Design of continuous full complex modulation proximity printing masks using a quadratic phase distribution (2004)
- Authors:
- USP affiliated authors: GONCALVES NETO, LUIZ - EESC ; MANSANO, RONALDO DOMINGUES - EP ; VERDONCK, PATRICK BERNARD - EP ; SEABRA, ANTONIO CARLOS - EP
- Unidades: EESC; EP
- Subjects: ÓPTICA ELETRÔNICA; MICROELETRÔNICA
- Language: Inglês
- Imprenta:
- Publisher place: Bellingham, WA
- Date published: 2004
- Source:
- Título do periódico: Proceedings of SPIE
- Volume/Número/Paginação/Ano: v. 5437, p. 71-78, 2004
- Conference titles: Micromachining Technology for Micro-Optics and Nano-Optics II
-
ABNT
GONÇALVES NETO, Luiz et al. Design of continuous full complex modulation proximity printing masks using a quadratic phase distribution. Proceedings of SPIE. Bellingham, WA: Escola de Engenharia de São Carlos, Universidade de São Paulo. . Acesso em: 23 abr. 2024. , 2004 -
APA
Gonçalves Neto, L., Cirino, G. A., Mansano, R. D., Verdonck, P. B., & Seabra, A. C. (2004). Design of continuous full complex modulation proximity printing masks using a quadratic phase distribution. Proceedings of SPIE. Bellingham, WA: Escola de Engenharia de São Carlos, Universidade de São Paulo. -
NLM
Gonçalves Neto L, Cirino GA, Mansano RD, Verdonck PB, Seabra AC. Design of continuous full complex modulation proximity printing masks using a quadratic phase distribution. Proceedings of SPIE. 2004 ; 5437 71-78.[citado 2024 abr. 23 ] -
Vancouver
Gonçalves Neto L, Cirino GA, Mansano RD, Verdonck PB, Seabra AC. Design of continuous full complex modulation proximity printing masks using a quadratic phase distribution. Proceedings of SPIE. 2004 ; 5437 71-78.[citado 2024 abr. 23 ] - Fabrication of PMMA microlenses using a micromachined silicon moud
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