Advantages of different source/drain engineering on scaled UTBOX FDSOI nMOSFETs at high temperature operation (2014)
- Authors:
- Autor USP: MARTINO, JOÃO ANTONIO - EP
- Unidade: EP
- DOI: 10.1016/j.sse.2013.09.012
- Subjects: TEMPERATURA; MICROELETRÔNICA
- Language: Inglês
- Source:
- Título: Solid-State Electronics
- Volume/Número/Paginação/Ano: v. 91, p. 53-58, Jan 2014
- Este periódico é de acesso aberto
- Este artigo NÃO é de acesso aberto
-
ABNT
NICOLETTI, Talitha et al. Advantages of different source/drain engineering on scaled UTBOX FDSOI nMOSFETs at high temperature operation. Solid-State Electronics, v. 91, p. 53-58, 2014Tradução . . Disponível em: https://doi.org/10.1016/j.sse.2013.09.012. Acesso em: 20 jan. 2026. -
APA
Nicoletti, T., Santos, S. D. dos, Martino, J. A., Aoulaiche, M., Veloso, A., Claeys, C., et al. (2014). Advantages of different source/drain engineering on scaled UTBOX FDSOI nMOSFETs at high temperature operation. Solid-State Electronics, 91, 53-58. doi:10.1016/j.sse.2013.09.012 -
NLM
Nicoletti T, Santos SD dos, Martino JA, Aoulaiche M, Veloso A, Claeys C, Simoen E, Jurczak M. Advantages of different source/drain engineering on scaled UTBOX FDSOI nMOSFETs at high temperature operation [Internet]. Solid-State Electronics. 2014 ; 91 53-58.[citado 2026 jan. 20 ] Available from: https://doi.org/10.1016/j.sse.2013.09.012 -
Vancouver
Nicoletti T, Santos SD dos, Martino JA, Aoulaiche M, Veloso A, Claeys C, Simoen E, Jurczak M. Advantages of different source/drain engineering on scaled UTBOX FDSOI nMOSFETs at high temperature operation [Internet]. Solid-State Electronics. 2014 ; 91 53-58.[citado 2026 jan. 20 ] Available from: https://doi.org/10.1016/j.sse.2013.09.012 - Analog performance and application of graded-channel fully depleted SOI MOSFETs
- Graded-channel fully depleted silicon-on-insulator nMOSFET for reducing the parasitic bipolar effects
- Projeto de processos de fabricação avançados aplicáveis nas tecnologias CMOS micrométricas
- Simple method to determine the poly gate doping concentration based on poly depletion effect
- A new technique to extract the oxide charge density at front and back interfaces of SOI nMOSFETs devices
- Influence of the gate oxide tunneling effect on the extraction of the silicon film and front oxide thickness in SOI nMOSFET
- A study of total series resistance and effective channel length comparing SOI nMOSFET and GC SOI nMOSFET in saturation region
- A simple method to model nonrectangular-gate layout in SOI MOSFETs
- New leakage drain current model for high temperature soi mesfet
- Influence of the substrate potential drop on fully depleted soi mesfet threshold voltage at 77k
Informações sobre o DOI: 10.1016/j.sse.2013.09.012 (Fonte: oaDOI API)
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