Porous silicon masking by silicon oxide and hydrogen ion implantation (2001)
Source: SBMicro 2001: proceedings. Conference titles: International Conference on Microelectronics and Packaging. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS
ABNT
PERES, Henrique Estanislau Maldonado et al. Porous silicon masking by silicon oxide and hydrogen ion implantation. 2001, Anais.. Brasília: SBMicro, 2001. . Acesso em: 15 nov. 2025.APA
Peres, H. E. M., Galeazzo, E., Dantas, M. O. da S., & Ramírez Fernandez, F. J. (2001). Porous silicon masking by silicon oxide and hydrogen ion implantation. In SBMicro 2001: proceedings. Brasília: SBMicro.NLM
Peres HEM, Galeazzo E, Dantas MO da S, Ramírez Fernandez FJ. Porous silicon masking by silicon oxide and hydrogen ion implantation. SBMicro 2001: proceedings. 2001 ;[citado 2025 nov. 15 ]Vancouver
Peres HEM, Galeazzo E, Dantas MO da S, Ramírez Fernandez FJ. Porous silicon masking by silicon oxide and hydrogen ion implantation. SBMicro 2001: proceedings. 2001 ;[citado 2025 nov. 15 ]
