High-density plasma chemical vapor deposition of amorphous carbon films (2004)
Source: Diamond and Related Materials,. Unidade: EP
Assunto: FILMES FINOS
ABNT
MOUSINHO, Ana Paula e MANSANO, Ronaldo Domingues e VERDONCK, Patrick Bernard. High-density plasma chemical vapor deposition of amorphous carbon films. Diamond and Related Materials, v. 13, n. 2, p. 311-315, 2004Tradução . . Disponível em: https://doi.org/10.1016/j.diamond.2003.10.024. Acesso em: 18 ago. 2024.APA
Mousinho, A. P., Mansano, R. D., & Verdonck, P. B. (2004). High-density plasma chemical vapor deposition of amorphous carbon films. Diamond and Related Materials,, 13( 2), 311-315. doi:10.1016/j.diamond.2003.10.024NLM
Mousinho AP, Mansano RD, Verdonck PB. High-density plasma chemical vapor deposition of amorphous carbon films [Internet]. Diamond and Related Materials,. 2004 ; 13( 2): 311-315.[citado 2024 ago. 18 ] Available from: https://doi.org/10.1016/j.diamond.2003.10.024Vancouver
Mousinho AP, Mansano RD, Verdonck PB. High-density plasma chemical vapor deposition of amorphous carbon films [Internet]. Diamond and Related Materials,. 2004 ; 13( 2): 311-315.[citado 2024 ago. 18 ] Available from: https://doi.org/10.1016/j.diamond.2003.10.024