Initiatives for promotion of microelectronics and microfabrication at São Paulo State University - Brazil (2001)
- Authors:
- USP affiliated authors: NOIJE, WILHELMUS ADRIANUS MARIA VAN - EP ; SEABRA, ANTONIO CARLOS - EP ; VERDONCK, PATRICK BERNARD - EP ; MANSANO, RONALDO DOMINGUES - EP ; SWART, JACOBUS WILLIBRORDUS - EP
- Unidade: EP
- Subjects: CIRCUITOS ANALÓGICOS; MICROELETRÔNICA
- Language: Inglês
- Imprenta:
- Publisher: IEEE
- Publisher place: Piscataway
- Date published: 2001
- Source:
- Título: Proceedings
- Conference titles: Biennial IEEE University/Government/Industry Microelectronics Symposium
-
ABNT
VAN NOIJE, Wilhelmus Adrianus Maria et al. Initiatives for promotion of microelectronics and microfabrication at São Paulo State University - Brazil. 2001, Anais.. Piscataway: IEEE, 2001. . Acesso em: 13 fev. 2026. -
APA
Van Noije, W. A. M., Swart, J. W., Seabra, A. C., Verdonck, P. B., Zambom, L. da S., Diniz, J. A., et al. (2001). Initiatives for promotion of microelectronics and microfabrication at São Paulo State University - Brazil. In Proceedings. Piscataway: IEEE. -
NLM
Van Noije WAM, Swart JW, Seabra AC, Verdonck PB, Zambom L da S, Diniz JA, Doi I, Zakia MJB, Mansano RD, Moreira L. Initiatives for promotion of microelectronics and microfabrication at São Paulo State University - Brazil. Proceedings. 2001 ;[citado 2026 fev. 13 ] -
Vancouver
Van Noije WAM, Swart JW, Seabra AC, Verdonck PB, Zambom L da S, Diniz JA, Doi I, Zakia MJB, Mansano RD, Moreira L. Initiatives for promotion of microelectronics and microfabrication at São Paulo State University - Brazil. Proceedings. 2001 ;[citado 2026 fev. 13 ] - Reactive ion etching of 'GA''AS' in cc14-n2 plasmas
- A política industrial e tecnológica de semicondutores
- Design and analysis of dcfl and scfl logic gates in 'GA''AS' mesfet technology
- Analysis of the etching mechanisms of tungsten in fluorine containing plasmas
- Chemical etching of tungsten with nf3 - 02 plasmas
- Actionometry and its applications on polysilicon etching in a magnetically confined reactor
- Design of continuous full complex modulation proximity printing masks using a quadratic phase distribution
- O uso de resistes amplificados quimicamente e de sililação em litografia por feixe de elétrons
- Complex-amplitude modulation diffractive optical element performed by aperture variations on a reflective aluminum layer deposited over a variable thickness SiO2 substrate
- High-density plasma chemical vapor deposition of amorphous carbon films
How to cite
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
