ReP USP - Resultado da busca

Trabalho de evento
The influence of electrode material on argon plasmas (2001)
Ruas, Ronaldo; Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard; Braithwaite, S. J.
Source: SBMicro 2001: proceedings. Conference titles: International Conference on Microelectronics and Packaging. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
RUAS, Ronaldo et al. The influence of electrode material on argon plasmas. 2001, Anais.. Brasília: SBMicro, 2001. . Acesso em: 16 nov. 2025.
APA
Ruas, R., Mansano, R. D., Verdonck, P. B., & Braithwaite, S. J. (2001). The influence of electrode material on argon plasmas. In SBMicro 2001: proceedings. Brasília: SBMicro.
NLM
Ruas R, Mansano RD, Verdonck PB, Braithwaite SJ. The influence of electrode material on argon plasmas. SBMicro 2001: proceedings. 2001 ;[citado 2025 nov. 16 ]
Vancouver
Ruas R, Mansano RD, Verdonck PB, Braithwaite SJ. The influence of electrode material on argon plasmas. SBMicro 2001: proceedings. 2001 ;[citado 2025 nov. 16 ]
Trabalho de evento
Optical characterization of an amorphous-hydrogenated carbon film and its application in phase modulated diffractive optical elements (2001)
Cirino, Giuseppe Antonio; Verdonck, Patrick Bernard; Mansano, Ronaldo Domingues ; Gonçalves Neto, Luiz
Source: SBMicro 2001: proceedings. Conference titles: International Conference on Microelectronics and Packaging. Unidades: EP, EESC
Assunto: CIRCUITOS INTEGRADOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
CIRINO, Giuseppe Antonio et al. Optical characterization of an amorphous-hydrogenated carbon film and its application in phase modulated diffractive optical elements. 2001, Anais.. Brasília: SBMicro, 2001. . Acesso em: 16 nov. 2025.
APA
Cirino, G. A., Verdonck, P. B., Mansano, R. D., & Gonçalves Neto, L. (2001). Optical characterization of an amorphous-hydrogenated carbon film and its application in phase modulated diffractive optical elements. In SBMicro 2001: proceedings. Brasília: SBMicro.
NLM
Cirino GA, Verdonck PB, Mansano RD, Gonçalves Neto L. Optical characterization of an amorphous-hydrogenated carbon film and its application in phase modulated diffractive optical elements. SBMicro 2001: proceedings. 2001 ;[citado 2025 nov. 16 ]
Vancouver
Cirino GA, Verdonck PB, Mansano RD, Gonçalves Neto L. Optical characterization of an amorphous-hydrogenated carbon film and its application in phase modulated diffractive optical elements. SBMicro 2001: proceedings. 2001 ;[citado 2025 nov. 16 ]
Trabalho de evento
RF electrical measurements in plasma processing reactors (2000)
Pisani, Marcelo B.; Verdonck, Patrick Bernard
Source: SBMicro 2000: proceedings. Conference titles: International Conference on Microelectronics and Packaging. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
PISANI, Marcelo B. e VERDONCK, Patrick Bernard. RF electrical measurements in plasma processing reactors. 2000, Anais.. Manaus: SBMicro/UA/UFRGS/UNICAMP/USP, 2000. . Acesso em: 16 nov. 2025.
APA
Pisani, M. B., & Verdonck, P. B. (2000). RF electrical measurements in plasma processing reactors. In SBMicro 2000: proceedings. Manaus: SBMicro/UA/UFRGS/UNICAMP/USP.
NLM
Pisani MB, Verdonck PB. RF electrical measurements in plasma processing reactors. SBMicro 2000: proceedings. 2000 ;[citado 2025 nov. 16 ]
Vancouver
Pisani MB, Verdonck PB. RF electrical measurements in plasma processing reactors. SBMicro 2000: proceedings. 2000 ;[citado 2025 nov. 16 ]
Trabalho de evento
A new mechanism for silicon etching with fluorine based plasmas (2000)
Verdonck, Patrick Bernard; Goodyear, A.; Mansano, Ronaldo Domingues ; Barroy, P.R.J.; Braithwaite, N.St.J.
Source: SBMicro 2000: proceedings. Conference titles: International Conference on Microelectronics and Packaging. Unidade: EP
Assunto: CIRCUITOS INTEGRADOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
VERDONCK, Patrick Bernard et al. A new mechanism for silicon etching with fluorine based plasmas. 2000, Anais.. Manaus: SBMicro/UA/UFRGS/UNICAMP/USP, 2000. . Acesso em: 16 nov. 2025.
APA
Verdonck, P. B., Goodyear, A., Mansano, R. D., Barroy, P. R. J., & Braithwaite, N. S. J. (2000). A new mechanism for silicon etching with fluorine based plasmas. In SBMicro 2000: proceedings. Manaus: SBMicro/UA/UFRGS/UNICAMP/USP.
NLM
Verdonck PB, Goodyear A, Mansano RD, Barroy PRJ, Braithwaite NSJ. A new mechanism for silicon etching with fluorine based plasmas. SBMicro 2000: proceedings. 2000 ;[citado 2025 nov. 16 ]
Vancouver
Verdonck PB, Goodyear A, Mansano RD, Barroy PRJ, Braithwaite NSJ. A new mechanism for silicon etching with fluorine based plasmas. SBMicro 2000: proceedings. 2000 ;[citado 2025 nov. 16 ]
Trabalho de evento
The applicability of Langmuir probes for end point detection of polymer etching (1999)
Mansano, Ronaldo Domingues ; Nogueira, Paula Maria; Zambom, Luís da Silva ; Verdonck, Patrick Bernard; Massi, Marcos; Maciel, Homero Santiago
Source: ICMP 99: technical digest. Conference titles: International Conference on Microelectronics and Packaging. Unidade: EP
Assunto: FILMES
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
MANSANO, Ronaldo Domingues et al. The applicability of Langmuir probes for end point detection of polymer etching. 1999, Anais.. São Paulo: SBMicro/IMAPS, 1999. . Acesso em: 16 nov. 2025.
APA
Mansano, R. D., Nogueira, P. M., Zambom, L. da S., Verdonck, P. B., Massi, M., & Maciel, H. S. (1999). The applicability of Langmuir probes for end point detection of polymer etching. In ICMP 99: technical digest. São Paulo: SBMicro/IMAPS.
NLM
Mansano RD, Nogueira PM, Zambom L da S, Verdonck PB, Massi M, Maciel HS. The applicability of Langmuir probes for end point detection of polymer etching. ICMP 99: technical digest. 1999 ;[citado 2025 nov. 16 ]
Vancouver
Mansano RD, Nogueira PM, Zambom L da S, Verdonck PB, Massi M, Maciel HS. The applicability of Langmuir probes for end point detection of polymer etching. ICMP 99: technical digest. 1999 ;[citado 2025 nov. 16 ]
Trabalho de evento
Influence of methane addition on the characteristics of magnetron sputtered hydrogenated carbon films (1999)
Mansano, Ronaldo Domingues ; Nogueira, Paula Maria; Zambom, Luís da Silva ; Verdonck, Patrick Bernard; Massi, Marcos; Maciel, Homero Santiago
Source: ICMP 99: technical digest. Conference titles: International Conference on Microelectronics and Packaging. Unidade: EP
Assunto: FILMES
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
MANSANO, Ronaldo Domingues et al. Influence of methane addition on the characteristics of magnetron sputtered hydrogenated carbon films. 1999, Anais.. São Paulo: SBMicro/IMAPS, 1999. . Acesso em: 16 nov. 2025.
APA
Mansano, R. D., Nogueira, P. M., Zambom, L. da S., Verdonck, P. B., Massi, M., & Maciel, H. S. (1999). Influence of methane addition on the characteristics of magnetron sputtered hydrogenated carbon films. In ICMP 99: technical digest. São Paulo: SBMicro/IMAPS.
NLM
Mansano RD, Nogueira PM, Zambom L da S, Verdonck PB, Massi M, Maciel HS. Influence of methane addition on the characteristics of magnetron sputtered hydrogenated carbon films. ICMP 99: technical digest. 1999 ;[citado 2025 nov. 16 ]
Vancouver
Mansano RD, Nogueira PM, Zambom L da S, Verdonck PB, Massi M, Maciel HS. Influence of methane addition on the characteristics of magnetron sputtered hydrogenated carbon films. ICMP 99: technical digest. 1999 ;[citado 2025 nov. 16 ]
Trabalho de evento
Microfluidic amplifiers fabricated in silicon using fluorine based plasma etching processes (1998)
Simões, Eliphas Wagner; Mansano, Ronaldo Domingues ; Furlan, Rogério ; Verdonck, Patrick Bernard
Source: XIII SBMicro-ICMP'98 : proceedings. Conference titles: International Conference on Microelectronics and Packaging. Unidade: EP
Subjects: CIRCUITOS INTEGRADOS, SEMICONDUTORES
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
SIMÕES, Eliphas Wagner et al. Microfluidic amplifiers fabricated in silicon using fluorine based plasma etching processes. 1998, Anais.. Curitiba: s. ed, 1998. . Acesso em: 16 nov. 2025.
APA
Simões, E. W., Mansano, R. D., Furlan, R., & Verdonck, P. B. (1998). Microfluidic amplifiers fabricated in silicon using fluorine based plasma etching processes. In XIII SBMicro-ICMP'98 : proceedings. Curitiba: s. ed.
NLM
Simões EW, Mansano RD, Furlan R, Verdonck PB. Microfluidic amplifiers fabricated in silicon using fluorine based plasma etching processes. XIII SBMicro-ICMP'98 : proceedings. 1998 ;[citado 2025 nov. 16 ]
Vancouver
Simões EW, Mansano RD, Furlan R, Verdonck PB. Microfluidic amplifiers fabricated in silicon using fluorine based plasma etching processes. XIII SBMicro-ICMP'98 : proceedings. 1998 ;[citado 2025 nov. 16 ]

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