Local anodic oxidation induced by electric fields of MV/cm at AFM silicon nitride tips on silicon surfaces (2008)
- Authors:
- Autor USP: SANTOS FILHO, SEBASTIAO GOMES DOS - EP
- Unidade: EP
- DOI: 10.1149/1.2956058
- Assunto: MICROELETRÔNICA
- Language: Inglês
- Imprenta:
- Publisher: The Electrochemical Society
- Publisher place: Pennington
- Date published: 2008
- Source:
- Título: SBMICRO 2008: Anais
- ISSN: 1938-5862
- Conference titles: International Symposium on Microelectronics Technology and Devices SBMICRO
- Status:
- Nenhuma versão em acesso aberto identificada
-
ABNT
PINTO, Diego Kops e SANTOS FILHO, Sebastião Gomes dos. Local anodic oxidation induced by electric fields of MV/cm at AFM silicon nitride tips on silicon surfaces. 2008, Anais.. Pennington: The Electrochemical Society, 2008. Disponível em: https://doi.org/10.1149/1.2956058. Acesso em: 20 mar. 2026. -
APA
Pinto, D. K., & Santos Filho, S. G. dos. (2008). Local anodic oxidation induced by electric fields of MV/cm at AFM silicon nitride tips on silicon surfaces. In SBMICRO 2008: Anais. Pennington: The Electrochemical Society. doi:10.1149/1.2956058 -
NLM
Pinto DK, Santos Filho SG dos. Local anodic oxidation induced by electric fields of MV/cm at AFM silicon nitride tips on silicon surfaces [Internet]. SBMICRO 2008: Anais. 2008 ;[citado 2026 mar. 20 ] Available from: https://doi.org/10.1149/1.2956058 -
Vancouver
Pinto DK, Santos Filho SG dos. Local anodic oxidation induced by electric fields of MV/cm at AFM silicon nitride tips on silicon surfaces [Internet]. SBMICRO 2008: Anais. 2008 ;[citado 2026 mar. 20 ] Available from: https://doi.org/10.1149/1.2956058 - Nano-crystalline palladium-film catalysts deposited by e-beam evaporation aiming hydrogen sensing
- Influence of the 'SI' / 'SI''O IND.2' interface roughness on electronic roughness
- Dynamic scaling of the surface roughness during electroless Cu plating onto Si in aqueous fluoride solution
- Fabrication and physical characterization of nickel nanowires formed by a template-based electrodeposition method
- Formation and stability of Ni(Pt)Si/Poly-Si layered structure
- Characterization of thin MOS gate oxides grown in pyrogenic environment
- Partial dielectric breakdown in MOS gate oxide grown by RTO
- Electrical simulations of gate-controlled diodes in order to show their feasibility as luminous radiation sensors
- Construcao de termopares sobre laminas de silicio para calibracao de fornos rtp
- Temporal evolution of roughness in electroless copper films
Informações sobre a disponibilidade de versões do artigo em acesso aberto coletadas automaticamente via oaDOI API (Unpaywall).
How to cite
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
