Actionometry and its applications on polysilicon etching in a magnetically confined reactor (1992)
- Authors:
- USP affiliated authors: SWART, JACOBUS WILLIBRORDUS - EP ; VERDONCK, PATRICK BERNARD - EP
- Unidade: EP
- Assunto: SEMICONDUTORES
- Language: Inglês
- Imprenta:
- Publisher: Sbmicro/Epusp
- Publisher place: São Paulo
- Date published: 1992
- Source:
- Título: Anais
- Conference titles: Congresso da Sociedade Brasileira de Microeletronica
-
ABNT
VERDONCK, Patrick Bernard e DEGEYTER, P e SWART, Jacobus Willibrordus. Actionometry and its applications on polysilicon etching in a magnetically confined reactor. 1992, Anais.. São Paulo: Sbmicro/Epusp, 1992. . Acesso em: 13 fev. 2026. -
APA
Verdonck, P. B., Degeyter, P., & Swart, J. W. (1992). Actionometry and its applications on polysilicon etching in a magnetically confined reactor. In Anais. São Paulo: Sbmicro/Epusp. -
NLM
Verdonck PB, Degeyter P, Swart JW. Actionometry and its applications on polysilicon etching in a magnetically confined reactor. Anais. 1992 ;[citado 2026 fev. 13 ] -
Vancouver
Verdonck PB, Degeyter P, Swart JW. Actionometry and its applications on polysilicon etching in a magnetically confined reactor. Anais. 1992 ;[citado 2026 fev. 13 ] - Analysis of the etching mechanisms of tungsten in fluorine containing plasmas
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