Design of continuous full complex modulation proximity printing masks using a quadratic phase distribution (2004)
- Authors:
- USP affiliated authors: GONCALVES NETO, LUIZ - EESC ; MANSANO, RONALDO DOMINGUES - EP ; VERDONCK, PATRICK BERNARD - EP ; SEABRA, ANTONIO CARLOS - EP
- Unidades: EESC; EP
- Subjects: ÓPTICA ELETRÔNICA; MICROELETRÔNICA
- Language: Inglês
- Imprenta:
- Publisher place: Bellingham, WA
- Date published: 2004
- Source:
- Título: Proceedings of SPIE
- Volume/Número/Paginação/Ano: v. 5437, p. 71-78, 2004
- Conference titles: Micromachining Technology for Micro-Optics and Nano-Optics II
-
ABNT
GONÇALVES NETO, Luiz et al. Design of continuous full complex modulation proximity printing masks using a quadratic phase distribution. Proceedings of SPIE. Bellingham, WA: Escola de Engenharia de São Carlos, Universidade de São Paulo. Disponível em: https://repositorio.usp.br/directbitstream/37a16619-40c9-4c77-bb78-7407a2aa30f6/ok1390500.pdf. Acesso em: 28 dez. 2025. , 2004 -
APA
Gonçalves Neto, L., Cirino, G. A., Mansano, R. D., Verdonck, P. B., & Seabra, A. C. (2004). Design of continuous full complex modulation proximity printing masks using a quadratic phase distribution. Proceedings of SPIE. Bellingham, WA: Escola de Engenharia de São Carlos, Universidade de São Paulo. Recuperado de https://repositorio.usp.br/directbitstream/37a16619-40c9-4c77-bb78-7407a2aa30f6/ok1390500.pdf -
NLM
Gonçalves Neto L, Cirino GA, Mansano RD, Verdonck PB, Seabra AC. Design of continuous full complex modulation proximity printing masks using a quadratic phase distribution [Internet]. Proceedings of SPIE. 2004 ; 5437 71-78.[citado 2025 dez. 28 ] Available from: https://repositorio.usp.br/directbitstream/37a16619-40c9-4c77-bb78-7407a2aa30f6/ok1390500.pdf -
Vancouver
Gonçalves Neto L, Cirino GA, Mansano RD, Verdonck PB, Seabra AC. Design of continuous full complex modulation proximity printing masks using a quadratic phase distribution [Internet]. Proceedings of SPIE. 2004 ; 5437 71-78.[citado 2025 dez. 28 ] Available from: https://repositorio.usp.br/directbitstream/37a16619-40c9-4c77-bb78-7407a2aa30f6/ok1390500.pdf - Hybrid phase and amplitude modulation proximity printing mask fabricated on DLC and 'SIO IND. 2' substrates
- Design, fabrication, and characterization of a full complex-amplitude modulation diffractive optical element
- Implementation of Fresnel full complex-amplitude digital holograms
- Full complex amplitude digital holograms: design, fabrication and optical characterization
- Fabrication of PMMA microlenses using a micromachined silicon moud
- Fabrication of microlenses with a novolak-type polymer
- Fabrication of microlens arrays and gratings with a Novolak-type polymer
- Full complex amplitude modulation proximity printing mask fabricated on DLC and SiO2 subtrates
- Digital holography: computer-generated holograms and diffractive optics in scalar diffraction domain
- Fabrication of a continuous parabolic surface relief array using a silicon-based wet-etch micromachining
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