Liquid helium temperature operation of graded-channel SOI nMOSFETs (2012)
Source: Microelectronics technology and devices, SBMicro. Conference titles: International Symposium on Microelectronics Technology and Devices. Unidade: EP
Assunto: MICROELETRÔNICA
ABNT
SOUZA, Michelly de et al. Liquid helium temperature operation of graded-channel SOI nMOSFETs. 2012, Anais.. Pennington: Escola Politécnica, Universidade de São Paulo, 2012. Disponível em: https://doi.org/10.1149/04901.0135ecst. Acesso em: 10 out. 2024.APA
Souza, M. de, Kilchytska, V., Flandre, D., & Pavanello, M. A. (2012). Liquid helium temperature operation of graded-channel SOI nMOSFETs. In Microelectronics technology and devices, SBMicro. Pennington: Escola Politécnica, Universidade de São Paulo. doi:10.1149/04901.0135ecstNLM
Souza M de, Kilchytska V, Flandre D, Pavanello MA. Liquid helium temperature operation of graded-channel SOI nMOSFETs [Internet]. Microelectronics technology and devices, SBMicro. 2012 ;[citado 2024 out. 10 ] Available from: https://doi.org/10.1149/04901.0135ecstVancouver
Souza M de, Kilchytska V, Flandre D, Pavanello MA. Liquid helium temperature operation of graded-channel SOI nMOSFETs [Internet]. Microelectronics technology and devices, SBMicro. 2012 ;[citado 2024 out. 10 ] Available from: https://doi.org/10.1149/04901.0135ecst