa6764. Acesso em: 07 dez. 2025.
APA
Martino, M. D. V., Claeys, C., Rooyackers, R., Simoen, E., Agopian, P. G. D., Vandooren, A., & Martino, J. A. (2017). Analysis of current mirror circuits designed with line tunnel FET devices at different temperatures. Semiconductor Science and Technology, 32( 5), 055015. doi:10.1088/1361-6641/aa6764
NLM
Martino MDV, Claeys C, Rooyackers R, Simoen E, Agopian PGD, Vandooren A, Martino JA. Analysis of current mirror circuits designed with line tunnel FET devices at different temperatures [Internet]. Semiconductor Science and Technology. 2017 ; 32( 5): 055015.[citado 2025 dez. 07 ] Available from: https://doi.org/10.1088/1361-6641/aa6764
Vancouver
Martino MDV, Claeys C, Rooyackers R, Simoen E, Agopian PGD, Vandooren A, Martino JA. Analysis of current mirror circuits designed with line tunnel FET devices at different temperatures [Internet]. Semiconductor Science and Technology. 2017 ; 32( 5): 055015.[citado 2025 dez. 07 ] Available from: https://doi.org/10.1088/1361-6641/aa6764
Artigo de periodico
Analog parameters of solid source Zn diffusion In X Ga1−X As nTFETs down to 10 K (2016)
Bordallo, Caio Cesar Mendes ; Vandooren, A; Rooyackers, Rita; Mols, Yannick; Alian, A; Agopian, Paula Ghedini Der ; Martino, João Antonio
Source: Semiconductor Science and Technology. Unidade: EP
Subjects: SEMICONDUTORES, MICROELETRÔNICA
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ABNT
BORDALLO, Caio Cesar Mendes et al. Analog parameters of solid source Zn diffusion In X Ga1−X As nTFETs down to 10 K. Semiconductor Science and Technology, v. 31, n. 12, p. 124001, 2016Tradução . . Disponível em: https://doi.org/10.1088/0268-1242/31/12/124001. Acesso em: 07 dez. 2025.
APA
Bordallo, C. C. M., Vandooren, A., Rooyackers, R., Mols, Y., Alian, A., Agopian, P. G. D., & Martino, J. A. (2016). Analog parameters of solid source Zn diffusion In X Ga1−X As nTFETs down to 10 K. Semiconductor Science and Technology, 31( 12), 124001. doi:10.1088/0268-1242/31/12/124001
NLM
Bordallo CCM, Vandooren A, Rooyackers R, Mols Y, Alian A, Agopian PGD, Martino JA. Analog parameters of solid source Zn diffusion In X Ga1−X As nTFETs down to 10 K [Internet]. Semiconductor Science and Technology. 2016 ; 31( 12): 124001.[citado 2025 dez. 07 ] Available from: https://doi.org/10.1088/0268-1242/31/12/124001
Vancouver
Bordallo CCM, Vandooren A, Rooyackers R, Mols Y, Alian A, Agopian PGD, Martino JA. Analog parameters of solid source Zn diffusion In X Ga1−X As nTFETs down to 10 K [Internet]. Semiconductor Science and Technology. 2016 ; 31( 12): 124001.[citado 2025 dez. 07 ] Available from: https://doi.org/10.1088/0268-1242/31/12/124001
Artigo de periodico
Improved operation of graded-channel SOI nMOSFETs down to liquid helium temperature (2016)
Pavanello, Marcelo Antonio ; Souza, Michelly de; Ribeiro, Thales Augusto; Martino, João Antonio ; Flandre, Denis
Source: Semiconductor Science and Technology. Unidade: EP
Subjects: SILÍCIO, SEMICONDUTORES
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ABNT
PAVANELLO, Marcelo Antonio et al. Improved operation of graded-channel SOI nMOSFETs down to liquid helium temperature. Semiconductor Science and Technology, v. 31, n. 11, p. 114005, 2016Tradução . . Disponível em: https://doi.org/10.1088/0268-1242/31/11/114005. Acesso em: 07 dez. 2025.
APA
Pavanello, M. A., Souza, M. de, Ribeiro, T. A., Martino, J. A., & Flandre, D. (2016). Improved operation of graded-channel SOI nMOSFETs down to liquid helium temperature. Semiconductor Science and Technology, 31( 11), 114005. doi:10.1088/0268-1242/31/11/114005
NLM
Pavanello MA, Souza M de, Ribeiro TA, Martino JA, Flandre D. Improved operation of graded-channel SOI nMOSFETs down to liquid helium temperature [Internet]. Semiconductor Science and Technology. 2016 ; 31( 11): 114005.[citado 2025 dez. 07 ] Available from: https://doi.org/10.1088/0268-1242/31/11/114005
Vancouver
Pavanello MA, Souza M de, Ribeiro TA, Martino JA, Flandre D. Improved operation of graded-channel SOI nMOSFETs down to liquid helium temperature [Internet]. Semiconductor Science and Technology. 2016 ; 31( 11): 114005.[citado 2025 dez. 07 ] Available from: https://doi.org/10.1088/0268-1242/31/11/114005
Artigo de periodico
Split CV mobility at low temperature operation of Ge pFinFETs fabricated with STI first and last processes (2016)
Oliveira, Alberto Vinicius de; Agopian, Paula Ghedini Der ; Simoen, Eddy ; Langer, Robert; Collaert, Nadine ; Thean, Aaron; Claeys, Cor ; Martino, João Antonio
Source: Semiconductor Science and Technology. Unidade: EP
Subjects: SEMICONDUTORES, MICROELETRÔNICA
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ABNT
OLIVEIRA, Alberto Vinicius de et al. Split CV mobility at low temperature operation of Ge pFinFETs fabricated with STI first and last processes. Semiconductor Science and Technology, v. 31, n. 11, p. 114002 , 2016Tradução . . Disponível em: https://doi.org/10.1088/0268-1242/31/11/114002. Acesso em: 07 dez. 2025.
APA
Oliveira, A. V. de, Agopian, P. G. D., Simoen, E., Langer, R., Collaert, N., Thean, A., et al. (2016). Split CV mobility at low temperature operation of Ge pFinFETs fabricated with STI first and last processes. Semiconductor Science and Technology, 31( 11), 114002 . doi:10.1088/0268-1242/31/11/114002
NLM
Oliveira AV de, Agopian PGD, Simoen E, Langer R, Collaert N, Thean A, Claeys C, Martino JA. Split CV mobility at low temperature operation of Ge pFinFETs fabricated with STI first and last processes [Internet]. Semiconductor Science and Technology. 2016 ; 31( 11): 114002 .[citado 2025 dez. 07 ] Available from: https://doi.org/10.1088/0268-1242/31/11/114002
Vancouver
Oliveira AV de, Agopian PGD, Simoen E, Langer R, Collaert N, Thean A, Claeys C, Martino JA. Split CV mobility at low temperature operation of Ge pFinFETs fabricated with STI first and last processes [Internet]. Semiconductor Science and Technology. 2016 ; 31( 11): 114002 .[citado 2025 dez. 07 ] Available from: https://doi.org/10.1088/0268-1242/31/11/114002
Artigo de periodico
Performance of TFET and FinFET devices applied to current mirrors for different dimensions and temperatures (2016)
Martino, Márcio Dalla Valle; Martino, João Antonio ; Agopian, Paula Ghedini Der ; Vandooren, A; Rooyackers, Rita; Simoen, Eddy ; Claeys, Cor
Source: Semiconductor Science and Technology. Unidade: EP
Assunto: SEMICONDUTORES
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ABNT
MARTINO, Márcio Dalla Valle et al. Performance of TFET and FinFET devices applied to current mirrors for different dimensions and temperatures. Semiconductor Science and Technology, v. 31, n. 5, 2016Tradução . . Disponível em: https://doi.org/10.1088/0268-1242/31/5/055001. Acesso em: 07 dez. 2025.
APA
Martino, M. D. V., Martino, J. A., Agopian, P. G. D., Vandooren, A., Rooyackers, R., Simoen, E., & Claeys, C. (2016). Performance of TFET and FinFET devices applied to current mirrors for different dimensions and temperatures. Semiconductor Science and Technology, 31( 5). doi:10.1088/0268-1242/31/5/055001
NLM
Martino MDV, Martino JA, Agopian PGD, Vandooren A, Rooyackers R, Simoen E, Claeys C. Performance of TFET and FinFET devices applied to current mirrors for different dimensions and temperatures [Internet]. Semiconductor Science and Technology. 2016 ; 31( 5):[citado 2025 dez. 07 ] Available from: https://doi.org/10.1088/0268-1242/31/5/055001
Vancouver
Martino MDV, Martino JA, Agopian PGD, Vandooren A, Rooyackers R, Simoen E, Claeys C. Performance of TFET and FinFET devices applied to current mirrors for different dimensions and temperatures [Internet]. Semiconductor Science and Technology. 2016 ; 31( 5):[citado 2025 dez. 07 ] Available from: https://doi.org/10.1088/0268-1242/31/5/055001
Artigo de periodico
Analog performance of standard and uniaxial strained triple-gate SOI FinFETs under x-ray radiation (2014)
Bordallo, Caio Cesar Mendes ; Martino, João Antonio ; Teixeira, Fernando Ferrari; Silveira, Marcilei Aparecida Guazzelli da; Agopian, Paula Ghedini Der ; Simoen, Eddy ; Claeys, Cor
Source: Semiconductor Science and Technology. Unidade: EP
Subjects: RAIOS X, MICROELETRÔNICA
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ABNT
BORDALLO, Caio Cesar Mendes et al. Analog performance of standard and uniaxial strained triple-gate SOI FinFETs under x-ray radiation. Semiconductor Science and Technology, v. 29, n. 12, p. 125015, 2014Tradução . . Disponível em: https://doi.org/10.1088/0268-1242/29/12/125015. Acesso em: 07 dez. 2025.
APA
Bordallo, C. C. M., Martino, J. A., Teixeira, F. F., Silveira, M. A. G. da, Agopian, P. G. D., Simoen, E., & Claeys, C. (2014). Analog performance of standard and uniaxial strained triple-gate SOI FinFETs under x-ray radiation. Semiconductor Science and Technology, 29( 12), 125015. doi:10.1088/0268-1242/29/12/125015
NLM
Bordallo CCM, Martino JA, Teixeira FF, Silveira MAG da, Agopian PGD, Simoen E, Claeys C. Analog performance of standard and uniaxial strained triple-gate SOI FinFETs under x-ray radiation [Internet]. Semiconductor Science and Technology. 2014 ; 29( 12): 125015.[citado 2025 dez. 07 ] Available from: https://doi.org/10.1088/0268-1242/29/12/125015
Vancouver
Bordallo CCM, Martino JA, Teixeira FF, Silveira MAG da, Agopian PGD, Simoen E, Claeys C. Analog performance of standard and uniaxial strained triple-gate SOI FinFETs under x-ray radiation [Internet]. Semiconductor Science and Technology. 2014 ; 29( 12): 125015.[citado 2025 dez. 07 ] Available from: https://doi.org/10.1088/0268-1242/29/12/125015
Artigo de periodico
Miniband structures and effective masses of n-type 'delta'-doping superlattices in 'GaN' (1998)
Rodrigues, S C P; Rosa, A L; Scolfaro, Luísa Maria Ribeiro; Beliaev, Dmitri; Leite, J. R.; Enderlein, R; Alves, J L A
Source: Semiconductor Science and Technology. Unidade: IF
Assunto: ENGENHARIA MECÂNICA
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ABNT
RODRIGUES, S C P et al. Miniband structures and effective masses of n-type 'delta'-doping superlattices in 'GaN'. Semiconductor Science and Technology, v. 13, p. 981-988, 1998Tradução . . Acesso em: 07 dez. 2025.
APA
Rodrigues, S. C. P., Rosa, A. L., Scolfaro, L. M. R., Beliaev, D., Leite, J. R., Enderlein, R., & Alves, J. L. A. (1998). Miniband structures and effective masses of n-type 'delta'-doping superlattices in 'GaN'. Semiconductor Science and Technology, 13, 981-988.
NLM
Rodrigues SCP, Rosa AL, Scolfaro LMR, Beliaev D, Leite JR, Enderlein R, Alves JLA. Miniband structures and effective masses of n-type 'delta'-doping superlattices in 'GaN'. Semiconductor Science and Technology. 1998 ; 13 981-988.[citado 2025 dez. 07 ]
Vancouver
Rodrigues SCP, Rosa AL, Scolfaro LMR, Beliaev D, Leite JR, Enderlein R, Alves JLA. Miniband structures and effective masses of n-type 'delta'-doping superlattices in 'GaN'. Semiconductor Science and Technology. 1998 ; 13 981-988.[citado 2025 dez. 07 ]
Artigo de periodico
Characterization of periodically 'delta'-doped semiconductors by capacitance-voltage profiling (1997)
Gonçalves, L. C. D.; Henriques, André Bohomoletz ; Souza, P. L.; Yavich, B
Source: Semiconductor Science and Technology. Unidade: IF
Assunto: MATÉRIA CONDENSADA
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ABNT
GONÇALVES, L. C. D. et al. Characterization of periodically 'delta'-doped semiconductors by capacitance-voltage profiling. Semiconductor Science and Technology, v. 12, p. 1455-1458, 1997Tradução . . Disponível em: https://doi.org/10.1088/0268-1242/12/11/022. Acesso em: 07 dez. 2025.
APA
Gonçalves, L. C. D., Henriques, A. B., Souza, P. L., & Yavich, B. (1997). Characterization of periodically 'delta'-doped semiconductors by capacitance-voltage profiling. Semiconductor Science and Technology, 12, 1455-1458. doi:10.1088/0268-1242/12/11/022
NLM
Gonçalves LCD, Henriques AB, Souza PL, Yavich B. Characterization of periodically 'delta'-doped semiconductors by capacitance-voltage profiling [Internet]. Semiconductor Science and Technology. 1997 ; 12 1455-1458.[citado 2025 dez. 07 ] Available from: https://doi.org/10.1088/0268-1242/12/11/022
Vancouver
Gonçalves LCD, Henriques AB, Souza PL, Yavich B. Characterization of periodically 'delta'-doped semiconductors by capacitance-voltage profiling [Internet]. Semiconductor Science and Technology. 1997 ; 12 1455-1458.[citado 2025 dez. 07 ] Available from: https://doi.org/10.1088/0268-1242/12/11/022
Artigo de periodico
New theoretical model for optical transitions in the photoreflectance spectrum from 'GHAMA'-doped structures (1993)
Beliaev, D; Scolfaro, L M R; Leite, J. R.
Source: Semiconductor Science and Technology. Unidade: IF
Assunto: MATÉRIA CONDENSADA
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ABNT
BELIAEV, D e SCOLFARO, L M R e LEITE, J. R. New theoretical model for optical transitions in the photoreflectance spectrum from 'GHAMA'-doped structures. Semiconductor Science and Technology, v. 8 , p. 1479, 1993Tradução . . Acesso em: 07 dez. 2025.
APA
Beliaev, D., Scolfaro, L. M. R., & Leite, J. R. (1993). New theoretical model for optical transitions in the photoreflectance spectrum from 'GHAMA'-doped structures. Semiconductor Science and Technology, 8 , 1479.
NLM
Beliaev D, Scolfaro LMR, Leite JR. New theoretical model for optical transitions in the photoreflectance spectrum from 'GHAMA'-doped structures. Semiconductor Science and Technology. 1993 ;8 1479.[citado 2025 dez. 07 ]
Vancouver
Beliaev D, Scolfaro LMR, Leite JR. New theoretical model for optical transitions in the photoreflectance spectrum from 'GHAMA'-doped structures. Semiconductor Science and Technology. 1993 ;8 1479.[citado 2025 dez. 07 ]
Artigo de periodico
Doping of silicon with boron by rapid thermal processing (1988)
Souza, J. P.; Hasenack, Claus Martin; Swart, Jacobus Willibrordus
Source: Semiconductor Science and Technology. Unidade: EP
Subjects: SILÍCIO, SEMICONDUTORES
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ABNT
SOUZA, J. P. e HASENACK, Claus Martin e SWART, Jacobus Willibrordus. Doping of silicon with boron by rapid thermal processing. Semiconductor Science and Technology, v. 3 , n. 4 , p. 277-90, 1988Tradução . . Acesso em: 07 dez. 2025.
APA
Souza, J. P., Hasenack, C. M., & Swart, J. W. (1988). Doping of silicon with boron by rapid thermal processing. Semiconductor Science and Technology, 3 ( 4 ), 277-90.
NLM
Souza JP, Hasenack CM, Swart JW. Doping of silicon with boron by rapid thermal processing. Semiconductor Science and Technology. 1988 ;3 ( 4 ): 277-90.[citado 2025 dez. 07 ]
Vancouver
Souza JP, Hasenack CM, Swart JW. Doping of silicon with boron by rapid thermal processing. Semiconductor Science and Technology. 1988 ;3 ( 4 ): 277-90.[citado 2025 dez. 07 ]
Artigo de periodico
Exciton-phonon systems in 'GA''AS'-'GA IND. 1-X''AL IND.X''AS' quantum wells (1987)
Degani, Marcos Henrique; Hipólito, Oscar
Source: Semiconductor Science and Technology. Unidade: IFSC
Subjects: FÍSICA TEÓRICA, POÇOS QUÂNTICOS
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ABNT
DEGANI, Marcos Henrique e HIPÓLITO, Oscar. Exciton-phonon systems in 'GA''AS'-'GA IND. 1-X''AL IND.X''AS' quantum wells. Semiconductor Science and Technology, v. 2 , p. 578-581, 1987Tradução . . Disponível em: https://doi.org/10.1088/0268-1242/2/9/003. Acesso em: 07 dez. 2025.
APA
Degani, M. H., & Hipólito, O. (1987). Exciton-phonon systems in 'GA''AS'-'GA IND. 1-X''AL IND.X''AS' quantum wells. Semiconductor Science and Technology, 2 , 578-581. doi:10.1088/0268-1242/2/9/003
NLM
Degani MH, Hipólito O. Exciton-phonon systems in 'GA''AS'-'GA IND. 1-X''AL IND.X''AS' quantum wells [Internet]. Semiconductor Science and Technology. 1987 ;2 578-581.[citado 2025 dez. 07 ] Available from: https://doi.org/10.1088/0268-1242/2/9/003
Vancouver
Degani MH, Hipólito O. Exciton-phonon systems in 'GA''AS'-'GA IND. 1-X''AL IND.X''AS' quantum wells [Internet]. Semiconductor Science and Technology. 1987 ;2 578-581.[citado 2025 dez. 07 ] Available from: https://doi.org/10.1088/0268-1242/2/9/003

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