Diluted HNO3/HF as a final pre-oxidation cleaning step for MOS devices (2002)
- Authors:
- Autor USP: SANTOS FILHO, SEBASTIAO GOMES DOS - EP
- Unidade: EP
- Assunto: MICROELETRÔNICA
- Language: Inglês
- Imprenta:
- Publisher: The Electrochemical Society
- Publisher place: Pennington
- Date published: 2002
- ISBN: 1-56677-328-8
- Source:
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ABNT
NOGUEIRA, Willian Aurélio e TOQUETTI, Leandro Zeidan e SANTOS FILHO, Sebastião Gomes dos. Diluted HNO3/HF as a final pre-oxidation cleaning step for MOS devices. Microelectronics Technology and Devices SBMICRO 2002. Tradução . Pennington: The Electrochemical Society, 2002. . . Acesso em: 12 jan. 2026. -
APA
Nogueira, W. A., Toquetti, L. Z., & Santos Filho, S. G. dos. (2002). Diluted HNO3/HF as a final pre-oxidation cleaning step for MOS devices. In Microelectronics Technology and Devices SBMICRO 2002. Pennington: The Electrochemical Society. -
NLM
Nogueira WA, Toquetti LZ, Santos Filho SG dos. Diluted HNO3/HF as a final pre-oxidation cleaning step for MOS devices. In: Microelectronics Technology and Devices SBMICRO 2002. Pennington: The Electrochemical Society; 2002. [citado 2026 jan. 12 ] -
Vancouver
Nogueira WA, Toquetti LZ, Santos Filho SG dos. Diluted HNO3/HF as a final pre-oxidation cleaning step for MOS devices. In: Microelectronics Technology and Devices SBMICRO 2002. Pennington: The Electrochemical Society; 2002. [citado 2026 jan. 12 ] - Analysis of the surface roughness and surface particle concentration using a new technique: integrated angle resolved LASER scattering (IARLS)
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