Microelectronics Technology and Devices SBMICRO 2005 (2005)
- Authors:
- USP affiliated authors: MORIMOTO, NILTON ITIRO - EP ; VERDONCK, PATRICK BERNARD - EP ; SWART, JACOBUS WILLIBRORDUS - EP
- School: EP
- Subject: MICROELETRÔNICA
- Language: Inglês
- Imprenta:
- Publisher: The Electrochemical Society
- Place of publication: Pennington
- Date published: 2005
- ISBN: 1-56677-426-8
- Conference title: International Symposium on Microelectronics Technology and Devices, SBMICRO
-
ABNT
CLAEYS, Cor; SWART, Jacobus Willibrordus; MORIMOTO, Nilton Itiro; VERDONCK, Patrick Bernard. Microelectronics Technology and Devices SBMICRO 2005. [S.l: s.n.], 2005. -
APA
Claeys, C., Swart, J. W., Morimoto, N. I., & Verdonck, P. B. (2005). Microelectronics Technology and Devices SBMICRO 2005. Pennington: The Electrochemical Society. -
NLM
Claeys C, Swart JW, Morimoto NI, Verdonck PB. Microelectronics Technology and Devices SBMICRO 2005. 2005 ; -
Vancouver
Claeys C, Swart JW, Morimoto NI, Verdonck PB. Microelectronics Technology and Devices SBMICRO 2005. 2005 ; - Caracterização experimental e análise da formação de filme de siliceto de titanio por técnicas de difração de raios-x
- Analysis of the mean crystallite size and microstress in titanium silicide thin films
- Caracterização experimental e análise da formação de filme de siliceto de titânio por técnicas de difração de raios-x
- Chemical etching of tungsten with nf3 - 02 plasmas
- Analysis of the mean crystallite size and microstress in titanium silicide thin films
- Pecvd teos silicon oxide deposited in a home made cluster tool system
- Cluster tool system for silicon oxide deposition
- Actionometry and its applications on polysilicon etching in a magnetically confined reactor
- Microelectronics Technology and Devices SBMICRO 2002
- Development of spacer etching processes for 'GA''AS' ic technologies
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