Influence of deposition parameters at the structural characteristics of silicon dioxide deposited by pecvd at low temperatures (1996)
- Authors:
- Autor USP: ALVAREZ, INES PEREYRA DE - EP
- Unidade: EP
- Assunto: SEMICONDUTORES
- Language: Inglês
- Imprenta:
- Source:
- Título do periódico: Proceedings
- Conference titles: Conference of the Brazilian Microeletronics Society
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ABNT
ALAYO CHÁVEZ, Marco Isaías; PEREYRA, Inés. Influence of deposition parameters at the structural characteristics of silicon dioxide deposited by pecvd at low temperatures. Anais.. São Paulo: Sbmicro, 1996. -
APA
Alayo Chávez, M. I., & Pereyra, I. (1996). Influence of deposition parameters at the structural characteristics of silicon dioxide deposited by pecvd at low temperatures. In Proceedings. São Paulo: Sbmicro. -
NLM
Alayo Chávez MI, Pereyra I. Influence of deposition parameters at the structural characteristics of silicon dioxide deposited by pecvd at low temperatures. Proceedings. 1996 ; -
Vancouver
Alayo Chávez MI, Pereyra I. Influence of deposition parameters at the structural characteristics of silicon dioxide deposited by pecvd at low temperatures. Proceedings. 1996 ; - Silicon carbide clusters in silicon formed by carbon ions implantation
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- Study of metal-oxide-semiconductor capacitors with r.f. magnetron sputtering TiOxNy films dielectric layer
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