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Artigo de periodico
The influence of nitrogen on the dielectric constant and surface hardness in diamond-like carbon (DLC) films (2004)
Guerino, M.; Massi, Marcos; Maciel, Homero Santiago; Otani, C.; Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard; Libardi, J.
Source: Diamond and Related Materials,. Unidade: EP
Assunto: FILMES FINOS
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ABNT
GUERINO, M. et al. The influence of nitrogen on the dielectric constant and surface hardness in diamond-like carbon (DLC) films. Diamond and Related Materials, v. 13, n. 2, p. 316-319, 2004Tradução . . Disponível em: https://doi.org/10.1016/j.diamond.2003.10.016. Acesso em: 09 nov. 2024.
APA
Guerino, M., Massi, M., Maciel, H. S., Otani, C., Mansano, R. D., Verdonck, P. B., & Libardi, J. (2004). The influence of nitrogen on the dielectric constant and surface hardness in diamond-like carbon (DLC) films. Diamond and Related Materials,, 13( 2), 316-319. doi:10.1016/j.diamond.2003.10.016
NLM
Guerino M, Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB, Libardi J. The influence of nitrogen on the dielectric constant and surface hardness in diamond-like carbon (DLC) films [Internet]. Diamond and Related Materials,. 2004 ; 13( 2): 316-319.[citado 2024 nov. 09 ] Available from: https://doi.org/10.1016/j.diamond.2003.10.016
Vancouver
Guerino M, Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB, Libardi J. The influence of nitrogen on the dielectric constant and surface hardness in diamond-like carbon (DLC) films [Internet]. Diamond and Related Materials,. 2004 ; 13( 2): 316-319.[citado 2024 nov. 09 ] Available from: https://doi.org/10.1016/j.diamond.2003.10.016
Artigo de periodico
Plasma etching of DLC films for microfluidic channels (2003)
Massi, Marcos; Jaramillo Ocampo, Juan Manuel; Maciel, Homero Santiago; Grigorov, K.; Otani, C.; Santos, L. V.; Mansano, Ronaldo Domingues
Source: Microelectronics Journal,. Unidade: EP
Assunto: PLASMA (MICROELETRÔNICA)
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ABNT
MASSI, Marcos et al. Plasma etching of DLC films for microfluidic channels. Microelectronics Journal, v. 34, n. 5-8, p. 635-638, 2003Tradução . . Disponível em: https://doi.org/10.1016/s0026-2692(03)00077-6. Acesso em: 09 nov. 2024.
APA
Massi, M., Jaramillo Ocampo, J. M., Maciel, H. S., Grigorov, K., Otani, C., Santos, L. V., & Mansano, R. D. (2003). Plasma etching of DLC films for microfluidic channels. Microelectronics Journal,, 34( 5-8), 635-638. doi:10.1016/s0026-2692(03)00077-6
NLM
Massi M, Jaramillo Ocampo JM, Maciel HS, Grigorov K, Otani C, Santos LV, Mansano RD. Plasma etching of DLC films for microfluidic channels [Internet]. Microelectronics Journal,. 2003 ; 34( 5-8): 635-638.[citado 2024 nov. 09 ] Available from: https://doi.org/10.1016/s0026-2692(03)00077-6
Vancouver
Massi M, Jaramillo Ocampo JM, Maciel HS, Grigorov K, Otani C, Santos LV, Mansano RD. Plasma etching of DLC films for microfluidic channels [Internet]. Microelectronics Journal,. 2003 ; 34( 5-8): 635-638.[citado 2024 nov. 09 ] Available from: https://doi.org/10.1016/s0026-2692(03)00077-6
Artigo de periodico
The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films (2003)
Guerino, M.; Massi, Marcos; Maciel, Homero Santiago; Otani, C.; Mansano, Ronaldo Domingues
Source: Microelectronics Journal. Unidade: EP
Assunto: PLASMA (MICROELETRÔNICA)
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
GUERINO, M. et al. The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films. Microelectronics Journal, v. 34, n. 5-8, 2003Tradução . . Disponível em: https://doi.org/10.1016/s0026-2692(03)00079-x. Acesso em: 09 nov. 2024.
APA
Guerino, M., Massi, M., Maciel, H. S., Otani, C., & Mansano, R. D. (2003). The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films. Microelectronics Journal, 34( 5-8). doi:10.1016/s0026-2692(03)00079-x
NLM
Guerino M, Massi M, Maciel HS, Otani C, Mansano RD. The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films [Internet]. Microelectronics Journal. 2003 ; 34( 5-8):[citado 2024 nov. 09 ] Available from: https://doi.org/10.1016/s0026-2692(03)00079-x
Vancouver
Guerino M, Massi M, Maciel HS, Otani C, Mansano RD. The effects of the nitrogen on the electrical and structural properties of the diamond-like carbon (DLC) films [Internet]. Microelectronics Journal. 2003 ; 34( 5-8):[citado 2024 nov. 09 ] Available from: https://doi.org/10.1016/s0026-2692(03)00079-x
Artigo de periodico
Electrical and structural characterization of DLC films deposited by magnetron sputtering (2001)
Massi, Marcos; Maciel, Homero Santiago; Otani, C.; Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard
Source: Journal of Materials Science: Materials in Electronics. Unidade: EP
Assunto: FILMES FINOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
MASSI, Marcos et al. Electrical and structural characterization of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics, v. 12, p. 343-346, 2001Tradução . . Acesso em: 09 nov. 2024.
APA
Massi, M., Maciel, H. S., Otani, C., Mansano, R. D., & Verdonck, P. B. (2001). Electrical and structural characterization of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics, 12, 343-346.
NLM
Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB. Electrical and structural characterization of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics. 2001 ; 12 343-346.[citado 2024 nov. 09 ]
Vancouver
Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB. Electrical and structural characterization of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics. 2001 ; 12 343-346.[citado 2024 nov. 09 ]
Artigo de periodico
Raman active `E IND. 2´ models in aluminum nitride films (2001)
Oliveira, I. C.; Otani, C.; Maciel, H. S.; Massi, Marcos; Noda, Lúcia Kiyomi; Temperini, Márcia Laudelina Arruda
Source: Journal of Materials Science: Materials in Electronics. Unidade: IQ
Subjects: FÍSICO-QUÍMICA, ESPECTROSCOPIA RAMAN, FILMES FINOS
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
OLIVEIRA, I. C. et al. Raman active `E IND. 2´ models in aluminum nitride films. Journal of Materials Science: Materials in Electronics, v. 12, n. 4-6, p. 259-262, 2001Tradução . . Acesso em: 09 nov. 2024.
APA
Oliveira, I. C., Otani, C., Maciel, H. S., Massi, M., Noda, L. K., & Temperini, M. L. A. (2001). Raman active `E IND. 2´ models in aluminum nitride films. Journal of Materials Science: Materials in Electronics, 12( 4-6), 259-262.
NLM
Oliveira IC, Otani C, Maciel HS, Massi M, Noda LK, Temperini MLA. Raman active `E IND. 2´ models in aluminum nitride films. Journal of Materials Science: Materials in Electronics. 2001 ; 12( 4-6): 259-262.[citado 2024 nov. 09 ]
Vancouver
Oliveira IC, Otani C, Maciel HS, Massi M, Noda LK, Temperini MLA. Raman active `E IND. 2´ models in aluminum nitride films. Journal of Materials Science: Materials in Electronics. 2001 ; 12( 4-6): 259-262.[citado 2024 nov. 09 ]
Artigo de periodico
Electrical and structural characterisation of DLC films deposited by magnetron sputtering (2001)
Massi, Marcos; Maciel, Homero Santiago; Otani, C.; Mansano, Ronaldo Domingues ; Verdonck, Patrick Bernard
Source: Journal of Materials Science: Materials in Electronics. Conference titles: International Conference on Materials for Microelectronics. Unidade: EP
Assunto: FILMES
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
MASSI, Marcos et al. Electrical and structural characterisation of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics, v. 12, p. 343–346, 2001Tradução . . Disponível em: https://doi.org/10.1023/A:1011252629646. Acesso em: 09 nov. 2024.
APA
Massi, M., Maciel, H. S., Otani, C., Mansano, R. D., & Verdonck, P. B. (2001). Electrical and structural characterisation of DLC films deposited by magnetron sputtering. Journal of Materials Science: Materials in Electronics, 12, 343–346. doi:10.1023/A:1011252629646
NLM
Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB. Electrical and structural characterisation of DLC films deposited by magnetron sputtering [Internet]. Journal of Materials Science: Materials in Electronics. 2001 ; 12 343–346.[citado 2024 nov. 09 ] Available from: https://doi.org/10.1023/A:1011252629646
Vancouver
Massi M, Maciel HS, Otani C, Mansano RD, Verdonck PB. Electrical and structural characterisation of DLC films deposited by magnetron sputtering [Internet]. Journal of Materials Science: Materials in Electronics. 2001 ; 12 343–346.[citado 2024 nov. 09 ] Available from: https://doi.org/10.1023/A:1011252629646
Relatorio tecnico
Influence of plasma etching on Raman spectra of DLC films deposited by magnetron sputtering (1999)
Massi, Marcos; Mansano, Ronaldo Domingues ; Maciel, Homero Santiago; Otani, C.; Verdonck, Patrick Bernard; Nishioka, L. N. B. M.
Unidade: EP
Assunto: ENGENHARIA ELÉTRICA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
MASSI, Marcos et al. Influence of plasma etching on Raman spectra of DLC films deposited by magnetron sputtering. . São Paulo: EPUSP. . Acesso em: 09 nov. 2024. , 1999
APA
Massi, M., Mansano, R. D., Maciel, H. S., Otani, C., Verdonck, P. B., & Nishioka, L. N. B. M. (1999). Influence of plasma etching on Raman spectra of DLC films deposited by magnetron sputtering. São Paulo: EPUSP.
NLM
Massi M, Mansano RD, Maciel HS, Otani C, Verdonck PB, Nishioka LNBM. Influence of plasma etching on Raman spectra of DLC films deposited by magnetron sputtering. 1999 ;[citado 2024 nov. 09 ]
Vancouver
Massi M, Mansano RD, Maciel HS, Otani C, Verdonck PB, Nishioka LNBM. Influence of plasma etching on Raman spectra of DLC films deposited by magnetron sputtering. 1999 ;[citado 2024 nov. 09 ]
Artigo de periodico
Effects of plasma etching on DLC films (1999)
Massi, Marcos; Mansano, Ronaldo Domingues ; Maciel, Homero Santiago; Otani, C.; Verdonck, Patrick Bernard; Nishioka, L. N. B. M.
Source: Thin Solid Films. Unidade: EP
Assunto: PLASMA
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
MASSI, Marcos et al. Effects of plasma etching on DLC films. Thin Solid Films, n. 343-344, p. 381-384, 1999Tradução . . Disponível em: https://doi.org/10.1016/s0040-6090(98)01691-5. Acesso em: 09 nov. 2024.
APA
Massi, M., Mansano, R. D., Maciel, H. S., Otani, C., Verdonck, P. B., & Nishioka, L. N. B. M. (1999). Effects of plasma etching on DLC films. Thin Solid Films, ( 343-344), 381-384. doi:10.1016/s0040-6090(98)01691-5
NLM
Massi M, Mansano RD, Maciel HS, Otani C, Verdonck PB, Nishioka LNBM. Effects of plasma etching on DLC films [Internet]. Thin Solid Films. 1999 ;( 343-344): 381-384.[citado 2024 nov. 09 ] Available from: https://doi.org/10.1016/s0040-6090(98)01691-5
Vancouver
Massi M, Mansano RD, Maciel HS, Otani C, Verdonck PB, Nishioka LNBM. Effects of plasma etching on DLC films [Internet]. Thin Solid Films. 1999 ;( 343-344): 381-384.[citado 2024 nov. 09 ] Available from: https://doi.org/10.1016/s0040-6090(98)01691-5

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