ReP USP - Resultado da busca

Trabalho de evento
Analytical model for cylindrical junctionless nanowire FETs (2024)
Souza, Adelcio Marques de; Celino, Daniel Ricardo; Ragi, Regiane; Romero, Murilo Araujo
Conference titles: IEEE Latin American Symposium on Circuits and Systems - LASCAS. Unidade: EESC
Subjects: TRANSISTORES, CIRCUITOS INTEGRADOS, NANOTECNOLOGIA, ENGENHARIA MECÂNICA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
SOUZA, Adelcio Marques de et al. Analytical model for cylindrical junctionless nanowire FETs. 2024, Anais.. Piscataway, NJ, USA: Escola de Engenharia de São Carlos, Universidade de São Paulo, 2024. Disponível em: http://dx.doi.org/10.1109/LASCAS60203.2024.10506187. Acesso em: 16 out. 2024.
APA
Souza, A. M. de, Celino, D. R., Ragi, R., & Romero, M. A. (2024). Analytical model for cylindrical junctionless nanowire FETs. In . Piscataway, NJ, USA: Escola de Engenharia de São Carlos, Universidade de São Paulo. doi:10.1109/LASCAS60203.2024.10506187
NLM
Souza AM de, Celino DR, Ragi R, Romero MA. Analytical model for cylindrical junctionless nanowire FETs [Internet]. 2024 ;[citado 2024 out. 16 ] Available from: http://dx.doi.org/10.1109/LASCAS60203.2024.10506187
Vancouver
Souza AM de, Celino DR, Ragi R, Romero MA. Analytical model for cylindrical junctionless nanowire FETs [Internet]. 2024 ;[citado 2024 out. 16 ] Available from: http://dx.doi.org/10.1109/LASCAS60203.2024.10506187
Artigo de periodico
An enzymatic glucose biosensor using the BESOI MOSFET (2024)
Yojo, Leonardo Shimizu; Rangel, R C; Duarte, Pedro Henrique; Sasaki, Kátia Regina Akemi ; Martino, João Antonio
Source: Solid State Electronics. Unidade: EP
Subjects: GLICOSE, DRENAGEM, TRANSISTORES
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
YOJO, Leonardo Shimizu et al. An enzymatic glucose biosensor using the BESOI MOSFET. Solid State Electronics, v. 211, n. Ja 2024, p. 1-6, 2024Tradução . . Disponível em: https://doi.org/10.1016/j.sse.2023.108830. Acesso em: 16 out. 2024.
APA
Yojo, L. S., Rangel, R. C., Duarte, P. H., Sasaki, K. R. A., & Martino, J. A. (2024). An enzymatic glucose biosensor using the BESOI MOSFET. Solid State Electronics, 211( Ja 2024), 1-6. doi:10.1016/j.sse.2023.108830
NLM
Yojo LS, Rangel RC, Duarte PH, Sasaki KRA, Martino JA. An enzymatic glucose biosensor using the BESOI MOSFET [Internet]. Solid State Electronics. 2024 ;211( Ja 2024): 1-6.[citado 2024 out. 16 ] Available from: https://doi.org/10.1016/j.sse.2023.108830
Vancouver
Yojo LS, Rangel RC, Duarte PH, Sasaki KRA, Martino JA. An enzymatic glucose biosensor using the BESOI MOSFET [Internet]. Solid State Electronics. 2024 ;211( Ja 2024): 1-6.[citado 2024 out. 16 ] Available from: https://doi.org/10.1016/j.sse.2023.108830
Artigo de periodico
Study of ISFET for KCl sensing (2024)
Duarte, Pedro Henrique; Rangel, Ricardo Cardoso; Sasaki, Kátia Regina Akemi ; Martino, João Antonio
Source: Solid State Electronics. Unidade: EP
Subjects: TRANSISTORES, PERÓXIDO DE HIDROGÊNIO, SENSORES BIOMÉDICOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
DUARTE, Pedro Henrique et al. Study of ISFET for KCl sensing. Solid State Electronics, v. 219, p. 1-5, 2024Tradução . . Disponível em: https://doi.org/10.1016/j.sse.2024.108974. Acesso em: 16 out. 2024.
APA
Duarte, P. H., Rangel, R. C., Sasaki, K. R. A., & Martino, J. A. (2024). Study of ISFET for KCl sensing. Solid State Electronics, 219, 1-5. doi:10.1016/j.sse.2024.108974
NLM
Duarte PH, Rangel RC, Sasaki KRA, Martino JA. Study of ISFET for KCl sensing [Internet]. Solid State Electronics. 2024 ; 219 1-5.[citado 2024 out. 16 ] Available from: https://doi.org/10.1016/j.sse.2024.108974
Vancouver
Duarte PH, Rangel RC, Sasaki KRA, Martino JA. Study of ISFET for KCl sensing [Internet]. Solid State Electronics. 2024 ; 219 1-5.[citado 2024 out. 16 ] Available from: https://doi.org/10.1016/j.sse.2024.108974
Artigo de periodico
Impact of ionic species on the performance of PEDOT:PSS-based organic electrochemical transistors (2024)
Colucci, Renan ; Feitosa, Bianca de Andrade ; Faria, Gregório Couto
Source: Advanced Electronic Materials. Unidades: IFSC, EESC
Subjects: TRANSISTORES, MATERIAIS ELETRÔNICOS, ELETROQUÍMICA ORGÂNICA, POLÍMEROS (QUÍMICA ORGÂNICA)
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
COLUCCI, Renan e FEITOSA, Bianca de Andrade e FARIA, Gregório Couto. Impact of ionic species on the performance of PEDOT:PSS-based organic electrochemical transistors. Advanced Electronic Materials, v. 10, n. 2, p. 2300235-1-2300235-8 + supporting information, 2024Tradução . . Disponível em: https://doi.org/10.1002/aelm.202300235. Acesso em: 16 out. 2024.
APA
Colucci, R., Feitosa, B. de A., & Faria, G. C. (2024). Impact of ionic species on the performance of PEDOT:PSS-based organic electrochemical transistors. Advanced Electronic Materials, 10( 2), 2300235-1-2300235-8 + supporting information. doi:10.1002/aelm.202300235
NLM
Colucci R, Feitosa B de A, Faria GC. Impact of ionic species on the performance of PEDOT:PSS-based organic electrochemical transistors [Internet]. Advanced Electronic Materials. 2024 ; 10( 2): 2300235-1-2300235-8 + supporting information.[citado 2024 out. 16 ] Available from: https://doi.org/10.1002/aelm.202300235
Vancouver
Colucci R, Feitosa B de A, Faria GC. Impact of ionic species on the performance of PEDOT:PSS-based organic electrochemical transistors [Internet]. Advanced Electronic Materials. 2024 ; 10( 2): 2300235-1-2300235-8 + supporting information.[citado 2024 out. 16 ] Available from: https://doi.org/10.1002/aelm.202300235
Artigo de periodico
Guidelines on measuring volumetric capacitance in organic electrochemical transistors (2024)
Luginieski, Marcos ; Torres, Bruno Bassi Millan ; Faria, Gregório Couto
Source: ACS Applied Electronic Materials. Unidade: IFSC
Subjects: ELETROQUÍMICA, TRANSISTORES, POLÍMEROS (MATERIAIS)
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
LUGINIESKI, Marcos e TORRES, Bruno Bassi Millan e FARIA, Gregório Couto. Guidelines on measuring volumetric capacitance in organic electrochemical transistors. ACS Applied Electronic Materials, v. 6, n. 4, p. 2225-2231 + supporting information: S1-S10, 2024Tradução . . Disponível em: https://doi.org/10.1021/acsaelm.3c01673. Acesso em: 16 out. 2024.
APA
Luginieski, M., Torres, B. B. M., & Faria, G. C. (2024). Guidelines on measuring volumetric capacitance in organic electrochemical transistors. ACS Applied Electronic Materials, 6( 4), 2225-2231 + supporting information: S1-S10. doi:10.1021/acsaelm.3c01673
NLM
Luginieski M, Torres BBM, Faria GC. Guidelines on measuring volumetric capacitance in organic electrochemical transistors [Internet]. ACS Applied Electronic Materials. 2024 ; 6( 4): 2225-2231 + supporting information: S1-S10.[citado 2024 out. 16 ] Available from: https://doi.org/10.1021/acsaelm.3c01673
Vancouver
Luginieski M, Torres BBM, Faria GC. Guidelines on measuring volumetric capacitance in organic electrochemical transistors [Internet]. ACS Applied Electronic Materials. 2024 ; 6( 4): 2225-2231 + supporting information: S1-S10.[citado 2024 out. 16 ] Available from: https://doi.org/10.1021/acsaelm.3c01673
Artigo de periodico
Experimental study of MISHEMT from 450 K down to 200 K for analog applications (2023)
Perina, Welder Fernandes; Martino, João Antonio ; Simoen, Eddy ; Peralagu, Uthayasankaran; Collaert, Nadine ; Agopian, Paula Ghedini Der
Source: Solid State Electronics. Unidade: EP
Subjects: TRANSISTORES, CIRCUITOS ANALÓGICOS, SEMICONDUTORES
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
PERINA, Welder Fernandes et al. Experimental study of MISHEMT from 450 K down to 200 K for analog applications. Solid State Electronics, v. 208, p. 1-4, 2023Tradução . . Disponível em: https://doi.org/10.1016/j.sse.2023.108742. Acesso em: 16 out. 2024.
APA
Perina, W. F., Martino, J. A., Simoen, E., Peralagu, U., Collaert, N., & Agopian, P. G. D. (2023). Experimental study of MISHEMT from 450 K down to 200 K for analog applications. Solid State Electronics, 208, 1-4. doi:10.1016/j.sse.2023.108742
NLM
Perina WF, Martino JA, Simoen E, Peralagu U, Collaert N, Agopian PGD. Experimental study of MISHEMT from 450 K down to 200 K for analog applications [Internet]. Solid State Electronics. 2023 ; 208 1-4.[citado 2024 out. 16 ] Available from: https://doi.org/10.1016/j.sse.2023.108742
Vancouver
Perina WF, Martino JA, Simoen E, Peralagu U, Collaert N, Agopian PGD. Experimental study of MISHEMT from 450 K down to 200 K for analog applications [Internet]. Solid State Electronics. 2023 ; 208 1-4.[citado 2024 out. 16 ] Available from: https://doi.org/10.1016/j.sse.2023.108742
Artigo de periodico
Cu-modified electrolyte-gated transistors based on reduced graphene oxide (2023)
Ferreira, Rafael Cintra Hensel ; Comisso, Nicola ; Musiani, Marco ; Sedona, Francesco ; Sambi, Mauro ; Cester, Andrea ; Lago, Nicolò ; Casalini, Stefano
Source: Journal of Materials Chemistry C. Unidade: IFSC
Subjects: COBRE, TRANSISTORES, ELETRÔNICA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
FERREIRA, Rafael Cintra Hensel et al. Cu-modified electrolyte-gated transistors based on reduced graphene oxide. Journal of Materials Chemistry C, v. 11, n. 26, p. 8876-8884 + supplementary information, 2023Tradução . . Disponível em: https://doi.org/10.1039/d3tc00596h. Acesso em: 16 out. 2024.
APA
Ferreira, R. C. H., Comisso, N., Musiani, M., Sedona, F., Sambi, M., Cester, A., et al. (2023). Cu-modified electrolyte-gated transistors based on reduced graphene oxide. Journal of Materials Chemistry C, 11( 26), 8876-8884 + supplementary information. doi:10.1039/d3tc00596h
NLM
Ferreira RCH, Comisso N, Musiani M, Sedona F, Sambi M, Cester A, Lago N, Casalini S. Cu-modified electrolyte-gated transistors based on reduced graphene oxide [Internet]. Journal of Materials Chemistry C. 2023 ; 11( 26): 8876-8884 + supplementary information.[citado 2024 out. 16 ] Available from: https://doi.org/10.1039/d3tc00596h
Vancouver
Ferreira RCH, Comisso N, Musiani M, Sedona F, Sambi M, Cester A, Lago N, Casalini S. Cu-modified electrolyte-gated transistors based on reduced graphene oxide [Internet]. Journal of Materials Chemistry C. 2023 ; 11( 26): 8876-8884 + supplementary information.[citado 2024 out. 16 ] Available from: https://doi.org/10.1039/d3tc00596h
Artigo de periodico
Hybrid low-dropout voltage regulator designed with TFET-MOSFET nanowire technologies (2023)
Toledo, Rodrigo do Nascimento; Martino, João Antonio ; Agopian, Paula Ghedini Der
Source: Semiconductor Science and Technology. Unidade: EP
Subjects: CIRCUITOS ANALÓGICOS, TRANSISTORES
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
TOLEDO, Rodrigo do Nascimento e MARTINO, João Antonio e AGOPIAN, Paula Ghedini Der. Hybrid low-dropout voltage regulator designed with TFET-MOSFET nanowire technologies. Semiconductor Science and Technology, v. 38, n. 9, p. 1-12, 2023Tradução . . Disponível em: https://doi.org/10.1088/1361-6641/aceb84. Acesso em: 16 out. 2024.
APA
Toledo, R. do N., Martino, J. A., & Agopian, P. G. D. (2023). Hybrid low-dropout voltage regulator designed with TFET-MOSFET nanowire technologies. Semiconductor Science and Technology, 38( 9), 1-12. doi:10.1088/1361-6641/aceb84
NLM
Toledo R do N, Martino JA, Agopian PGD. Hybrid low-dropout voltage regulator designed with TFET-MOSFET nanowire technologies [Internet]. Semiconductor Science and Technology. 2023 ; 38( 9): 1-12.[citado 2024 out. 16 ] Available from: https://doi.org/10.1088/1361-6641/aceb84
Vancouver
Toledo R do N, Martino JA, Agopian PGD. Hybrid low-dropout voltage regulator designed with TFET-MOSFET nanowire technologies [Internet]. Semiconductor Science and Technology. 2023 ; 38( 9): 1-12.[citado 2024 out. 16 ] Available from: https://doi.org/10.1088/1361-6641/aceb84
Artigo de periodico
Comparison of low-dropout voltage regulators designed with line and nanowire tunnel-FET experimental data including a simple process variability analysis (2023)
Silva, Wenita de Lima; Toledo, Rodrigo do Nascimento; Gonçalez Filho, Walter; Nogueira, Alexandro de Moraes; Agopian, Paula Ghedini Der ; Martino, João Antonio
Source: Solid State Electronics. Unidade: EP
Subjects: TRANSISTORES, CIRCUITOS ANALÓGICOS, NANOTECNOLOGIA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
SILVA, Wenita de Lima et al. Comparison of low-dropout voltage regulators designed with line and nanowire tunnel-FET experimental data including a simple process variability analysis. Solid State Electronics, v. 202, p. 1-8, 2023Tradução . . Disponível em: https://doi.org/10.1016/j.sse.2023.108611. Acesso em: 16 out. 2024.
APA
Silva, W. de L., Toledo, R. do N., Gonçalez Filho, W., Nogueira, A. de M., Agopian, P. G. D., & Martino, J. A. (2023). Comparison of low-dropout voltage regulators designed with line and nanowire tunnel-FET experimental data including a simple process variability analysis. Solid State Electronics, 202, 1-8. doi:10.1016/j.sse.2023.108611
NLM
Silva W de L, Toledo R do N, Gonçalez Filho W, Nogueira A de M, Agopian PGD, Martino JA. Comparison of low-dropout voltage regulators designed with line and nanowire tunnel-FET experimental data including a simple process variability analysis [Internet]. Solid State Electronics. 2023 ; 202 1-8.[citado 2024 out. 16 ] Available from: https://doi.org/10.1016/j.sse.2023.108611
Vancouver
Silva W de L, Toledo R do N, Gonçalez Filho W, Nogueira A de M, Agopian PGD, Martino JA. Comparison of low-dropout voltage regulators designed with line and nanowire tunnel-FET experimental data including a simple process variability analysis [Internet]. Solid State Electronics. 2023 ; 202 1-8.[citado 2024 out. 16 ] Available from: https://doi.org/10.1016/j.sse.2023.108611
Trabalho de evento
Analysis of the trade-off between voltage gain and frequency response of OTA designed using experimental data of omega-gate nanowire SOI MOSFETs (2023)
Araújo, Gustavo Vinicius de; Martino, João Antonio ; Agopian, Paula Ghedini Der
Source: SBMicro. Conference titles: Symposium on Microelectronics Technology and Devices. Unidade: EP
Subjects: TRANSISTORES, CIRCUITOS ANALÓGICOS, MICROELETRÔNICA, MATERIAIS NANOESTRUTURADOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
ARAÚJO, Gustavo Vinicius de e MARTINO, João Antonio e AGOPIAN, Paula Ghedini Der. Analysis of the trade-off between voltage gain and frequency response of OTA designed using experimental data of omega-gate nanowire SOI MOSFETs. 2023, Anais.. [Piscataway, N.J.]: IEEE, 2023. Disponível em: https://doi.org/10.1109/SBMicro60499.2023.10302603. Acesso em: 16 out. 2024.
APA
Araújo, G. V. de, Martino, J. A., & Agopian, P. G. D. (2023). Analysis of the trade-off between voltage gain and frequency response of OTA designed using experimental data of omega-gate nanowire SOI MOSFETs. In SBMicro. [Piscataway, N.J.]: IEEE. doi:10.1109/SBMicro60499.2023.10302603
NLM
Araújo GV de, Martino JA, Agopian PGD. Analysis of the trade-off between voltage gain and frequency response of OTA designed using experimental data of omega-gate nanowire SOI MOSFETs [Internet]. SBMicro. 2023 ;[citado 2024 out. 16 ] Available from: https://doi.org/10.1109/SBMicro60499.2023.10302603
Vancouver
Araújo GV de, Martino JA, Agopian PGD. Analysis of the trade-off between voltage gain and frequency response of OTA designed using experimental data of omega-gate nanowire SOI MOSFETs [Internet]. SBMicro. 2023 ;[citado 2024 out. 16 ] Available from: https://doi.org/10.1109/SBMicro60499.2023.10302603
Artigo de periodico
Evaluation of n-type gate-all-around vertically-stacked nanosheet FETs from 473 K down to 173 K for analog applications (2023)
Silva, V C P; Martino, João Antonio ; Simoen, Eddy ; Veloso, Anabela; Agopian, Paula Ghedini Der
Source: Solid State Electronics. Unidade: EP
Subjects: TRANSISTORES, TEMPERATURA, NANOTECNOLOGIA, CIRCUITOS ANALÓGICOS, CIRCUITOS DIGITAIS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
SILVA, V C P et al. Evaluation of n-type gate-all-around vertically-stacked nanosheet FETs from 473 K down to 173 K for analog applications. Solid State Electronics, v. 208, p. 1-5, 2023Tradução . . Disponível em: https://doi.org/10.1016/j.sse.2023.108729. Acesso em: 16 out. 2024.
APA
Silva, V. C. P., Martino, J. A., Simoen, E., Veloso, A., & Agopian, P. G. D. (2023). Evaluation of n-type gate-all-around vertically-stacked nanosheet FETs from 473 K down to 173 K for analog applications. Solid State Electronics, 208, 1-5. doi:10.1016/j.sse.2023.108729
NLM
Silva VCP, Martino JA, Simoen E, Veloso A, Agopian PGD. Evaluation of n-type gate-all-around vertically-stacked nanosheet FETs from 473 K down to 173 K for analog applications [Internet]. Solid State Electronics. 2023 ;208 1-5.[citado 2024 out. 16 ] Available from: https://doi.org/10.1016/j.sse.2023.108729
Vancouver
Silva VCP, Martino JA, Simoen E, Veloso A, Agopian PGD. Evaluation of n-type gate-all-around vertically-stacked nanosheet FETs from 473 K down to 173 K for analog applications [Internet]. Solid State Electronics. 2023 ;208 1-5.[citado 2024 out. 16 ] Available from: https://doi.org/10.1016/j.sse.2023.108729
Artigo de periodico
Experimental study of MISHEMT from 450k down to 200 k for analog applications (2023)
Perina, Welder Fernandes; Martino, João Antonio ; Simoen, Eddy ; Peralagu, Uthayasankaran; Collaert, Nadine ; Agopian, Paula Ghedini Der
Source: Solid State Electronics. Unidade: EP
Subjects: TRANSISTORES, CIRCUITOS ANALÓGICOS, TEMPERATURA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
PERINA, Welder Fernandes et al. Experimental study of MISHEMT from 450k down to 200 k for analog applications. Solid State Electronics, v. 208, p. 1-4, 2023Tradução . . Disponível em: https://doi.org/10.1016/j.sse.2023.108742. Acesso em: 16 out. 2024.
APA
Perina, W. F., Martino, J. A., Simoen, E., Peralagu, U., Collaert, N., & Agopian, P. G. D. (2023). Experimental study of MISHEMT from 450k down to 200 k for analog applications. Solid State Electronics, 208, 1-4. doi:10.1016/j.sse.2023.108742
NLM
Perina WF, Martino JA, Simoen E, Peralagu U, Collaert N, Agopian PGD. Experimental study of MISHEMT from 450k down to 200 k for analog applications [Internet]. Solid State Electronics. 2023 ; 208 1-4.[citado 2024 out. 16 ] Available from: https://doi.org/10.1016/j.sse.2023.108742
Vancouver
Perina WF, Martino JA, Simoen E, Peralagu U, Collaert N, Agopian PGD. Experimental study of MISHEMT from 450k down to 200 k for analog applications [Internet]. Solid State Electronics. 2023 ; 208 1-4.[citado 2024 out. 16 ] Available from: https://doi.org/10.1016/j.sse.2023.108742
Trabalho de evento
Influence of the source/drain doping region on the reconfigurability of BESOI MOSFET (2023)
Ramos, Daniel Augusto; Sasaki, Kátia Regina Akemi ; Rangel, Ricardo Cardoso; Duarte, Pedro Henrique; Martino, João Antonio
Source: SBMicro. Conference titles: Symposium on Microelectronics Technology and Devices. Unidade: EP
Subjects: DISPOSITIVOS ELETRÔNICOS, TRANSISTORES, MICROELETRÔNICA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
RAMOS, Daniel Augusto et al. Influence of the source/drain doping region on the reconfigurability of BESOI MOSFET. 2023, Anais.. [Piscataway, N.J.]: IEEE, 2023. Disponível em: https://doi.org/10.1109/SBMicro60499.2023.10302644. Acesso em: 16 out. 2024.
APA
Ramos, D. A., Sasaki, K. R. A., Rangel, R. C., Duarte, P. H., & Martino, J. A. (2023). Influence of the source/drain doping region on the reconfigurability of BESOI MOSFET. In SBMicro. [Piscataway, N.J.]: IEEE. doi:10.1109/SBMicro60499.2023.10302644
NLM
Ramos DA, Sasaki KRA, Rangel RC, Duarte PH, Martino JA. Influence of the source/drain doping region on the reconfigurability of BESOI MOSFET [Internet]. SBMicro. 2023 ;[citado 2024 out. 16 ] Available from: https://doi.org/10.1109/SBMicro60499.2023.10302644
Vancouver
Ramos DA, Sasaki KRA, Rangel RC, Duarte PH, Martino JA. Influence of the source/drain doping region on the reconfigurability of BESOI MOSFET [Internet]. SBMicro. 2023 ;[citado 2024 out. 16 ] Available from: https://doi.org/10.1109/SBMicro60499.2023.10302644
Trabalho de evento
Study of the effect of multiple conductions on threshold voltage in a MIS-HEMT from 450 K down to 200 K (2023)
Perina, Welder Fernandes; Martino, João Antonio ; Simoen, Eddy ; Peralagu, Uthayasankaran; Collaert, Nadine ; Agopian, Paula Ghedini Der
Source: SBMicro. Conference titles: Symposium on Microelectronics Technology and Devices. Unidade: EP
Subjects: TRANSISTORES, SEMICONDUTORES
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
PERINA, Welder Fernandes et al. Study of the effect of multiple conductions on threshold voltage in a MIS-HEMT from 450 K down to 200 K. 2023, Anais.. [Piscataway, N.J.]: IEEE, 2023. Disponível em: https://doi.org/10.1109/SBMicro60499.2023.10302604. Acesso em: 16 out. 2024.
APA
Perina, W. F., Martino, J. A., Simoen, E., Peralagu, U., Collaert, N., & Agopian, P. G. D. (2023). Study of the effect of multiple conductions on threshold voltage in a MIS-HEMT from 450 K down to 200 K. In SBMicro. [Piscataway, N.J.]: IEEE. doi:10.1109/SBMicro60499.2023.10302604
NLM
Perina WF, Martino JA, Simoen E, Peralagu U, Collaert N, Agopian PGD. Study of the effect of multiple conductions on threshold voltage in a MIS-HEMT from 450 K down to 200 K [Internet]. SBMicro. 2023 ;[citado 2024 out. 16 ] Available from: https://doi.org/10.1109/SBMicro60499.2023.10302604
Vancouver
Perina WF, Martino JA, Simoen E, Peralagu U, Collaert N, Agopian PGD. Study of the effect of multiple conductions on threshold voltage in a MIS-HEMT from 450 K down to 200 K [Internet]. SBMicro. 2023 ;[citado 2024 out. 16 ] Available from: https://doi.org/10.1109/SBMicro60499.2023.10302604
Trabalho de evento
Trade-off between channel length and mechanical stress in the operational transconductance amplifier designed with SOI FinFET (2023)
Ribeiro, Arllen D.R; Araújo, Gustavo Vinicius de; Martino, João Antonio ; Agopian, Paula Ghedini Der
Source: SBMicro. Conference titles: Symposium on Microelectronics Technology and Devices. Unidade: EP
Subjects: DISPOSITIVOS ELETRÔNICOS, TRANSISTORES, MICROELETRÔNICA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
RIBEIRO, Arllen D.R et al. Trade-off between channel length and mechanical stress in the operational transconductance amplifier designed with SOI FinFET. 2023, Anais.. [Piscataway, N.J.]: IEEE, 2023. Disponível em: https://doi.org/10.1109/SBMicro60499.2023.10302575. Acesso em: 16 out. 2024.
APA
Ribeiro, A. D. R., Araújo, G. V. de, Martino, J. A., & Agopian, P. G. D. (2023). Trade-off between channel length and mechanical stress in the operational transconductance amplifier designed with SOI FinFET. In SBMicro. [Piscataway, N.J.]: IEEE. doi:10.1109/SBMicro60499.2023.10302575
NLM
Ribeiro ADR, Araújo GV de, Martino JA, Agopian PGD. Trade-off between channel length and mechanical stress in the operational transconductance amplifier designed with SOI FinFET [Internet]. SBMicro. 2023 ;[citado 2024 out. 16 ] Available from: https://doi.org/10.1109/SBMicro60499.2023.10302575
Vancouver
Ribeiro ADR, Araújo GV de, Martino JA, Agopian PGD. Trade-off between channel length and mechanical stress in the operational transconductance amplifier designed with SOI FinFET [Internet]. SBMicro. 2023 ;[citado 2024 out. 16 ] Available from: https://doi.org/10.1109/SBMicro60499.2023.10302575
Trabalho de evento
Influence of gate insulator and AlGaN barrier layer on MISHEMT conduction mechanisms (2023)
Canales, Bruno Godoy; Martino, João Antonio ; Agopian, Paula Ghedini Der
Source: SBMicro. Conference titles: Symposium on Microelectronics Technology and Devices (SBMicro). Unidade: EP
Subjects: TRANSISTORES, SEMICONDUTORES
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
CANALES, Bruno Godoy e MARTINO, João Antonio e AGOPIAN, Paula Ghedini Der. Influence of gate insulator and AlGaN barrier layer on MISHEMT conduction mechanisms. 2023, Anais.. [Piscataway]: IEEE, 2023. Disponível em: https://doi.org/10.1109/SBMicro60499.2023.10302593. Acesso em: 16 out. 2024.
APA
Canales, B. G., Martino, J. A., & Agopian, P. G. D. (2023). Influence of gate insulator and AlGaN barrier layer on MISHEMT conduction mechanisms. In SBMicro. [Piscataway]: IEEE. doi:10.1109/SBMicro60499.2023.10302593
NLM
Canales BG, Martino JA, Agopian PGD. Influence of gate insulator and AlGaN barrier layer on MISHEMT conduction mechanisms [Internet]. SBMicro. 2023 ;[citado 2024 out. 16 ] Available from: https://doi.org/10.1109/SBMicro60499.2023.10302593
Vancouver
Canales BG, Martino JA, Agopian PGD. Influence of gate insulator and AlGaN barrier layer on MISHEMT conduction mechanisms [Internet]. SBMicro. 2023 ;[citado 2024 out. 16 ] Available from: https://doi.org/10.1109/SBMicro60499.2023.10302593
Artigo de periodico
MISHEMT intrinsic voltage gain under multiple channel output characteristics (2023)
Canales, Bruno Godoy; Perina, Welder Fernandes; Martino, João Antonio ; Simoen, Eddy ; Peralagu, Uthayasankaran; Collaert, Nadine ; Agopian, Paula Ghedini Der
Source: Semiconductor Science and Technology. Unidade: EP
Subjects: TRANSISTORES, SEMICONDUTORES
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
CANALES, Bruno Godoy et al. MISHEMT intrinsic voltage gain under multiple channel output characteristics. Semiconductor Science and Technology, v. 38, n. 11, p. 1-6, 2023Tradução . . Disponível em: https://doi.org/10.1088/1361-6641/acfa1f. Acesso em: 16 out. 2024.
APA
Canales, B. G., Perina, W. F., Martino, J. A., Simoen, E., Peralagu, U., Collaert, N., & Agopian, P. G. D. (2023). MISHEMT intrinsic voltage gain under multiple channel output characteristics. Semiconductor Science and Technology, 38( 11), 1-6. doi:10.1088/1361-6641/acfa1f
NLM
Canales BG, Perina WF, Martino JA, Simoen E, Peralagu U, Collaert N, Agopian PGD. MISHEMT intrinsic voltage gain under multiple channel output characteristics [Internet]. Semiconductor Science and Technology. 2023 ; 38( 11): 1-6.[citado 2024 out. 16 ] Available from: https://doi.org/10.1088/1361-6641/acfa1f
Vancouver
Canales BG, Perina WF, Martino JA, Simoen E, Peralagu U, Collaert N, Agopian PGD. MISHEMT intrinsic voltage gain under multiple channel output characteristics [Internet]. Semiconductor Science and Technology. 2023 ; 38( 11): 1-6.[citado 2024 out. 16 ] Available from: https://doi.org/10.1088/1361-6641/acfa1f
Artigo de periodico
Distinctive behavior of field-effect and redox electrolyte-gated organic transistors (2023)
Coutinho, Douglas José ; Feitosa, Bianca de Andrade ; Barbosa, Henrique Frulani de Paula ; Colucci, Renan ; Torres, Bruno Bassi Millan ; Faria, Gregório Couto
Source: Journal of Physical Chemistry C. Unidades: IFSC, EESC
Subjects: ELETROQUÍMICA ORGÂNICA, POLÍMEROS (QUÍMICA ORGÂNICA), TRANSISTORES
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
COUTINHO, Douglas José et al. Distinctive behavior of field-effect and redox electrolyte-gated organic transistors. Journal of Physical Chemistry C, v. 127, n. 50, p. 24443-24451 + supporting information: S1-S3, 2023Tradução . . Disponível em: https://doi.org/10.1021/acs.jpcc.3c06261. Acesso em: 16 out. 2024.
APA
Coutinho, D. J., Feitosa, B. de A., Barbosa, H. F. de P., Colucci, R., Torres, B. B. M., & Faria, G. C. (2023). Distinctive behavior of field-effect and redox electrolyte-gated organic transistors. Journal of Physical Chemistry C, 127( 50), 24443-24451 + supporting information: S1-S3. doi:10.1021/acs.jpcc.3c06261
NLM
Coutinho DJ, Feitosa B de A, Barbosa HF de P, Colucci R, Torres BBM, Faria GC. Distinctive behavior of field-effect and redox electrolyte-gated organic transistors [Internet]. Journal of Physical Chemistry C. 2023 ; 127( 50): 24443-24451 + supporting information: S1-S3.[citado 2024 out. 16 ] Available from: https://doi.org/10.1021/acs.jpcc.3c06261
Vancouver
Coutinho DJ, Feitosa B de A, Barbosa HF de P, Colucci R, Torres BBM, Faria GC. Distinctive behavior of field-effect and redox electrolyte-gated organic transistors [Internet]. Journal of Physical Chemistry C. 2023 ; 127( 50): 24443-24451 + supporting information: S1-S3.[citado 2024 out. 16 ] Available from: https://doi.org/10.1021/acs.jpcc.3c06261
Trabalho de evento
Analysis of low-dropout voltage regulator designed with gate-all-around nanosheet transistors (2023)
Souto, Rayana Carvalho de Barros; Martino, João Antonio ; Agopian, Paula Ghedini Der
Source: SBMicro. Conference titles: Symposium on Microelectronics Technology and Devices. Unidade: EP
Subjects: TRANSISTORES, MICROELETRÔNICA, MATERIAIS NANOESTRUTURADOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
SOUTO, Rayana Carvalho de Barros e MARTINO, João Antonio e AGOPIAN, Paula Ghedini Der. Analysis of low-dropout voltage regulator designed with gate-all-around nanosheet transistors. 2023, Anais.. [Piscataway]: IEEE, 2023. Disponível em: https://doi.org/10.1109/SBMicro60499.2023.10302596. Acesso em: 16 out. 2024.
APA
Souto, R. C. de B., Martino, J. A., & Agopian, P. G. D. (2023). Analysis of low-dropout voltage regulator designed with gate-all-around nanosheet transistors. In SBMicro. [Piscataway]: IEEE. doi:10.1109/SBMicro60499.2023.10302596
NLM
Souto RC de B, Martino JA, Agopian PGD. Analysis of low-dropout voltage regulator designed with gate-all-around nanosheet transistors [Internet]. SBMicro. 2023 ;[citado 2024 out. 16 ] Available from: https://doi.org/10.1109/SBMicro60499.2023.10302596
Vancouver
Souto RC de B, Martino JA, Agopian PGD. Analysis of low-dropout voltage regulator designed with gate-all-around nanosheet transistors [Internet]. SBMicro. 2023 ;[citado 2024 out. 16 ] Available from: https://doi.org/10.1109/SBMicro60499.2023.10302596
Artigo de periodico
Comparison between low-dropout voltage regulators designed with line and nanowire tunnel field effect transistors using experimental data (2022)
Toledo, Rodrigo do Nascimento; Silva, Wenita de Lima; Gonçalez Filho, Walter; Nogueira, Alexandro de Moraes; Martino, João Antonio ; Agopian, Paula Ghedini Der
Source: Solid State Electronics. Unidade: EP
Subjects: TRANSISTORES, CONDUTIVIDADE ELÉTRICA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
TOLEDO, Rodrigo do Nascimento et al. Comparison between low-dropout voltage regulators designed with line and nanowire tunnel field effect transistors using experimental data. Solid State Electronics, v. 194, p. 1-4, 2022Tradução . . Disponível em: https://doi.org/10.1016/j.sse.2022.108328. Acesso em: 16 out. 2024.
APA
Toledo, R. do N., Silva, W. de L., Gonçalez Filho, W., Nogueira, A. de M., Martino, J. A., & Agopian, P. G. D. (2022). Comparison between low-dropout voltage regulators designed with line and nanowire tunnel field effect transistors using experimental data. Solid State Electronics, 194, 1-4. doi:10.1016/j.sse.2022.108328
NLM
Toledo R do N, Silva W de L, Gonçalez Filho W, Nogueira A de M, Martino JA, Agopian PGD. Comparison between low-dropout voltage regulators designed with line and nanowire tunnel field effect transistors using experimental data [Internet]. Solid State Electronics. 2022 ; 194 1-4.[citado 2024 out. 16 ] Available from: https://doi.org/10.1016/j.sse.2022.108328
Vancouver
Toledo R do N, Silva W de L, Gonçalez Filho W, Nogueira A de M, Martino JA, Agopian PGD. Comparison between low-dropout voltage regulators designed with line and nanowire tunnel field effect transistors using experimental data [Internet]. Solid State Electronics. 2022 ; 194 1-4.[citado 2024 out. 16 ] Available from: https://doi.org/10.1016/j.sse.2022.108328

USP Schools

ReP

Filtros

USP Schools

Departament

Authors

USP affiliated authors

Date published

Subjects

Source title

Publisher

Conference titles

Countries/Territories

Grupo de pesquisa

Funding Agencies

Indexado em

Non normalized affiliation

Countries of institutions of collaboration