Source: Contributions to plasma physics. Unidade: EP
Assunto: PLASMA (MICROELETRÔNICA)
ABNT
CASTRO, Raul Murete de et al. A comparative study of single and double langmuir probe techniques for RF plasma characterization. Contributions to plasma physics, v. 39, n. 3, p. 235-246, 1999Tradução . . Acesso em: 05 nov. 2024.APA
Castro, R. M. de, Cirino, G. A., Verdonck, P. B., Maciel, H. S., Massi, M., Pisani, M. B., & Mansano, R. D. (1999). A comparative study of single and double langmuir probe techniques for RF plasma characterization. Contributions to plasma physics, 39( 3), 235-246.NLM
Castro RM de, Cirino GA, Verdonck PB, Maciel HS, Massi M, Pisani MB, Mansano RD. A comparative study of single and double langmuir probe techniques for RF plasma characterization. Contributions to plasma physics. 1999 ;39( 3): 235-246.[citado 2024 nov. 05 ]Vancouver
Castro RM de, Cirino GA, Verdonck PB, Maciel HS, Massi M, Pisani MB, Mansano RD. A comparative study of single and double langmuir probe techniques for RF plasma characterization. Contributions to plasma physics. 1999 ;39( 3): 235-246.[citado 2024 nov. 05 ]