Study of of the influence of the secondary electron emission coefficient in radio-frequency argonplasmas using particle in cell simulation (2003)
- Authors:
- USP affiliated authors: VERDONCK, PATRICK BERNARD - EP ; MACIEL, HOMERO SANTIAGO - EP
- Unidade: EP
- Assunto: PLASMA (MICROELETRÔNICA)
- Language: Inglês
- Imprenta:
- Publisher: The Electrochemical Society
- Publisher place: Pennington
- Date published: 2003
- Source:
- Título: Proceedings.
- Conference titles: International Symposium on Microelectronics Technology and Devices - SBMICRO
-
ABNT
CIZZOTO, Elias Rodrigues et al. Study of of the influence of the secondary electron emission coefficient in radio-frequency argonplasmas using particle in cell simulation. 2003, Anais.. Pennington: The Electrochemical Society, 2003. . Acesso em: 15 mar. 2026. -
APA
Cizzoto, E. R., Roberto, M., Verdonck, P. B., & Maciel, H. S. (2003). Study of of the influence of the secondary electron emission coefficient in radio-frequency argonplasmas using particle in cell simulation. In Proceedings.. Pennington: The Electrochemical Society. -
NLM
Cizzoto ER, Roberto M, Verdonck PB, Maciel HS. Study of of the influence of the secondary electron emission coefficient in radio-frequency argonplasmas using particle in cell simulation. Proceedings. 2003 ;[citado 2026 mar. 15 ] -
Vancouver
Cizzoto ER, Roberto M, Verdonck PB, Maciel HS. Study of of the influence of the secondary electron emission coefficient in radio-frequency argonplasmas using particle in cell simulation. Proceedings. 2003 ;[citado 2026 mar. 15 ] - Silicon surface roughness induced by SF6-based reactive ion etching processes for micromachining applications
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