The influence of the AC component of the plasma potential on the measurement of the ion flux (2004)
- Authors:
- Autor USP: VERDONCK, PATRICK BERNARD - EP
- Unidade: EP
- Subjects: MICROELETRÔNICA; CIRCUITOS INTEGRADOS
- Language: Inglês
- Imprenta:
- Publisher: The Electrochemical Society
- Publisher place: Pennington
- Date published: 2004
- ISBN: 1-56677-416-0
- Source:
- Título do periódico: Microelectronics Technology and Devices SBMicro 2004. Proceedings, v. 2004-03
- Conference titles: International Symposium on Microelectronics Technology and Devices SBMICRO
-
ABNT
SWART, Jacobus Willibrordus; VERDONCK, Patrick Bernard. The influence of the AC component of the plasma potential on the measurement of the ion flux. Anais.. Pennington: The Electrochemical Society, 2004. -
APA
Swart, J. W., & Verdonck, P. B. (2004). The influence of the AC component of the plasma potential on the measurement of the ion flux. In Microelectronics Technology and Devices SBMicro 2004. Proceedings, v. 2004-03. Pennington: The Electrochemical Society. -
NLM
Swart JW, Verdonck PB. The influence of the AC component of the plasma potential on the measurement of the ion flux. Microelectronics Technology and Devices SBMicro 2004. Proceedings, v. 2004-03. 2004 ; -
Vancouver
Swart JW, Verdonck PB. The influence of the AC component of the plasma potential on the measurement of the ion flux. Microelectronics Technology and Devices SBMicro 2004. Proceedings, v. 2004-03. 2004 ; - Development and characterization of 'SI IND.3''N IND.4' plasma etching processes
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