Titanium silicide formation and arsenic dopant behavior under rapid thermal treatments in vacuum

Titanium silicide formation and arsenic dopant behavior under rapid thermal treatments in vacuum (1989)

Authors:
- Furlan, Rogério
- Swart, Jacobus Willibrordus
USP affiliated authors: SWART, JACOBUS WILLIBRORDUS - EP ; FURLAN, ROGERIO - EP
Unidade: EP
Subjects: TRATAMENTO TÉRMICO; TECNOLOGIA DO VÁCUO
Language: Inglês
Imprenta:
- Publisher place: Pennington
- Date published: 1989
Source:
- Título do periódico: Journal of the Electrochemical Society
- Volume/Número/Paginação/Ano: v.136, n.6 , p.1806-11, jun. 1989

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ABNT

FURLAN, Rogério; SWART, Jacobus Willibrordus. Titanium silicide formation and arsenic dopant behavior under rapid thermal treatments in vacuum. Journal of the Electrochemical Society, Pennington, v. 136, n. ju 1989, p. 1806-11, 1989.
APA

Furlan, R., & Swart, J. W. (1989). Titanium silicide formation and arsenic dopant behavior under rapid thermal treatments in vacuum. Journal of the Electrochemical Society, 136( ju 1989), 1806-11.
NLM

Furlan R, Swart JW. Titanium silicide formation and arsenic dopant behavior under rapid thermal treatments in vacuum. Journal of the Electrochemical Society. 1989 ;136( ju 1989): 1806-11.
Vancouver

Furlan R, Swart JW. Titanium silicide formation and arsenic dopant behavior under rapid thermal treatments in vacuum. Journal of the Electrochemical Society. 1989 ;136( ju 1989): 1806-11.