Menu

Filtros : "Indexado no Engineering Index" "MANSANO, RONALDO DOMINGUES" Removidos: "FCF-FBF" "2024" Limpar

Filtros

Refine with date range

  • 1

1 - 10 (10 records)

  • Artigo de periodico

    High-density plasma chemical vapor deposition of amorphous carbon films (2004)

    Mousinho, Ana Paula; Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard

    Source: Diamond and Related Materials,. Unidade: EP

    Assunto: FILMES FINOS

    Acesso à fonteDOIHow to cite
    A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas

    • ABNT

      MOUSINHO, Ana Paula e MANSANO, Ronaldo Domingues e VERDONCK, Patrick Bernard. High-density plasma chemical vapor deposition of amorphous carbon films. Diamond and Related Materials, v. 13, n. 2, p. 311-315, 2004Tradução . . Disponível em: https://doi.org/10.1016/j.diamond.2003.10.024. Acesso em: 18 ago. 2024.

    • APA

      Mousinho, A. P., Mansano, R. D., & Verdonck, P. B. (2004). High-density plasma chemical vapor deposition of amorphous carbon films. Diamond and Related Materials,, 13( 2), 311-315. doi:10.1016/j.diamond.2003.10.024

    • NLM

      Mousinho AP, Mansano RD, Verdonck PB. High-density plasma chemical vapor deposition of amorphous carbon films [Internet]. Diamond and Related Materials,. 2004 ; 13( 2): 311-315.[citado 2024 ago. 18 ] Available from: https://doi.org/10.1016/j.diamond.2003.10.024

    • Vancouver

      Mousinho AP, Mansano RD, Verdonck PB. High-density plasma chemical vapor deposition of amorphous carbon films [Internet]. Diamond and Related Materials,. 2004 ; 13( 2): 311-315.[citado 2024 ago. 18 ] Available from: https://doi.org/10.1016/j.diamond.2003.10.024

  • Artigo de periodico

    The influence of nitrogen on the dielectric constant and surface hardness in diamond-like carbon (DLC) films (2004)

    Guerino, M.; Massi, Marcos; Maciel, Homero Santiago; Otani, C.; Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard; Libardi, J.

    Source: Diamond and Related Materials,. Unidade: EP

    Assunto: FILMES FINOS

    Acesso à fonteDOIHow to cite
    A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas

    • ABNT

      GUERINO, M. et al. The influence of nitrogen on the dielectric constant and surface hardness in diamond-like carbon (DLC) films. Diamond and Related Materials, v. 13, n. 2, p. 316-319, 2004Tradução . . Disponível em: https://doi.org/10.1016/j.diamond.2003.10.016. Acesso em: 18 ago. 2024.

    • APA

      Guerino, M., Massi, M., Maciel, H. S., Otani, C., Mansano, R. D., Verdonck, P. B., & Libardi, J. (2004). The influence of nitrogen on the dielectric constant and surface hardness in diamond-like carbon (DLC) films. Diamond and Related Materials,, 13( 2), 316-319. doi:10.1016/j.diamond.2003.10.016

    • NLM

      Guerino M, Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB, Libardi J. The influence of nitrogen on the dielectric constant and surface hardness in diamond-like carbon (DLC) films [Internet]. Diamond and Related Materials,. 2004 ; 13( 2): 316-319.[citado 2024 ago. 18 ] Available from: https://doi.org/10.1016/j.diamond.2003.10.016

    • Vancouver

      Guerino M, Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB, Libardi J. The influence of nitrogen on the dielectric constant and surface hardness in diamond-like carbon (DLC) films [Internet]. Diamond and Related Materials,. 2004 ; 13( 2): 316-319.[citado 2024 ago. 18 ] Available from: https://doi.org/10.1016/j.diamond.2003.10.016

  • Artigo de periodico

    Micro-machine fabrication using diamond-like carbon films (2003)

    Mousinho, Ana Paula; Mansano, Ronaldo Domingues ; Massi, Marcos; Jaramillo Ocampo, Juan Manuel

    Source: Diamond and Related Materials. Unidade: EP

    Assunto: PLASMA (MICROELETRÔNICA)

    Acesso à fonteDOIHow to cite
    A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas

    • ABNT

      MOUSINHO, Ana Paula et al. Micro-machine fabrication using diamond-like carbon films. Diamond and Related Materials, v. 12, n. 3-7, p. 1041-1044, 2003Tradução . . Disponível em: https://doi.org/10.1016/s0925-9635(02)00219-4. Acesso em: 18 ago. 2024.

    • APA

      Mousinho, A. P., Mansano, R. D., Massi, M., & Jaramillo Ocampo, J. M. (2003). Micro-machine fabrication using diamond-like carbon films. Diamond and Related Materials, 12( 3-7), 1041-1044. doi:10.1016/s0925-9635(02)00219-4

    • NLM

      Mousinho AP, Mansano RD, Massi M, Jaramillo Ocampo JM. Micro-machine fabrication using diamond-like carbon films [Internet]. Diamond and Related Materials. 2003 ; 12( 3-7): 1041-1044.[citado 2024 ago. 18 ] Available from: https://doi.org/10.1016/s0925-9635(02)00219-4

    • Vancouver

      Mousinho AP, Mansano RD, Massi M, Jaramillo Ocampo JM. Micro-machine fabrication using diamond-like carbon films [Internet]. Diamond and Related Materials. 2003 ; 12( 3-7): 1041-1044.[citado 2024 ago. 18 ] Available from: https://doi.org/10.1016/s0925-9635(02)00219-4

  • Artigo de periodico

    Generation and characterization of polymeric tridimensional microstrucutres for micromachine application (2003)

    Mousinho, Ana Paula; Mansano, Ronaldo Domingues ; Arruda, Antonio Carlos Santos de

    Source: Microelectronics Journal,. Unidade: EP

    Assunto: NANOTECNOLOGIA

    Acesso à fonteDOIHow to cite
    A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas

    • ABNT

      MOUSINHO, Ana Paula e MANSANO, Ronaldo Domingues e ARRUDA, Antonio Carlos Santos de. Generation and characterization of polymeric tridimensional microstrucutres for micromachine application. Microelectronics Journal, v. 34, n. 5-8, 2003Tradução . . Disponível em: https://doi.org/10.1016/s0026-2692(03)00085-5. Acesso em: 18 ago. 2024.

    • APA

      Mousinho, A. P., Mansano, R. D., & Arruda, A. C. S. de. (2003). Generation and characterization of polymeric tridimensional microstrucutres for micromachine application. Microelectronics Journal,, 34( 5-8). doi:10.1016/s0026-2692(03)00085-5

    • NLM

      Mousinho AP, Mansano RD, Arruda ACS de. Generation and characterization of polymeric tridimensional microstrucutres for micromachine application [Internet]. Microelectronics Journal,. 2003 ; 34( 5-8):[citado 2024 ago. 18 ] Available from: https://doi.org/10.1016/s0026-2692(03)00085-5

    • Vancouver

      Mousinho AP, Mansano RD, Arruda ACS de. Generation and characterization of polymeric tridimensional microstrucutres for micromachine application [Internet]. Microelectronics Journal,. 2003 ; 34( 5-8):[citado 2024 ago. 18 ] Available from: https://doi.org/10.1016/s0026-2692(03)00085-5

  • Artigo de periodico

    High density plasma chemical vapor deposition of diamond-like carbon films (2003)

    Mousinho, Ana Paula; Mansano, Ronaldo Domingues ; Massi, Marcos; Zambom, Luís da Silva

    Source: Microelectronics Journal. Unidade: EP

    Assunto: PLASMA (MICROELETRÔNICA)

    Acesso à fonteDOIHow to cite
    A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas

    • ABNT

      MOUSINHO, Ana Paula et al. High density plasma chemical vapor deposition of diamond-like carbon films. Microelectronics Journal, v. 34, n. 5-8, p. 627-629, 2003Tradução . . Disponível em: https://doi.org/10.1016/s0026-2692(03)00065-x. Acesso em: 18 ago. 2024.

    • APA

      Mousinho, A. P., Mansano, R. D., Massi, M., & Zambom, L. da S. (2003). High density plasma chemical vapor deposition of diamond-like carbon films. Microelectronics Journal, 34( 5-8), 627-629. doi:10.1016/s0026-2692(03)00065-x

    • NLM

      Mousinho AP, Mansano RD, Massi M, Zambom L da S. High density plasma chemical vapor deposition of diamond-like carbon films [Internet]. Microelectronics Journal. 2003 ; 34( 5-8): 627-629.[citado 2024 ago. 18 ] Available from: https://doi.org/10.1016/s0026-2692(03)00065-x

    • Vancouver

      Mousinho AP, Mansano RD, Massi M, Zambom L da S. High density plasma chemical vapor deposition of diamond-like carbon films [Internet]. Microelectronics Journal. 2003 ; 34( 5-8): 627-629.[citado 2024 ago. 18 ] Available from: https://doi.org/10.1016/s0026-2692(03)00065-x

  • Artigo de periodico

    Plasma etching of DLC films for microfluidic channels (2003)

    Massi, Marcos; Jaramillo Ocampo, Juan Manuel; Maciel, Homero Santiago; Grigorov, K.; Otani, C.; Santos, L. V.; Mansano, Ronaldo Domingues

    Source: Microelectronics Journal,. Unidade: EP

    Assunto: PLASMA (MICROELETRÔNICA)

    Acesso à fonteDOIHow to cite
    A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas

    • ABNT

      MASSI, Marcos et al. Plasma etching of DLC films for microfluidic channels. Microelectronics Journal, v. 34, n. 5-8, p. 635-638, 2003Tradução . . Disponível em: https://doi.org/10.1016/s0026-2692(03)00077-6. Acesso em: 18 ago. 2024.

    • APA

      Massi, M., Jaramillo Ocampo, J. M., Maciel, H. S., Grigorov, K., Otani, C., Santos, L. V., & Mansano, R. D. (2003). Plasma etching of DLC films for microfluidic channels. Microelectronics Journal,, 34( 5-8), 635-638. doi:10.1016/s0026-2692(03)00077-6

    • NLM

      Massi M, Jaramillo Ocampo JM, Maciel HS, Grigorov K, Otani C, Santos LV, Mansano RD. Plasma etching of DLC films for microfluidic channels [Internet]. Microelectronics Journal,. 2003 ; 34( 5-8): 635-638.[citado 2024 ago. 18 ] Available from: https://doi.org/10.1016/s0026-2692(03)00077-6

    • Vancouver

      Massi M, Jaramillo Ocampo JM, Maciel HS, Grigorov K, Otani C, Santos LV, Mansano RD. Plasma etching of DLC films for microfluidic channels [Internet]. Microelectronics Journal,. 2003 ; 34( 5-8): 635-638.[citado 2024 ago. 18 ] Available from: https://doi.org/10.1016/s0026-2692(03)00077-6

  • Artigo de periodico

    The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films (2003)

    Guerino, M.; Massi, Marcos; Maciel, Homero Santiago; Otani, C.; Mansano, Ronaldo Domingues

    Source: Microelectronics Journal. Unidade: EP

    Assunto: PLASMA (MICROELETRÔNICA)

    Acesso à fonteDOIHow to cite
    A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas

    • ABNT

      GUERINO, M. et al. The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films. Microelectronics Journal, v. 34, n. 5-8, 2003Tradução . . Disponível em: https://doi.org/10.1016/s0026-2692(03)00079-x. Acesso em: 18 ago. 2024.

    • APA

      Guerino, M., Massi, M., Maciel, H. S., Otani, C., & Mansano, R. D. (2003). The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films. Microelectronics Journal, 34( 5-8). doi:10.1016/s0026-2692(03)00079-x

    • NLM

      Guerino M, Massi M, Maciel HS, Otani C, Mansano RD. The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films [Internet]. Microelectronics Journal. 2003 ; 34( 5-8):[citado 2024 ago. 18 ] Available from: https://doi.org/10.1016/s0026-2692(03)00079-x

    • Vancouver

      Guerino M, Massi M, Maciel HS, Otani C, Mansano RD. The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films [Internet]. Microelectronics Journal. 2003 ; 34( 5-8):[citado 2024 ago. 18 ] Available from: https://doi.org/10.1016/s0026-2692(03)00079-x

  • Artigo de periodico

    Electrical and structural characterization of DLC films deposited by magnetron sputtering (2001)

    Massi, Marcos; Maciel, Homero Santiago; Otani, C.; Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard

    Source: Journal of Materials Science: Materials in Electronics. Unidade: EP

    Assunto: FILMES FINOS

    How to cite
    A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas

    • ABNT

      MASSI, Marcos et al. Electrical and structural characterization of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics, v. 12, p. 343-346, 2001Tradução . . Acesso em: 18 ago. 2024.

    • APA

      Massi, M., Maciel, H. S., Otani, C., Mansano, R. D., & Verdonck, P. B. (2001). Electrical and structural characterization of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics, 12, 343-346.

    • NLM

      Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB. Electrical and structural characterization of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics. 2001 ; 12 343-346.[citado 2024 ago. 18 ]

    • Vancouver

      Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB. Electrical and structural characterization of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics. 2001 ; 12 343-346.[citado 2024 ago. 18 ]

  • Artigo de periodico

    Effects of plasma etching on DLC films (1999)

    Massi, Marcos; Mansano, Ronaldo Domingues ; Maciel, Homero Santiago; Otani, C.; Verdonck, Patrick Bernard; Nishioka, L. N. B. M.

    Source: Thin Solid Films. Unidade: EP

    Assunto: PLASMA

    Acesso à fonteAcesso à fonteDOIHow to cite
    A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas

    • ABNT

      MASSI, Marcos et al. Effects of plasma etching on DLC films. Thin Solid Films, n. 343-344, p. 381-384, 1999Tradução . . Disponível em: https://doi.org/10.1016/s0040-6090(98)01691-5. Acesso em: 18 ago. 2024.

    • APA

      Massi, M., Mansano, R. D., Maciel, H. S., Otani, C., Verdonck, P. B., & Nishioka, L. N. B. M. (1999). Effects of plasma etching on DLC films. Thin Solid Films, ( 343-344), 381-384. doi:10.1016/s0040-6090(98)01691-5

    • NLM

      Massi M, Mansano RD, Maciel HS, Otani C, Verdonck PB, Nishioka LNBM. Effects of plasma etching on DLC films [Internet]. Thin Solid Films. 1999 ;( 343-344): 381-384.[citado 2024 ago. 18 ] Available from: https://doi.org/10.1016/s0040-6090(98)01691-5

    • Vancouver

      Massi M, Mansano RD, Maciel HS, Otani C, Verdonck PB, Nishioka LNBM. Effects of plasma etching on DLC films [Internet]. Thin Solid Films. 1999 ;( 343-344): 381-384.[citado 2024 ago. 18 ] Available from: https://doi.org/10.1016/s0040-6090(98)01691-5

  • Artigo de periodico

    LPCVD deposition of silicon nitride assisted by high density plasmas (1999)

    Zambom, Luís da Silva ; Mansano, Ronaldo Domingues ; Furlan, Rogério ; Verdonck, Patrick Bernard

    Source: Thin Solid Films. Unidade: EP

    Assunto: FILMES FINOS

    Acesso à fonteDOIHow to cite
    A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas

    • ABNT

      ZAMBOM, Luís da Silva et al. LPCVD deposition of silicon nitride assisted by high density plasmas. Thin Solid Films, v. 343-344, p. 299-301, 1999Tradução . . Disponível em: https://doi.org/10.1016/s0040-6090(98)01587-9. Acesso em: 18 ago. 2024.

    • APA

      Zambom, L. da S., Mansano, R. D., Furlan, R., & Verdonck, P. B. (1999). LPCVD deposition of silicon nitride assisted by high density plasmas. Thin Solid Films, 343-344, 299-301. doi:10.1016/s0040-6090(98)01587-9

    • NLM

      Zambom L da S, Mansano RD, Furlan R, Verdonck PB. LPCVD deposition of silicon nitride assisted by high density plasmas [Internet]. Thin Solid Films. 1999 ; 343-344 299-301.[citado 2024 ago. 18 ] Available from: https://doi.org/10.1016/s0040-6090(98)01587-9

    • Vancouver

      Zambom L da S, Mansano RD, Furlan R, Verdonck PB. LPCVD deposition of silicon nitride assisted by high density plasmas [Internet]. Thin Solid Films. 1999 ; 343-344 299-301.[citado 2024 ago. 18 ] Available from: https://doi.org/10.1016/s0040-6090(98)01587-9
  • 1

1 - 10 (10 records)

Digital Library of Intellectual Production of Universidade de São Paulo     2012 - 2024