Influence of deposition parameters at the structural characteristics of silicon dioxide deposited by pecvd at low temperatures

Influence of deposition parameters at the structural characteristics of silicon dioxide deposited by pecvd at low temperatures (1996)

Authors:
- Alayo Chávez, Marco Isaías
- Pereyra, Inés
Autor USP: ALVAREZ, INES PEREYRA DE - EP
Unidade: EP
Assunto: SEMICONDUTORES
Language: Inglês
Imprenta:
- Publisher: Sbmicro
- Publisher place: São Paulo
- Date published: 1996
Source:
- Título do periódico: Proceedings
Conference titles: Conference of the Brazilian Microeletronics Society

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ABNT

ALAYO CHÁVEZ, Marco Isaías; PEREYRA, Inés. Influence of deposition parameters at the structural characteristics of silicon dioxide deposited by pecvd at low temperatures. Anais.. São Paulo: Sbmicro, 1996.
APA

Alayo Chávez, M. I., & Pereyra, I. (1996). Influence of deposition parameters at the structural characteristics of silicon dioxide deposited by pecvd at low temperatures. In Proceedings. São Paulo: Sbmicro.
NLM

Alayo Chávez MI, Pereyra I. Influence of deposition parameters at the structural characteristics of silicon dioxide deposited by pecvd at low temperatures. Proceedings. 1996 ;
Vancouver

Alayo Chávez MI, Pereyra I. Influence of deposition parameters at the structural characteristics of silicon dioxide deposited by pecvd at low temperatures. Proceedings. 1996 ;