Nano-crystalline palladium-film catalysts deposited by e-beam evaporation aiming hydrogen sensing (2010)
- Authors:
- Autor USP: SANTOS FILHO, SEBASTIAO GOMES DOS - EP
- Unidade: EP
- DOI: 10.1149/1.3474156
- Subjects: ELEMENTOS DE TRANSIÇÃO; SEMICONDUTORES
- Language: Inglês
- Imprenta:
- Publisher place: New Jersey
- Date published: 2010
- Source:
- Título: Microelectronics Technology and Devices - SBMicro 2010
- ISSN: 1938-5862
- Volume/Número/Paginação/Ano: v.31, n.1, p. 171-178, 2010
- Este artigo NÃO possui versão em acesso aberto
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Status: Nenhuma versão em acesso aberto identificada -
ABNT
STEM, Nair e SANTOS FILHO, Sebastião Gomes dos. Nano-crystalline palladium-film catalysts deposited by e-beam evaporation aiming hydrogen sensing. Microelectronics Technology and Devices - SBMicro 2010, v. 31, n. 1, p. 171-178, 2010Tradução . . Disponível em: https://doi.org/10.1149/1.3474156. Acesso em: 14 mar. 2026. -
APA
Stem, N., & Santos Filho, S. G. dos. (2010). Nano-crystalline palladium-film catalysts deposited by e-beam evaporation aiming hydrogen sensing. Microelectronics Technology and Devices - SBMicro 2010, 31( 1), 171-178. doi:10.1149/1.3474156 -
NLM
Stem N, Santos Filho SG dos. Nano-crystalline palladium-film catalysts deposited by e-beam evaporation aiming hydrogen sensing [Internet]. Microelectronics Technology and Devices - SBMicro 2010. 2010 ;31( 1): 171-178.[citado 2026 mar. 14 ] Available from: https://doi.org/10.1149/1.3474156 -
Vancouver
Stem N, Santos Filho SG dos. Nano-crystalline palladium-film catalysts deposited by e-beam evaporation aiming hydrogen sensing [Internet]. Microelectronics Technology and Devices - SBMicro 2010. 2010 ;31( 1): 171-178.[citado 2026 mar. 14 ] Available from: https://doi.org/10.1149/1.3474156 - Influence of the 'SI' / 'SI''O IND.2' interface roughness on electronic roughness
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