p-type Si-doped structures grown by molecular beam epitaxy on (311)A GaAs substrates (1998)
- Authors:
- USP affiliated authors: QUIVY, ALAIN ANDRE - IF ; SILVA, EUZI CONCEICAO FERNANDES DA - IF ; LEITE, JOSE ROBERTO - IF
- Unidade: IF
- Assunto: FÍSICA
- Language: Inglês
- Imprenta:
- Publisher: Sociedade Brasileira de Física
- Publisher place: São Paulo
- Date published: 1998
- Source:
- Título: Brazilian Journal of Physics
- Volume/Número/Paginação/Ano: v. 27A, n. 4, p. 125-129, 1998
- Conference titles: Brazilian Workshop on Semiconductor Physics
-
ABNT
QUIVY, Alain André et al. p-type Si-doped structures grown by molecular beam epitaxy on (311)A GaAs substrates. Brazilian Journal of Physics. São Paulo: Sociedade Brasileira de Física. . Acesso em: 25 jan. 2026. , 1998 -
APA
Quivy, A. A., Frizzarini, M., Silva, E. C. F. da, Sperandio, A. L., & Leite, J. R. (1998). p-type Si-doped structures grown by molecular beam epitaxy on (311)A GaAs substrates. Brazilian Journal of Physics. São Paulo: Sociedade Brasileira de Física. -
NLM
Quivy AA, Frizzarini M, Silva ECF da, Sperandio AL, Leite JR. p-type Si-doped structures grown by molecular beam epitaxy on (311)A GaAs substrates. Brazilian Journal of Physics. 1998 ; 27A( 4): 125-129.[citado 2026 jan. 25 ] -
Vancouver
Quivy AA, Frizzarini M, Silva ECF da, Sperandio AL, Leite JR. p-type Si-doped structures grown by molecular beam epitaxy on (311)A GaAs substrates. Brazilian Journal of Physics. 1998 ; 27A( 4): 125-129.[citado 2026 jan. 25 ] - Study of the 2-dimensional to 3-dimensional transition in p-type multiple-delta-doped GaAs layers grown on top of (311)A GaAs substrates
- Large InAs/GaAs quantum dots optically active in the long-wavelength region
- Large InAs/GaAs quantum dots with an optical response in the long-wavelength region
- InAs/GaAs quantum dots optically active at 1.5 'mu'
- Concentration dependence of Si-doped GaAs layers grown by moleucular beam epitaxy on (311) A substrates
- The effect of illumination on the electronic structure of Si 'alfa'-dopped 'In IND.0.15' 'Ga IND.0.85' As/GaAs quantum well
- Real-time determination of the segregation strength of indium atoms in InGaAs layers grown by molecular-beam epitaxy
- Optical response at 1.3 'mu'm and 1.5 'mu'm with InAs quantum dots embedded in a pure GaAs matrix
- 'p-type''Si-Doped' Structures Grown By Molecular Beam Epitaxy on '(311)'A 'GaAs' Substrates
- Influence of illumination on the quantum mobility of a two-dimensional electron gas in Si 'sigma'-doped 'GaAs/In IND.0.15' 'Ga IND.0.85'As quantum wells
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