Simulation of PECVD SiO2 deposition using a cellular automata approach (2012)
Source: Microelectronics technology and devices, SBMicro. Conference titles: International Symposium on Microelectronics Technology and Devices. Unidade: EP
Assunto: MICROELETRÔNICA
ABNT
COLOMBO, Fábio Belotti e PÁEZ CARREÑO, Marcelo Nelson. Simulation of PECVD SiO2 deposition using a cellular automata approach. 2012, Anais.. Pennington: Escola Politécnica, Universidade de São Paulo, 2012. Disponível em: https://doi.org/10.1149/04901.0297ecst. Acesso em: 05 set. 2024.APA
Colombo, F. B., & Páez Carreño, M. N. (2012). Simulation of PECVD SiO2 deposition using a cellular automata approach. In Microelectronics technology and devices, SBMicro. Pennington: Escola Politécnica, Universidade de São Paulo. doi:10.1149/04901.0297ecstNLM
Colombo FB, Páez Carreño MN. Simulation of PECVD SiO2 deposition using a cellular automata approach [Internet]. Microelectronics technology and devices, SBMicro. 2012 ;[citado 2024 set. 05 ] Available from: https://doi.org/10.1149/04901.0297ecstVancouver
Colombo FB, Páez Carreño MN. Simulation of PECVD SiO2 deposition using a cellular automata approach [Internet]. Microelectronics technology and devices, SBMicro. 2012 ;[citado 2024 set. 05 ] Available from: https://doi.org/10.1149/04901.0297ecst