Microfluidic amplifiers fabricated in silicon using fluorine based plasma etching processes (1998)
- Authors:
- USP affiliated authors: FURLAN, ROGERIO - EP ; VERDONCK, PATRICK BERNARD - EP ; MANSANO, RONALDO DOMINGUES - EP ; SIMÕES, ELIPHAS WAGNER - EP
- Unidade: EP
- Subjects: CIRCUITOS INTEGRADOS; SEMICONDUTORES
- Language: Inglês
- Imprenta:
- Source:
- Conference titles: International Conference on Microelectronics and Packaging
-
ABNT
SIMÕES, Eliphas Wagner et al. Microfluidic amplifiers fabricated in silicon using fluorine based plasma etching processes. 1998, Anais.. Curitiba: S N, 1998. . Acesso em: 15 fev. 2026. -
APA
Simões, E. W., Mansano, R. D., Furlan, R., & Verdonck, P. B. (1998). Microfluidic amplifiers fabricated in silicon using fluorine based plasma etching processes. In XIII SBMicro-ICMP'98 : proceedings. Curitiba: S N. -
NLM
Simões EW, Mansano RD, Furlan R, Verdonck PB. Microfluidic amplifiers fabricated in silicon using fluorine based plasma etching processes. XIII SBMicro-ICMP'98 : proceedings. 1998 ;[citado 2026 fev. 15 ] -
Vancouver
Simões EW, Mansano RD, Furlan R, Verdonck PB. Microfluidic amplifiers fabricated in silicon using fluorine based plasma etching processes. XIII SBMicro-ICMP'98 : proceedings. 1998 ;[citado 2026 fev. 15 ] - Application of fluorine based plasma etching processes in microfluidic device fabrication
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