Deposition of silicon nitride films by LPCVD assisted by high density plasma

Deposition of silicon nitride films by LPCVD assisted by high density plasma (1998)

Authors:
USP affiliated authors: FURLAN, ROGERIO - EP ; MANSANO, RONALDO DOMINGUES - EP
School: EP
Subject: SEMICONDUTORES
Language: Inglês
Imprenta:
- Publisher: Institute of Physics
- Place of publication: Birmingham
- Date published: 1998
Source:
- Título do periódico: IVC-14, ICSS-10, NANO-5, QSA-10: abstract book
Conference title: International Vacuum Congress

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ABNT

ZAMBOM, Luís da Silva; MANSANO, Ronaldo Domingues; FURLAN, Rogério. Deposition of silicon nitride films by LPCVD assisted by high density plasma. Anais.. Birmingham: Institute of Physics, 1998.
APA

Zambom, L. da S., Mansano, R. D., & Furlan, R. (1998). Deposition of silicon nitride films by LPCVD assisted by high density plasma. In IVC-14, ICSS-10, NANO-5, QSA-10: abstract book. Birmingham: Institute of Physics.
NLM

Zambom L da S, Mansano RD, Furlan R. Deposition of silicon nitride films by LPCVD assisted by high density plasma. IVC-14, ICSS-10, NANO-5, QSA-10: abstract book. 1998 ;
Vancouver

Zambom L da S, Mansano RD, Furlan R. Deposition of silicon nitride films by LPCVD assisted by high density plasma. IVC-14, ICSS-10, NANO-5, QSA-10: abstract book. 1998 ;