Microelectronics Technology and Devices SBMICRO 2005 (2005)
- Authors:
- USP affiliated authors: MORIMOTO, NILTON ITIRO - EP ; VERDONCK, PATRICK BERNARD - EP ; SWART, JACOBUS WILLIBRORDUS - EP
- School: EP
- Subject: MICROELETRÔNICA
- Language: Inglês
- Imprenta:
- Publisher: The Electrochemical Society
- Place of publication: Pennington
- Date published: 2005
- ISBN: 1-56677-426-8
- Conference title: International Symposium on Microelectronics Technology and Devices, SBMICRO
-
ABNT
Microelectronics Technology and Devices SBMICRO 2005. . Pennington: The Electrochemical Society. . Acesso em: 28 jun. 2022. , 2005 -
APA
Microelectronics Technology and Devices SBMICRO 2005. (2005). Microelectronics Technology and Devices SBMICRO 2005. Pennington: The Electrochemical Society. -
NLM
Microelectronics Technology and Devices SBMICRO 2005. 2005 ;[citado 2022 jun. 28 ] -
Vancouver
Microelectronics Technology and Devices SBMICRO 2005. 2005 ;[citado 2022 jun. 28 ] - Caracterização experimental e análise da formação de filme de siliceto de titanio por técnicas de difração de raios-x
- Analysis of the mean crystallite size and microstress in titanium silicide thin films
- Analysis of the mean crystallite size and microstress in titanium silicide thin films
- Pecvd teos silicon oxide deposited in a home made cluster tool system
- Cluster tool system for silicon oxide deposition
- Chemical etching of tungsten with nf3 - 02 plasmas
- Caracterização experimental e análise da formação de filme de siliceto de titânio por técnicas de difração de raios-x
- Actionometry and its applications on polysilicon etching in a magnetically confined reactor
- Reactive ion etching of 'GA''AS' in cc14-n2 plasmas
- Analysis of the etching mechanisms of tungsten in fluorine containing plasmas
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