Microfluidic amplifiers fabricated in silicon using fluorine based plasma etching processes (1998)
- Authors:
- USP affiliated authors: FURLAN, ROGERIO - EP ; VERDONCK, PATRICK BERNARD - EP ; MANSANO, RONALDO DOMINGUES - EP
- Unidade: EP
- Subjects: CIRCUITOS INTEGRADOS; SEMICONDUTORES
- Language: Inglês
- Imprenta:
- Source:
- Título do periódico: XIII SBMicro-ICMP'98 : proceedings
- Conference titles: International Conference on Microelectronics and Packaging
-
ABNT
SIMÕES, Eliphas Wagner et al. Microfluidic amplifiers fabricated in silicon using fluorine based plasma etching processes. 1998, Anais.. Curitiba: s. ed, 1998. . Acesso em: 23 abr. 2024. -
APA
Simões, E. W., Mansano, R. D., Furlan, R., & Verdonck, P. B. (1998). Microfluidic amplifiers fabricated in silicon using fluorine based plasma etching processes. In XIII SBMicro-ICMP'98 : proceedings. Curitiba: s. ed. -
NLM
Simões EW, Mansano RD, Furlan R, Verdonck PB. Microfluidic amplifiers fabricated in silicon using fluorine based plasma etching processes. XIII SBMicro-ICMP'98 : proceedings. 1998 ;[citado 2024 abr. 23 ] -
Vancouver
Simões EW, Mansano RD, Furlan R, Verdonck PB. Microfluidic amplifiers fabricated in silicon using fluorine based plasma etching processes. XIII SBMicro-ICMP'98 : proceedings. 1998 ;[citado 2024 abr. 23 ] - Application of fluorine based plasma etching processes in microfluidic device fabrication
- LPCVD deposition of silicon nitride assisted by high density plasmas
- Diamond like-carbon microoptics elements
- Deposition of silicon nitride films by LPCVD assisted by high density plasma
- Silicon nitride coupled plasma deposited from mixtures of silane - nitrogen and silane - ammonia
- Obtenção de filmes de nitreto de silício por deposição química assistida por plasma acoplado indutivamente
- Fabrication of silicon probes for biosensors
- Characteristics of silicon nitride films deposited by inductively coulped plasma CVD
- High-density plasma chemical vapor deposition of amorphous carbon films
- Complex-amplitude modulation diffractive optical element performed by aperture variations on a reflective aluminium layer deposited over a variable thickness SiC2 substrate
How to cite
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas