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Artigo de periodico
Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering (2006)
Benegra, Marjorie ; Lamas, D G; Fernández de Rapp, M E; Mingolo, N; Kunrath, A O; Souza, Roberto Martins de
Source: Thin Solid Films. Unidade: EP
Subjects: FILMES FINOS, TENSÃO RESIDUAL, RESISTÊNCIA DOS MATERIAIS, PLASMA (PROCESSOS), TITÂNIO, NITRATOS
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ABNT
BENEGRA, Marjorie et al. Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering. Thin Solid Films, v. 494, n. Ja 2006, p. 146-150, 2006Tradução . . Disponível em: https://doi.org/10.1016/j.tsf.2005.08.214. Acesso em: 08 nov. 2024.
APA
Benegra, M., Lamas, D. G., Fernández de Rapp, M. E., Mingolo, N., Kunrath, A. O., & Souza, R. M. de. (2006). Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering. Thin Solid Films, 494( Ja 2006), 146-150. doi:10.1016/j.tsf.2005.08.214
NLM
Benegra M, Lamas DG, Fernández de Rapp ME, Mingolo N, Kunrath AO, Souza RM de. Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering [Internet]. Thin Solid Films. 2006 ; 494( Ja 2006): 146-150.[citado 2024 nov. 08 ] Available from: https://doi.org/10.1016/j.tsf.2005.08.214
Vancouver
Benegra M, Lamas DG, Fernández de Rapp ME, Mingolo N, Kunrath AO, Souza RM de. Residual stresses in titanium nitride thin films deposited by direct current and pulsed direct current unbalanced magnetron sputtering [Internet]. Thin Solid Films. 2006 ; 494( Ja 2006): 146-150.[citado 2024 nov. 08 ] Available from: https://doi.org/10.1016/j.tsf.2005.08.214
Artigo de periodico
Numerical and experimental analyses on the indentation of coated systems with substrates with different mechanical properties (2005)
Piana, L A; Pérez Ruiz, Eduardo Alberto ; Souza, Roberto Martins de ; Kunrath, A O; Strohaecker, Telmo Roberto
Source: Thin Solid Films. Unidade: EP
Subjects: FILMES FINOS, MECÂNICA DA FRATURA, PROPRIEDADES DOS MATERIAIS, COMPUTAÇÃO APLICADA, AÇO, RESISTÊNCIA DOS MATERIAIS, TITÂNIO, NITRATOS
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ABNT
PIANA, L A et al. Numerical and experimental analyses on the indentation of coated systems with substrates with different mechanical properties. Thin Solid Films, v. No 2005, n. 1-2, p. 197-203, 2005Tradução . . Disponível em: https://doi.org/10.1016/j.tsf.2005.06.025. Acesso em: 08 nov. 2024.
APA
Piana, L. A., Pérez Ruiz, E. A., Souza, R. M. de, Kunrath, A. O., & Strohaecker, T. R. (2005). Numerical and experimental analyses on the indentation of coated systems with substrates with different mechanical properties. Thin Solid Films, No 2005( 1-2), 197-203. doi:10.1016/j.tsf.2005.06.025
NLM
Piana LA, Pérez Ruiz EA, Souza RM de, Kunrath AO, Strohaecker TR. Numerical and experimental analyses on the indentation of coated systems with substrates with different mechanical properties [Internet]. Thin Solid Films. 2005 ; No 2005( 1-2): 197-203.[citado 2024 nov. 08 ] Available from: https://doi.org/10.1016/j.tsf.2005.06.025
Vancouver
Piana LA, Pérez Ruiz EA, Souza RM de, Kunrath AO, Strohaecker TR. Numerical and experimental analyses on the indentation of coated systems with substrates with different mechanical properties [Internet]. Thin Solid Films. 2005 ; No 2005( 1-2): 197-203.[citado 2024 nov. 08 ] Available from: https://doi.org/10.1016/j.tsf.2005.06.025
Artigo de periodico
Smooth p-type GaAs(001) films grown by molecular-beam epitaxy using silicon as the dopant (2005)
Lamas, T. E.; Quivy, A. A.; Martini, S; Silva, M J da; Leite, J. R.
Source: Thin Solid Films. Unidade: IF
Subjects: MATÉRIA CONDENSADA, MATERIAIS, EFEITO HALL, FOTOLUMINESCÊNCIA, PROPRIEDADES DOS MATERIAIS
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ABNT
LAMAS, T. E. et al. Smooth p-type GaAs(001) films grown by molecular-beam epitaxy using silicon as the dopant. Thin Solid Films, v. 474, n. 1-2, p. 25-30, 2005Tradução . . Disponível em: https://doi.org/10.1016/j.tsf.2004.08.004. Acesso em: 08 nov. 2024.
APA
Lamas, T. E., Quivy, A. A., Martini, S., Silva, M. J. da, & Leite, J. R. (2005). Smooth p-type GaAs(001) films grown by molecular-beam epitaxy using silicon as the dopant. Thin Solid Films, 474( 1-2), 25-30. doi:10.1016/j.tsf.2004.08.004
NLM
Lamas TE, Quivy AA, Martini S, Silva MJ da, Leite JR. Smooth p-type GaAs(001) films grown by molecular-beam epitaxy using silicon as the dopant [Internet]. Thin Solid Films. 2005 ; 474( 1-2): 25-30.[citado 2024 nov. 08 ] Available from: https://doi.org/10.1016/j.tsf.2004.08.004
Vancouver
Lamas TE, Quivy AA, Martini S, Silva MJ da, Leite JR. Smooth p-type GaAs(001) films grown by molecular-beam epitaxy using silicon as the dopant [Internet]. Thin Solid Films. 2005 ; 474( 1-2): 25-30.[citado 2024 nov. 08 ] Available from: https://doi.org/10.1016/j.tsf.2004.08.004
Artigo de periodico
Microestrutural and transport properties of LaNi'O IND. 3-'delta'' filmes grown on Si(111) by chemical solution deposition (2003)
Escote, M T; Pontes, F M; Leite, E R; Varela, J A; Jardim, R. F.; Longo, E
Source: Thin Solid Films. Unidade: IF
Assunto: FILMES FINOS
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ABNT
ESCOTE, M T et al. Microestrutural and transport properties of LaNi'O IND. 3-'delta'' filmes grown on Si(111) by chemical solution deposition. Thin Solid Films, 2003Tradução . . Disponível em: http://www.sciencedirect.com/science?_ob=MImg&_imagekey=B6TW0-49XNX6F-7-9&_cdi=5548&_orig=browse&_coverDate=11%2F24%2F2003&_sk=995549998&view=c&wchp=dGLbVlb-zSkWb&_acct=C000049650&_version=1&_userid=972067&md5=74ae4e335bf92c1a1757dd75aaf359a4&ie=f.pdf. Acesso em: 08 nov. 2024.
APA
Escote, M. T., Pontes, F. M., Leite, E. R., Varela, J. A., Jardim, R. F., & Longo, E. (2003). Microestrutural and transport properties of LaNi'O IND. 3-'delta'' filmes grown on Si(111) by chemical solution deposition. Thin Solid Films. Recuperado de http://www.sciencedirect.com/science?_ob=MImg&_imagekey=B6TW0-49XNX6F-7-9&_cdi=5548&_orig=browse&_coverDate=11%2F24%2F2003&_sk=995549998&view=c&wchp=dGLbVlb-zSkWb&_acct=C000049650&_version=1&_userid=972067&md5=74ae4e335bf92c1a1757dd75aaf359a4&ie=f.pdf
NLM
Escote MT, Pontes FM, Leite ER, Varela JA, Jardim RF, Longo E. Microestrutural and transport properties of LaNi'O IND. 3-'delta'' filmes grown on Si(111) by chemical solution deposition [Internet]. Thin Solid Films. 2003 ;[citado 2024 nov. 08 ] Available from: http://www.sciencedirect.com/science?_ob=MImg&_imagekey=B6TW0-49XNX6F-7-9&_cdi=5548&_orig=browse&_coverDate=11%2F24%2F2003&_sk=995549998&view=c&wchp=dGLbVlb-zSkWb&_acct=C000049650&_version=1&_userid=972067&md5=74ae4e335bf92c1a1757dd75aaf359a4&ie=f.pdf
Vancouver
Escote MT, Pontes FM, Leite ER, Varela JA, Jardim RF, Longo E. Microestrutural and transport properties of LaNi'O IND. 3-'delta'' filmes grown on Si(111) by chemical solution deposition [Internet]. Thin Solid Films. 2003 ;[citado 2024 nov. 08 ] Available from: http://www.sciencedirect.com/science?_ob=MImg&_imagekey=B6TW0-49XNX6F-7-9&_cdi=5548&_orig=browse&_coverDate=11%2F24%2F2003&_sk=995549998&view=c&wchp=dGLbVlb-zSkWb&_acct=C000049650&_version=1&_userid=972067&md5=74ae4e335bf92c1a1757dd75aaf359a4&ie=f.pdf
Artigo de periodico
Structural electrical and optical properties of undoped and indium doped ZnO thin films prepared by the pyrosol process at different temperatures (2002)
Tokumoto, M S; Smith, A; Santilli, Celso Valentim; Pulcinelli, Sandra Helena; Craievich, Aldo Felix; Elkaim, E
Source: Thin Solid Films. Unidade: IF
Subjects: FILMES FINOS, MATERIAIS (PROPRIEDADES ELÉTRICAS)
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ABNT
TOKUMOTO, M S et al. Structural electrical and optical properties of undoped and indium doped ZnO thin films prepared by the pyrosol process at different temperatures. Thin Solid Films, v. 416, n. 1-2, p. 284-293, 2002Tradução . . Disponível em: https://doi.org/10.1016/s0040-6090(02)00531-x. Acesso em: 08 nov. 2024.
APA
Tokumoto, M. S., Smith, A., Santilli, C. V., Pulcinelli, S. H., Craievich, A. F., & Elkaim, E. (2002). Structural electrical and optical properties of undoped and indium doped ZnO thin films prepared by the pyrosol process at different temperatures. Thin Solid Films, 416( 1-2), 284-293. doi:10.1016/s0040-6090(02)00531-x
NLM
Tokumoto MS, Smith A, Santilli CV, Pulcinelli SH, Craievich AF, Elkaim E. Structural electrical and optical properties of undoped and indium doped ZnO thin films prepared by the pyrosol process at different temperatures [Internet]. Thin Solid Films. 2002 ; 416( 1-2): 284-293.[citado 2024 nov. 08 ] Available from: https://doi.org/10.1016/s0040-6090(02)00531-x
Vancouver
Tokumoto MS, Smith A, Santilli CV, Pulcinelli SH, Craievich AF, Elkaim E. Structural electrical and optical properties of undoped and indium doped ZnO thin films prepared by the pyrosol process at different temperatures [Internet]. Thin Solid Films. 2002 ; 416( 1-2): 284-293.[citado 2024 nov. 08 ] Available from: https://doi.org/10.1016/s0040-6090(02)00531-x
Artigo de periodico
Local structure and bonds of amorphous silicon oxynitride thin films (2002)
Scopel, Wanderla Luis ; Fantini, Márcia Carvalho de Abreu ; Alayo Chávez, Marco Isaías ; Pereyra, Inés
Source: Thin Solid Films. Unidades: IF, EP
Subjects: ESPECTROSCOPIA DE RAIO X, ESPECTROMETRIA, FILMES FINOS
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ABNT
SCOPEL, Wanderla Luis et al. Local structure and bonds of amorphous silicon oxynitride thin films. Thin Solid Films, v. 413, n. 1-2, p. 59-64, 2002Tradução . . Disponível em: https://doi.org/10.1016/s0040-6090(02)00346-2. Acesso em: 08 nov. 2024.
APA
Scopel, W. L., Fantini, M. C. de A., Alayo Chávez, M. I., & Pereyra, I. (2002). Local structure and bonds of amorphous silicon oxynitride thin films. Thin Solid Films, 413( 1-2), 59-64. doi:10.1016/s0040-6090(02)00346-2
NLM
Scopel WL, Fantini MC de A, Alayo Chávez MI, Pereyra I. Local structure and bonds of amorphous silicon oxynitride thin films [Internet]. Thin Solid Films. 2002 ; 413( 1-2): 59-64.[citado 2024 nov. 08 ] Available from: https://doi.org/10.1016/s0040-6090(02)00346-2
Vancouver
Scopel WL, Fantini MC de A, Alayo Chávez MI, Pereyra I. Local structure and bonds of amorphous silicon oxynitride thin films [Internet]. Thin Solid Films. 2002 ; 413( 1-2): 59-64.[citado 2024 nov. 08 ] Available from: https://doi.org/10.1016/s0040-6090(02)00346-2
Artigo de periodico
On the nitrogen and oxygen incorporation in plasma-enhanced chemical vapor deposition (PECVD) SiOxNy films (2002)
Alayo Chávez, Marco Isaías ; Pereyra, Inés ; Scopel, Wanderla Luis ; Fantini, Márcia Carvalho de Abreu
Source: Thin Solid Films. Unidades: IF, EP
Subjects: FÍSICA DE PLASMAS, DIELÉTRICOS
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ABNT
ALAYO CHÁVEZ, Marco Isaías et al. On the nitrogen and oxygen incorporation in plasma-enhanced chemical vapor deposition (PECVD) SiOxNy films. Thin Solid Films, v. 402, n. 1-2, p. 154-161, 2002Tradução . . Disponível em: https://doi.org/10.1016/S0040-6090(01)01685-6. Acesso em: 08 nov. 2024.
APA
Alayo Chávez, M. I., Pereyra, I., Scopel, W. L., & Fantini, M. C. de A. (2002). On the nitrogen and oxygen incorporation in plasma-enhanced chemical vapor deposition (PECVD) SiOxNy films. Thin Solid Films, 402( 1-2), 154-161. doi:10.1016/S0040-6090(01)01685-6
NLM
Alayo Chávez MI, Pereyra I, Scopel WL, Fantini MC de A. On the nitrogen and oxygen incorporation in plasma-enhanced chemical vapor deposition (PECVD) SiOxNy films [Internet]. Thin Solid Films. 2002 ; 402( 1-2): 154-161.[citado 2024 nov. 08 ] Available from: https://doi.org/10.1016/S0040-6090(01)01685-6
Vancouver
Alayo Chávez MI, Pereyra I, Scopel WL, Fantini MC de A. On the nitrogen and oxygen incorporation in plasma-enhanced chemical vapor deposition (PECVD) SiOxNy films [Internet]. Thin Solid Films. 2002 ; 402( 1-2): 154-161.[citado 2024 nov. 08 ] Available from: https://doi.org/10.1016/S0040-6090(01)01685-6
Artigo de periodico
Critical exponents of diamond films: possible influence of spatially correlated noise (2000)
Cattani, Mauro Sérgio Dorsa ; Salvadori, Maria Cecília Barbosa da Silveira
Source: Thin Solid Films. Unidade: IF
Assunto: FÍSICA DO ESTADO SÓLIDO
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ABNT
CATTANI, Mauro Sérgio Dorsa e SALVADORI, Maria Cecília Barbosa da Silveira. Critical exponents of diamond films: possible influence of spatially correlated noise. Thin Solid Films, v. 376, n. 1-2, p. 264-266, 2000Tradução . . Disponível em: https://doi.org/10.1016/s0040-6090(00)01400-0. Acesso em: 08 nov. 2024.
APA
Cattani, M. S. D., & Salvadori, M. C. B. da S. (2000). Critical exponents of diamond films: possible influence of spatially correlated noise. Thin Solid Films, 376( 1-2), 264-266. doi:10.1016/s0040-6090(00)01400-0
NLM
Cattani MSD, Salvadori MCB da S. Critical exponents of diamond films: possible influence of spatially correlated noise [Internet]. Thin Solid Films. 2000 ; 376( 1-2): 264-266.[citado 2024 nov. 08 ] Available from: https://doi.org/10.1016/s0040-6090(00)01400-0
Vancouver
Cattani MSD, Salvadori MCB da S. Critical exponents of diamond films: possible influence of spatially correlated noise [Internet]. Thin Solid Films. 2000 ; 376( 1-2): 264-266.[citado 2024 nov. 08 ] Available from: https://doi.org/10.1016/s0040-6090(00)01400-0
Artigo de periodico
Effects of the methane content on the characteristics of diamond-like carbon films produced by sputtering (2000)
Mansano, Ronaldo Domingues ; Massi, Marcos; Zambom, Luís da Silva ; Verdonck, Patrick Bernard; Nogueira, P. M.; Maciel, H. S.; Otani, Choyu
Source: Thin Solid Films. Unidade: EP
Assunto: FILMES
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ABNT
MANSANO, Ronaldo Domingues et al. Effects of the methane content on the characteristics of diamond-like carbon films produced by sputtering. Thin Solid Films, n. 373, p. 243-246, 2000Tradução . . Disponível em: https://doi.org/10.1016/s0040-6090(00)01088-9. Acesso em: 08 nov. 2024.
APA
Mansano, R. D., Massi, M., Zambom, L. da S., Verdonck, P. B., Nogueira, P. M., Maciel, H. S., & Otani, C. (2000). Effects of the methane content on the characteristics of diamond-like carbon films produced by sputtering. Thin Solid Films, ( 373), 243-246. doi:10.1016/s0040-6090(00)01088-9
NLM
Mansano RD, Massi M, Zambom L da S, Verdonck PB, Nogueira PM, Maciel HS, Otani C. Effects of the methane content on the characteristics of diamond-like carbon films produced by sputtering [Internet]. Thin Solid Films. 2000 ;( 373): 243-246.[citado 2024 nov. 08 ] Available from: https://doi.org/10.1016/s0040-6090(00)01088-9
Vancouver
Mansano RD, Massi M, Zambom L da S, Verdonck PB, Nogueira PM, Maciel HS, Otani C. Effects of the methane content on the characteristics of diamond-like carbon films produced by sputtering [Internet]. Thin Solid Films. 2000 ;( 373): 243-246.[citado 2024 nov. 08 ] Available from: https://doi.org/10.1016/s0040-6090(00)01088-9
Artigo de periodico
Palmitic acid and aquo-ruthenium complex monolayers at the liquid-air interface and electroactive Langmuir-Blodgett films (1999)
Santos, Juliane Pereira; Zaniquelli, Maria Elisabete Darbello; Batalini, Claudemir; De Giovani, Wagner Ferraresi
Source: Thin Solid Films. Unidade: FFCLRP
Assunto: QUÍMICA
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ABNT
SANTOS, Juliane Pereira et al. Palmitic acid and aquo-ruthenium complex monolayers at the liquid-air interface and electroactive Langmuir-Blodgett films. Thin Solid Films, v. 349, p. 238-243, 1999Tradução . . Disponível em: https://doi.org/10.1016/s0040-6090(99)00179-0. Acesso em: 08 nov. 2024.
APA
Santos, J. P., Zaniquelli, M. E. D., Batalini, C., & De Giovani, W. F. (1999). Palmitic acid and aquo-ruthenium complex monolayers at the liquid-air interface and electroactive Langmuir-Blodgett films. Thin Solid Films, 349, 238-243. doi:10.1016/s0040-6090(99)00179-0
NLM
Santos JP, Zaniquelli MED, Batalini C, De Giovani WF. Palmitic acid and aquo-ruthenium complex monolayers at the liquid-air interface and electroactive Langmuir-Blodgett films [Internet]. Thin Solid Films. 1999 ; 349 238-243.[citado 2024 nov. 08 ] Available from: https://doi.org/10.1016/s0040-6090(99)00179-0
Vancouver
Santos JP, Zaniquelli MED, Batalini C, De Giovani WF. Palmitic acid and aquo-ruthenium complex monolayers at the liquid-air interface and electroactive Langmuir-Blodgett films [Internet]. Thin Solid Films. 1999 ; 349 238-243.[citado 2024 nov. 08 ] Available from: https://doi.org/10.1016/s0040-6090(99)00179-0

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