Experimental and Simulation of 1T-DRAM Trend with the Gate Length on UTBOX Devices (2013)
Source: EUROSOI 2013. Conference titles: European Workshop on Silicon on Insulator Technology, Devices and Circuits. Unidade: EP
Assunto: MICROELETRÔNICA (CONGRESSOS)
ABNT
MARTINO, João Antonio et al. Experimental and Simulation of 1T-DRAM Trend with the Gate Length on UTBOX Devices. 2013, Anais.. Paris: Institut Superieur d'Électronique, 2013. . Acesso em: 26 jan. 2026.APA
Martino, J. A., Nicoletti, T., Sasaki, K. R. A., Aoulaiche, M., Simoen, E., & Claeys, C. (2013). Experimental and Simulation of 1T-DRAM Trend with the Gate Length on UTBOX Devices. In EUROSOI 2013. Paris: Institut Superieur d'Électronique.NLM
Martino JA, Nicoletti T, Sasaki KRA, Aoulaiche M, Simoen E, Claeys C. Experimental and Simulation of 1T-DRAM Trend with the Gate Length on UTBOX Devices. EUROSOI 2013. 2013 ;[citado 2026 jan. 26 ]Vancouver
Martino JA, Nicoletti T, Sasaki KRA, Aoulaiche M, Simoen E, Claeys C. Experimental and Simulation of 1T-DRAM Trend with the Gate Length on UTBOX Devices. EUROSOI 2013. 2013 ;[citado 2026 jan. 26 ]
