Analysis of the etching mechanisms of tungsten in fluorine containing plasmas

Analysis of the etching mechanisms of tungsten in fluorine containing plasmas (1995)

Authors:
USP affiliated authors: SWART, JACOBUS WILLIBRORDUS - EP ; VERDONCK, PATRICK BERNARD - EP
Unidade: EP
Assunto: CIRCUITOS INTEGRADOS
Language: Inglês
Imprenta:
- Publisher place: Pennington
- Date published: 1995
Source:
- Título do periódico: Journal of the Electrochemical Society
- Volume/Número/Paginação/Ano: v.142, n.6 , p.1971-6, jun. 1995

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ABNT

VERDONCK, Patrick Bernard et al. Analysis of the etching mechanisms of tungsten in fluorine containing plasmas. Journal of the Electrochemical Society, v. 142, n. ju 1995, p. 1971-6, 1995Tradução . . Acesso em: 25 set. 2024.
APA

Verdonck, P. B., Swart, J. W., Brasseur, G., & De Geyter, P. (1995). Analysis of the etching mechanisms of tungsten in fluorine containing plasmas. Journal of the Electrochemical Society, 142( ju 1995), 1971-6.
NLM

Verdonck PB, Swart JW, Brasseur G, De Geyter P. Analysis of the etching mechanisms of tungsten in fluorine containing plasmas. Journal of the Electrochemical Society. 1995 ;142( ju 1995): 1971-6.[citado 2024 set. 25 ]
Vancouver

Verdonck PB, Swart JW, Brasseur G, De Geyter P. Analysis of the etching mechanisms of tungsten in fluorine containing plasmas. Journal of the Electrochemical Society. 1995 ;142( ju 1995): 1971-6.[citado 2024 set. 25 ]