Deposition of silicon nitride films by LPCVD assisted by high density plasma (1998)
- Authors:
- USP affiliated authors: FURLAN, ROGERIO - EP ; MANSANO, RONALDO DOMINGUES - EP
- Unidade: EP
- Assunto: SEMICONDUTORES
- Language: Inglês
- Imprenta:
- Publisher: Institute of Physics
- Publisher place: Birmingham
- Date published: 1998
- Source:
- Título do periódico: IVC-14, ICSS-10, NANO-5, QSA-10: abstract book
- Conference titles: International Vacuum Congress
-
ABNT
ZAMBOM, Luís da Silva e MANSANO, Ronaldo Domingues e FURLAN, Rogério. Deposition of silicon nitride films by LPCVD assisted by high density plasma. 1998, Anais.. Birmingham: Institute of Physics, 1998. . Acesso em: 23 jul. 2024. -
APA
Zambom, L. da S., Mansano, R. D., & Furlan, R. (1998). Deposition of silicon nitride films by LPCVD assisted by high density plasma. In IVC-14, ICSS-10, NANO-5, QSA-10: abstract book. Birmingham: Institute of Physics. -
NLM
Zambom L da S, Mansano RD, Furlan R. Deposition of silicon nitride films by LPCVD assisted by high density plasma. IVC-14, ICSS-10, NANO-5, QSA-10: abstract book. 1998 ;[citado 2024 jul. 23 ] -
Vancouver
Zambom L da S, Mansano RD, Furlan R. Deposition of silicon nitride films by LPCVD assisted by high density plasma. IVC-14, ICSS-10, NANO-5, QSA-10: abstract book. 1998 ;[citado 2024 jul. 23 ] - Obtenção de filmes de nitreto de silício por deposição química assistida por plasma acoplado indutivamente
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