ReP USP - Resultado da busca

Artigo de periodico
Reconfigurable SOI-MOSFET: past, present and future applications (2022)
Rangel, Ricardo Cardoso; Sasaki, Kátia Regina Akemi ; Martino, João Antonio
Source: Journal of Integrated Circuits and Systems. Unidade: EP
Subjects: TRANSISTORES, SENSOR, CIRCUITOS INTEGRADOS MOS
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ABNT
RANGEL, Ricardo Cardoso e SASAKI, Kátia Regina Akemi e MARTINO, João Antonio. Reconfigurable SOI-MOSFET: past, present and future applications. Journal of Integrated Circuits and Systems, v. 17, n. 2, p. 1-9, 2022Tradução . . Disponível em: https://doi.org/10.29292/jics.v17i2.626. Acesso em: 16 nov. 2025.
APA
Rangel, R. C., Sasaki, K. R. A., & Martino, J. A. (2022). Reconfigurable SOI-MOSFET: past, present and future applications. Journal of Integrated Circuits and Systems, 17( 2), 1-9. doi:10.29292/jics.v17i2.626
NLM
Rangel RC, Sasaki KRA, Martino JA. Reconfigurable SOI-MOSFET: past, present and future applications [Internet]. Journal of Integrated Circuits and Systems. 2022 ; 17( 2): 1-9.[citado 2025 nov. 16 ] Available from: https://doi.org/10.29292/jics.v17i2.626
Vancouver
Rangel RC, Sasaki KRA, Martino JA. Reconfigurable SOI-MOSFET: past, present and future applications [Internet]. Journal of Integrated Circuits and Systems. 2022 ; 17( 2): 1-9.[citado 2025 nov. 16 ] Available from: https://doi.org/10.29292/jics.v17i2.626
Trabalho de evento
The impact of the gate oxide thickness reduction on the gate induced floating body effect in SOI nMOSFETs (2007)
Agopian, Paula Ghedini Der ; Martino, João Antonio ; Simoen, Eddy ; Claeys, Cor
Source: SBMicro 2007. Conference titles: International Symposium on Microelectronics Technology and Devices SBMICRO. Unidade: EP
Subjects: MICROELETRÔNICA, CIRCUITOS INTEGRADOS MOS
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ABNT
AGOPIAN, Paula Ghedini Der et al. The impact of the gate oxide thickness reduction on the gate induced floating body effect in SOI nMOSFETs. 2007, Anais.. Pennington: The Electrochemical Society, 2007. . Acesso em: 16 nov. 2025.
APA
Agopian, P. G. D., Martino, J. A., Simoen, E., & Claeys, C. (2007). The impact of the gate oxide thickness reduction on the gate induced floating body effect in SOI nMOSFETs. In SBMicro 2007. Pennington: The Electrochemical Society.
NLM
Agopian PGD, Martino JA, Simoen E, Claeys C. The impact of the gate oxide thickness reduction on the gate induced floating body effect in SOI nMOSFETs. SBMicro 2007. 2007 ;[citado 2025 nov. 16 ]
Vancouver
Agopian PGD, Martino JA, Simoen E, Claeys C. The impact of the gate oxide thickness reduction on the gate induced floating body effect in SOI nMOSFETs. SBMicro 2007. 2007 ;[citado 2025 nov. 16 ]
Artigo de periodico
Advantages of the graded-channel SOI FD MOSFET for application as a quasi-linear resistor (2005)
Cerdeira, Antonio ; Alemán, Miguel A.; Pavanello, Marcelo Antonio ; Martino, João Antonio ; Flandre, Denis ; Vancaillie, Laurent
Source: IEEE Transactions on Electron Devices. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS MOS
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ABNT
CERDEIRA, Antonio et al. Advantages of the graded-channel SOI FD MOSFET for application as a quasi-linear resistor. IEEE Transactions on Electron Devices, v. 52, n. 5, p. 967-972, 2005Tradução . . Disponível em: https://doi.org/10.1109/ted.2005.846327. Acesso em: 16 nov. 2025.
APA
Cerdeira, A., Alemán, M. A., Pavanello, M. A., Martino, J. A., Flandre, D., & Vancaillie, L. (2005). Advantages of the graded-channel SOI FD MOSFET for application as a quasi-linear resistor. IEEE Transactions on Electron Devices, 52( 5), 967-972. doi:10.1109/ted.2005.846327
NLM
Cerdeira A, Alemán MA, Pavanello MA, Martino JA, Flandre D, Vancaillie L. Advantages of the graded-channel SOI FD MOSFET for application as a quasi-linear resistor [Internet]. IEEE Transactions on Electron Devices. 2005 ;52( 5): 967-972.[citado 2025 nov. 16 ] Available from: https://doi.org/10.1109/ted.2005.846327
Vancouver
Cerdeira A, Alemán MA, Pavanello MA, Martino JA, Flandre D, Vancaillie L. Advantages of the graded-channel SOI FD MOSFET for application as a quasi-linear resistor [Internet]. IEEE Transactions on Electron Devices. 2005 ;52( 5): 967-972.[citado 2025 nov. 16 ] Available from: https://doi.org/10.1109/ted.2005.846327
Artigo de periodico
SOI technology characterization using SOI-MOS capacitor (2005)
Sonnenberg, Victor ; Martino, João Antonio
Source: Solid-State Electronics. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS MOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
SONNENBERG, Victor e MARTINO, João Antonio. SOI technology characterization using SOI-MOS capacitor. Solid-State Electronics, 2005Tradução . . Disponível em: https://doi.org/10.1016/j.sse.2004.06.010. Acesso em: 16 nov. 2025.
APA
Sonnenberg, V., & Martino, J. A. (2005). SOI technology characterization using SOI-MOS capacitor. Solid-State Electronics. doi:10.1016/j.sse.2004.06.010
NLM
Sonnenberg V, Martino JA. SOI technology characterization using SOI-MOS capacitor [Internet]. Solid-State Electronics. 2005 ;[citado 2025 nov. 16 ] Available from: https://doi.org/10.1016/j.sse.2004.06.010
Vancouver
Sonnenberg V, Martino JA. SOI technology characterization using SOI-MOS capacitor [Internet]. Solid-State Electronics. 2005 ;[citado 2025 nov. 16 ] Available from: https://doi.org/10.1016/j.sse.2004.06.010
Trabalho de evento
On-Resistance and harmonic distortion in graded-channel SOI FD MOSFET (2004)
Cerdeira, Antonio ; Alemán, Miguel A; Pavanello, Marcelo Antonio ; Martino, João Antonio ; Vancaillie, Laurent; Flandre, Denis
Source: ICCDCS 2004. Conference titles: IEEE International Caracas Conference on Devices, Circuits and Systems. Unidade: EP
Subjects: TRANSISTORES, CIRCUITOS INTEGRADOS MOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
CERDEIRA, Antonio et al. On-Resistance and harmonic distortion in graded-channel SOI FD MOSFET. 2004, Anais.. New York: IEEE, 2004. . Acesso em: 16 nov. 2025.
APA
Cerdeira, A., Alemán, M. A., Pavanello, M. A., Martino, J. A., Vancaillie, L., & Flandre, D. (2004). On-Resistance and harmonic distortion in graded-channel SOI FD MOSFET. In ICCDCS 2004. New York: IEEE.
NLM
Cerdeira A, Alemán MA, Pavanello MA, Martino JA, Vancaillie L, Flandre D. On-Resistance and harmonic distortion in graded-channel SOI FD MOSFET. ICCDCS 2004. 2004 ;[citado 2025 nov. 16 ]
Vancouver
Cerdeira A, Alemán MA, Pavanello MA, Martino JA, Vancaillie L, Flandre D. On-Resistance and harmonic distortion in graded-channel SOI FD MOSFET. ICCDCS 2004. 2004 ;[citado 2025 nov. 16 ]
Artigo de periodico
Low temperature operation of graded-channel SOI nMOSFETs for analog applications (2002)
Pavanello, Marcelo Antonio ; Agopian, Paula Ghedini Der ; Martino, João Antonio ; Flandre, Denis
Source: Journal de Physique IV. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS MOS
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ABNT
PAVANELLO, Marcelo Antonio et al. Low temperature operation of graded-channel SOI nMOSFETs for analog applications. Journal de Physique IV, v. 12, n. 3, 2002Tradução . . Disponível em: https://doi.org/10.1051/jp420020030. Acesso em: 16 nov. 2025.
APA
Pavanello, M. A., Agopian, P. G. D., Martino, J. A., & Flandre, D. (2002). Low temperature operation of graded-channel SOI nMOSFETs for analog applications. Journal de Physique IV, 12( 3). doi:10.1051/jp420020030
NLM
Pavanello MA, Agopian PGD, Martino JA, Flandre D. Low temperature operation of graded-channel SOI nMOSFETs for analog applications [Internet]. Journal de Physique IV. 2002 ;12( 3):[citado 2025 nov. 16 ] Available from: https://doi.org/10.1051/jp420020030
Vancouver
Pavanello MA, Agopian PGD, Martino JA, Flandre D. Low temperature operation of graded-channel SOI nMOSFETs for analog applications [Internet]. Journal de Physique IV. 2002 ;12( 3):[citado 2025 nov. 16 ] Available from: https://doi.org/10.1051/jp420020030
Artigo de periodico
Low temperature operation of 0.13 µm partially-depleted SOI nMOSFETs with floating body (2002)
Pavanello, Marcelo Antonio ; Martino, João Antonio ; Mercha, A.; Rafi, J.M.; Simoen, Eddy ; Claeys, Cor ; Van Meer, H.; De Meyer, K.
Source: Journal de Physique IV. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS MOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
PAVANELLO, Marcelo Antonio et al. Low temperature operation of 0.13 µm partially-depleted SOI nMOSFETs with floating body. Journal de Physique IV, v. 12, n. 3, 2002Tradução . . Acesso em: 16 nov. 2025.
APA
Pavanello, M. A., Martino, J. A., Mercha, A., Rafi, J. M., Simoen, E., Claeys, C., et al. (2002). Low temperature operation of 0.13 µm partially-depleted SOI nMOSFETs with floating body. Journal de Physique IV, 12( 3).
NLM
Pavanello MA, Martino JA, Mercha A, Rafi JM, Simoen E, Claeys C, Van Meer H, De Meyer K. Low temperature operation of 0.13 µm partially-depleted SOI nMOSFETs with floating body. Journal de Physique IV. 2002 ;12( 3):[citado 2025 nov. 16 ]
Vancouver
Pavanello MA, Martino JA, Mercha A, Rafi JM, Simoen E, Claeys C, Van Meer H, De Meyer K. Low temperature operation of 0.13 µm partially-depleted SOI nMOSFETs with floating body. Journal de Physique IV. 2002 ;12( 3):[citado 2025 nov. 16 ]
Artigo de periodico
An asymmetric channel SOI nMOSFET for reducing parasitic effects and improving output characteristics (2000)
Pavanello, Marcelo Antonio ; Martino, João Antonio ; Dessard, Vincent; Flandre, Denis
Source: Electrochemical and Solid-State Letters. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS MOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
PAVANELLO, Marcelo Antonio et al. An asymmetric channel SOI nMOSFET for reducing parasitic effects and improving output characteristics. Electrochemical and Solid-State Letters, v. 3, n. Ja 2000, p. 50-52, 2000Tradução . . Disponível em: https://doi.org/10.1149/1.1390955. Acesso em: 16 nov. 2025.
APA
Pavanello, M. A., Martino, J. A., Dessard, V., & Flandre, D. (2000). An asymmetric channel SOI nMOSFET for reducing parasitic effects and improving output characteristics. Electrochemical and Solid-State Letters, 3( Ja 2000), 50-52. doi:10.1149/1.1390955
NLM
Pavanello MA, Martino JA, Dessard V, Flandre D. An asymmetric channel SOI nMOSFET for reducing parasitic effects and improving output characteristics [Internet]. Electrochemical and Solid-State Letters. 2000 ; 3( Ja 2000): 50-52.[citado 2025 nov. 16 ] Available from: https://doi.org/10.1149/1.1390955
Vancouver
Pavanello MA, Martino JA, Dessard V, Flandre D. An asymmetric channel SOI nMOSFET for reducing parasitic effects and improving output characteristics [Internet]. Electrochemical and Solid-State Letters. 2000 ; 3( Ja 2000): 50-52.[citado 2025 nov. 16 ] Available from: https://doi.org/10.1149/1.1390955
Artigo de periodico
Analysis of transition region and accumulation layer effect in the subthreshold slope in SOI nMOSFETs and their influences on the interface trap density extraction (1999)
Sonnenberg, Victor ; Martino, João Antonio
Source: Solid-State Electronics. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS MOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
SONNENBERG, Victor e MARTINO, João Antonio. Analysis of transition region and accumulation layer effect in the subthreshold slope in SOI nMOSFETs and their influences on the interface trap density extraction. Solid-State Electronics, 1999Tradução . . Disponível em: https://doi.org/10.1016/s0038-1101(99)00191-4. Acesso em: 16 nov. 2025.
APA
Sonnenberg, V., & Martino, J. A. (1999). Analysis of transition region and accumulation layer effect in the subthreshold slope in SOI nMOSFETs and their influences on the interface trap density extraction. Solid-State Electronics. doi:10.1016/s0038-1101(99)00191-4
NLM
Sonnenberg V, Martino JA. Analysis of transition region and accumulation layer effect in the subthreshold slope in SOI nMOSFETs and their influences on the interface trap density extraction [Internet]. Solid-State Electronics. 1999 ;[citado 2025 nov. 16 ] Available from: https://doi.org/10.1016/s0038-1101(99)00191-4
Vancouver
Sonnenberg V, Martino JA. Analysis of transition region and accumulation layer effect in the subthreshold slope in SOI nMOSFETs and their influences on the interface trap density extraction [Internet]. Solid-State Electronics. 1999 ;[citado 2025 nov. 16 ] Available from: https://doi.org/10.1016/s0038-1101(99)00191-4
Artigo de periodico
A simple method for minimizing the transient effect in SOI nMOSFETs at low temperature (1999)
Sonnenberg, Victor ; Martino, João Antonio
Source: Electrochemical and Solid-State Letters. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS MOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
SONNENBERG, Victor e MARTINO, João Antonio. A simple method for minimizing the transient effect in SOI nMOSFETs at low temperature. Electrochemical and Solid-State Letters, v. 2, n. 11, p. 585-586, 1999Tradução . . Acesso em: 16 nov. 2025.
APA
Sonnenberg, V., & Martino, J. A. (1999). A simple method for minimizing the transient effect in SOI nMOSFETs at low temperature. Electrochemical and Solid-State Letters, 2( 11), 585-586.
NLM
Sonnenberg V, Martino JA. A simple method for minimizing the transient effect in SOI nMOSFETs at low temperature. Electrochemical and Solid-State Letters. 1999 ;2( 11): 585-586.[citado 2025 nov. 16 ]
Vancouver
Sonnenberg V, Martino JA. A simple method for minimizing the transient effect in SOI nMOSFETs at low temperature. Electrochemical and Solid-State Letters. 1999 ;2( 11): 585-586.[citado 2025 nov. 16 ]
Artigo de periodico
Extraction of the oxide charges at the silicon substrate interface in silicon-on-insulator MOSFET's (1999)
Pavanello, Marcelo Antonio ; Martino, João Antonio
Source: Solid-State Electronics. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS MOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
PAVANELLO, Marcelo Antonio e MARTINO, João Antonio. Extraction of the oxide charges at the silicon substrate interface in silicon-on-insulator MOSFET's. Solid-State Electronics, 1999Tradução . . Disponível em: https://doi.org/10.1016/s0038-1101(99)00178-1. Acesso em: 16 nov. 2025.
APA
Pavanello, M. A., & Martino, J. A. (1999). Extraction of the oxide charges at the silicon substrate interface in silicon-on-insulator MOSFET's. Solid-State Electronics. doi:10.1016/s0038-1101(99)00178-1
NLM
Pavanello MA, Martino JA. Extraction of the oxide charges at the silicon substrate interface in silicon-on-insulator MOSFET's [Internet]. Solid-State Electronics. 1999 ;[citado 2025 nov. 16 ] Available from: https://doi.org/10.1016/s0038-1101(99)00178-1
Vancouver
Pavanello MA, Martino JA. Extraction of the oxide charges at the silicon substrate interface in silicon-on-insulator MOSFET's [Internet]. Solid-State Electronics. 1999 ;[citado 2025 nov. 16 ] Available from: https://doi.org/10.1016/s0038-1101(99)00178-1

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