Temperature influence on the generation lifetime determination based on drain current transients in partially depleted SOI nMOSFETs (2004)
- Autores:
- Autor USP: MARTINO, JOÃO ANTONIO - EP
- Unidade: EP
- Assuntos: MICROELETRÔNICA; CIRCUITOS INTEGRADOS
- Idioma: Inglês
- Imprenta:
- Editora: The Electrochemical Society
- Local: Pennington
- Data de publicação: 2004
- Fonte:
- Título do periódico: 8. Symposium on High Purity Silicon: proceedings
- Nome do evento: Symposium on High Purity Silicon
-
ABNT
MARTINO, João Antonio et al. Temperature influence on the generation lifetime determination based on drain current transients in partially depleted SOI nMOSFETs. 8. Symposium on High Purity Silicon: proceedings. Tradução . Pennington: The Electrochemical Society, 2004. . . Acesso em: 05 maio 2024. -
APA
Martino, J. A., Rafi, J. M., Mercha, A., Simoen, E., & Claeys, C. (2004). Temperature influence on the generation lifetime determination based on drain current transients in partially depleted SOI nMOSFETs. In 8. Symposium on High Purity Silicon: proceedings. Pennington: The Electrochemical Society. -
NLM
Martino JA, Rafi JM, Mercha A, Simoen E, Claeys C. Temperature influence on the generation lifetime determination based on drain current transients in partially depleted SOI nMOSFETs. In: 8. Symposium on High Purity Silicon: proceedings. Pennington: The Electrochemical Society; 2004. [citado 2024 maio 05 ] -
Vancouver
Martino JA, Rafi JM, Mercha A, Simoen E, Claeys C. Temperature influence on the generation lifetime determination based on drain current transients in partially depleted SOI nMOSFETs. In: 8. Symposium on High Purity Silicon: proceedings. Pennington: The Electrochemical Society; 2004. [citado 2024 maio 05 ] - The leakage drain current behavior in graded-channel SOI nMOSFETs operating up to 300 o.C
- Comparison between the leakage drain current behavior in SOI nMOSFETs and SOI nMOSFETs operating at 300 o. C
- Obtenção da estrutura de perfil de um transistor MOS a partir de parâmetros PSPICE
- Components of the leakage drain current in accumulation-mode SOI pMOSFETs at high temperatures
- A novel simple method to extract the effective LDD doping concentration on fully depleted SOI NMOSFET
- The graded-channel SOI NMOSFET and its potential to analog applications
- CPU didática. (também em CD-Rom)
- Optimization of the twin gate SOI MOSFET
- Método simples para obtenção de variação da carga efetiva no óxido de um SOI-MOSFET em função da radiação. (em CD-Rom)
- Improved channel lenght and series resistance extraction for short-channel MOSFETs suffering from mobility degradation
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