Filtros : "EP" "IF" "ESPECTROSCOPIA DE RAIO X" Limpar

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  • Source: Proceedings Science BWSP. Conference titles: Brazilian Workshop on Semiconductor Physics. Unidades: IF, EP

    Subjects: CRISTALOGRAFIA FÍSICA, FILMES FINOS, ESPECTROSCOPIA DE RAIO X

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    • ABNT

      CASSIMIRO, Vinicius Roberto de Sylos et al. The structural properties of the protective layer of microlamps under polarization. Proceedings Science BWSP. São Paulo: Instituto de Física, Universidade de São Paulo. Disponível em: https://doi.org/10.17648/bwsp-2017-70051. Acesso em: 17 out. 2024. , 2017
    • APA

      Cassimiro, V. R. de S., Fantini, M. C. de A., Pereyra, I., Páez Carreño, M. N., Alayo Chávez, M. I., Rehder, G. P., et al. (2017). The structural properties of the protective layer of microlamps under polarization. Proceedings Science BWSP. São Paulo: Instituto de Física, Universidade de São Paulo. doi:10.17648/bwsp-2017-70051
    • NLM

      Cassimiro VR de S, Fantini MC de A, Pereyra I, Páez Carreño MN, Alayo Chávez MI, Rehder GP, Cunha Junior RM, Trcera N. The structural properties of the protective layer of microlamps under polarization [Internet]. Proceedings Science BWSP. 2017 ; 1 4 .[citado 2024 out. 17 ] Available from: https://doi.org/10.17648/bwsp-2017-70051
    • Vancouver

      Cassimiro VR de S, Fantini MC de A, Pereyra I, Páez Carreño MN, Alayo Chávez MI, Rehder GP, Cunha Junior RM, Trcera N. The structural properties of the protective layer of microlamps under polarization [Internet]. Proceedings Science BWSP. 2017 ; 1 4 .[citado 2024 out. 17 ] Available from: https://doi.org/10.17648/bwsp-2017-70051
  • Source: Surface & Coatings Technology. Conference titles: International Workshop on Plasma-Based Ion Implantation and Deposition. Unidades: IF, EP

    Assunto: ESPECTROSCOPIA DE RAIO X

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      MATSUOKA, Masao et al. Chemical bonding and composition of silicon nitride films prepared by inductively coupled plasma chemical vapor deposition. Surface & Coatings Technology. Amsterdam: Elsevier Science. Disponível em: http://www.sciencedirect.com/science/journal/02578972. Acesso em: 17 out. 2024. , 2010
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      Matsuoka, M., Isotani, S., Mamani, W. A. S., Zambom, L. da S., & Ogata, K. (2010). Chemical bonding and composition of silicon nitride films prepared by inductively coupled plasma chemical vapor deposition. Surface & Coatings Technology. Amsterdam: Elsevier Science. Recuperado de http://www.sciencedirect.com/science/journal/02578972
    • NLM

      Matsuoka M, Isotani S, Mamani WAS, Zambom L da S, Ogata K. Chemical bonding and composition of silicon nitride films prepared by inductively coupled plasma chemical vapor deposition [Internet]. Surface & Coatings Technology. 2010 ; 204 18-19.[citado 2024 out. 17 ] Available from: http://www.sciencedirect.com/science/journal/02578972
    • Vancouver

      Matsuoka M, Isotani S, Mamani WAS, Zambom L da S, Ogata K. Chemical bonding and composition of silicon nitride films prepared by inductively coupled plasma chemical vapor deposition [Internet]. Surface & Coatings Technology. 2010 ; 204 18-19.[citado 2024 out. 17 ] Available from: http://www.sciencedirect.com/science/journal/02578972
  • Source: Journal of Non-Crystalline Solids. Unidades: IF, EP

    Subjects: FILMES FINOS, ESPECTROSCOPIA DE RAIO X

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      CRIADO, Denise et al. Local bonding in PECVD-"SiO IND.X" "N IND.Y" films. Journal of Non-Crystalline Solids, v. 352, n. 9-20, p. 1298-1302, 2006Tradução . . Disponível em: http://www.sciencedirect.com/science?_ob=PublicationURL&_cdi=5594&_pubType=J&_auth=y&_acct=C000049650&_version=1&_urlVersion=0&_userid=972067&md5=214bac5d32eab2194b6eace9325ac20e. Acesso em: 17 out. 2024.
    • APA

      Criado, D., Alayo Chávez, M. I., Fantini, M. C. de A., & Pereyra, I. (2006). Local bonding in PECVD-"SiO IND.X" "N IND.Y" films. Journal of Non-Crystalline Solids, 352( 9-20), 1298-1302. Recuperado de http://www.sciencedirect.com/science?_ob=PublicationURL&_cdi=5594&_pubType=J&_auth=y&_acct=C000049650&_version=1&_urlVersion=0&_userid=972067&md5=214bac5d32eab2194b6eace9325ac20e
    • NLM

      Criado D, Alayo Chávez MI, Fantini MC de A, Pereyra I. Local bonding in PECVD-"SiO IND.X" "N IND.Y" films [Internet]. Journal of Non-Crystalline Solids. 2006 ; 352( 9-20): 1298-1302.[citado 2024 out. 17 ] Available from: http://www.sciencedirect.com/science?_ob=PublicationURL&_cdi=5594&_pubType=J&_auth=y&_acct=C000049650&_version=1&_urlVersion=0&_userid=972067&md5=214bac5d32eab2194b6eace9325ac20e
    • Vancouver

      Criado D, Alayo Chávez MI, Fantini MC de A, Pereyra I. Local bonding in PECVD-"SiO IND.X" "N IND.Y" films [Internet]. Journal of Non-Crystalline Solids. 2006 ; 352( 9-20): 1298-1302.[citado 2024 out. 17 ] Available from: http://www.sciencedirect.com/science?_ob=PublicationURL&_cdi=5594&_pubType=J&_auth=y&_acct=C000049650&_version=1&_urlVersion=0&_userid=972067&md5=214bac5d32eab2194b6eace9325ac20e
  • Source: Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms. Unidades: IF, EP, MAE

    Subjects: DIFRAÇÃO POR RAIOS X, DETECÇÃO DE PARTÍCULAS, FEIXES ÓPTICOS, ESPECTROSCOPIA DE RAIO X

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      RIZZUTTO, Márcia de Almeida et al. The external beam facility used to characterize corrosion products in mettalic statuettes. Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms, v. 240, n. 1-2, p. 549-553, 2005Tradução . . Disponível em: https://doi.org/10.1016/j.nimb.2005.06.153. Acesso em: 17 out. 2024.
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      Rizzutto, M. de A., Tabacniks, M. H., Added, N., Barbosa, M. D. L., Curado, J. F., Santos, W. A., et al. (2005). The external beam facility used to characterize corrosion products in mettalic statuettes. Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms, 240( 1-2), 549-553. doi:10.1016/j.nimb.2005.06.153
    • NLM

      Rizzutto M de A, Tabacniks MH, Added N, Barbosa MDL, Curado JF, Santos WA, Lima SC, Melo HG de, Neiva AC. The external beam facility used to characterize corrosion products in mettalic statuettes [Internet]. Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms. 2005 ; 240( 1-2): 549-553.[citado 2024 out. 17 ] Available from: https://doi.org/10.1016/j.nimb.2005.06.153
    • Vancouver

      Rizzutto M de A, Tabacniks MH, Added N, Barbosa MDL, Curado JF, Santos WA, Lima SC, Melo HG de, Neiva AC. The external beam facility used to characterize corrosion products in mettalic statuettes [Internet]. Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms. 2005 ; 240( 1-2): 549-553.[citado 2024 out. 17 ] Available from: https://doi.org/10.1016/j.nimb.2005.06.153
  • Source: Program. Conference titles: Encontro da SBPMat. Unidades: IF, EP

    Subjects: MATERIAIS, FILMES FINOS, ESPECTROSCOPIA DE RAIO X

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      CRIADO, Denise et al. Xanes characterization in PECVD-SiOxNy films. 2004, Anais.. São Carlos: SBPMat, 2004. Disponível em: http://www.sbpmat.org.br/3meeting/simposio_b.pdf. Acesso em: 17 out. 2024.
    • APA

      Criado, D., Alayo Chávez, M. I., Pereyra, I., & Fantini, M. C. de A. (2004). Xanes characterization in PECVD-SiOxNy films. In Program. São Carlos: SBPMat. Recuperado de http://www.sbpmat.org.br/3meeting/simposio_b.pdf
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      Criado D, Alayo Chávez MI, Pereyra I, Fantini MC de A. Xanes characterization in PECVD-SiOxNy films [Internet]. Program. 2004 ;[citado 2024 out. 17 ] Available from: http://www.sbpmat.org.br/3meeting/simposio_b.pdf
    • Vancouver

      Criado D, Alayo Chávez MI, Pereyra I, Fantini MC de A. Xanes characterization in PECVD-SiOxNy films [Internet]. Program. 2004 ;[citado 2024 out. 17 ] Available from: http://www.sbpmat.org.br/3meeting/simposio_b.pdf
  • Source: Brazilian Journal of Physics. Unidades: IF, EP

    Subjects: ESPECTROSCOPIA DE RAIO X, ESPECTROMETRIA

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      SCOPEL, Wanderla Luis et al. Local order structure of a-Si'O IND.X' 'N IND.Y':H grown by PECVD. Brazilian Journal of Physics, v. 32, n. 2A, p. 366-368, 2002Tradução . . Disponível em: http://www.sbf.if.usp.br/bjp/Vol32/Num2a/v32_366.pdf. Acesso em: 17 out. 2024.
    • APA

      Scopel, W. L., Fantini, M. C. de A., Alayo Chávez, M. I., & Pereyra, I. (2002). Local order structure of a-Si'O IND.X' 'N IND.Y':H grown by PECVD. Brazilian Journal of Physics, 32( 2A), 366-368. Recuperado de http://www.sbf.if.usp.br/bjp/Vol32/Num2a/v32_366.pdf
    • NLM

      Scopel WL, Fantini MC de A, Alayo Chávez MI, Pereyra I. Local order structure of a-Si'O IND.X' 'N IND.Y':H grown by PECVD [Internet]. Brazilian Journal of Physics. 2002 ; 32( 2A): 366-368.[citado 2024 out. 17 ] Available from: http://www.sbf.if.usp.br/bjp/Vol32/Num2a/v32_366.pdf
    • Vancouver

      Scopel WL, Fantini MC de A, Alayo Chávez MI, Pereyra I. Local order structure of a-Si'O IND.X' 'N IND.Y':H grown by PECVD [Internet]. Brazilian Journal of Physics. 2002 ; 32( 2A): 366-368.[citado 2024 out. 17 ] Available from: http://www.sbf.if.usp.br/bjp/Vol32/Num2a/v32_366.pdf
  • Source: Thin Solid Films. Unidades: IF, EP

    Subjects: ESPECTROSCOPIA DE RAIO X, ESPECTROMETRIA, FILMES FINOS

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      SCOPEL, Wanderla Luis et al. Local structure and bonds of amorphous silicon oxynitride thin films. Thin Solid Films, v. 413, n. 1-2, p. 59-64, 2002Tradução . . Disponível em: https://doi.org/10.1016/s0040-6090(02)00346-2. Acesso em: 17 out. 2024.
    • APA

      Scopel, W. L., Fantini, M. C. de A., Alayo Chávez, M. I., & Pereyra, I. (2002). Local structure and bonds of amorphous silicon oxynitride thin films. Thin Solid Films, 413( 1-2), 59-64. doi:10.1016/s0040-6090(02)00346-2
    • NLM

      Scopel WL, Fantini MC de A, Alayo Chávez MI, Pereyra I. Local structure and bonds of amorphous silicon oxynitride thin films [Internet]. Thin Solid Films. 2002 ; 413( 1-2): 59-64.[citado 2024 out. 17 ] Available from: https://doi.org/10.1016/s0040-6090(02)00346-2
    • Vancouver

      Scopel WL, Fantini MC de A, Alayo Chávez MI, Pereyra I. Local structure and bonds of amorphous silicon oxynitride thin films [Internet]. Thin Solid Films. 2002 ; 413( 1-2): 59-64.[citado 2024 out. 17 ] Available from: https://doi.org/10.1016/s0040-6090(02)00346-2

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